Xu Xiangdong. / "December 2001." / Thesis (Ph.D.)--Chinese University of Hong Kong, 2001. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.

Xu Yan = 納米銅(銅的氧化物)與三氧化二鋁復合物薄膜的製備和特性研究 / 許燕. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references (leaves 50-51). / Text in English; abstracts in English and Chinese. / Xu Yan = Na mi tong (tong de yang hua wu) yu san yang hua er lv fu he wu bo mo de zhi bei he te xing yan jiu / Xu Yan. / Abstract --- p.i / 摘要 --- p.ii / Acknowledgements --- p.iii / Table of Contents --- p.iv / List of Figures --- p.viii / List of Tables --- p.xi / Chapter CHAPTER 1 --- Introduction / Chapter 1.1 --- Nanostructured Materials --- p.1 / Chapter 1.2 --- Objective of this Work --- p.1 / Chapter CHAPTER 2 --- Background / Chapter 2.1 --- Correlation of AES-CuLMM spectrum and Cu nanocluster size --- p.3 / Chapter 2.1.1 --- Typical AES-CuLMM spectra --- p.3 / Chapter 2.1.2 --- A simplified model --- p.4 / Chapter 2.1.3 --- correlation of AES-CuLMM spectra and the simplified model --- p.4 / Chapter 2.2 --- Previous works --- p.5 / Chapter CHAPTER 3 --- Instrumentation / Chapter 3.1 --- Sputtering --- p.6 / Chapter 3.1.1 --- Principles of sputtering --- p.6 / Chapter 3.1.1.1 --- Concepts of sputtering --- p.6 / Chapter 3.1.1.2 --- Initiating the plasma --- p.8 / Chapter 3.1.1.3 --- Depositing a film onto the substrate --- p.8 / Chapter 3.1.2 --- Radio-frequency (RF) magnetron sputtering --- p.9 / Chapter 3.1.2.1 --- RF sputtering --- p.9 / Chapter 3.1.2.2 --- Magnetron Sputtering --- p.10 / Chapter 3.2 --- Deposition system --- p.10 / Chapter 3.2.1 --- Instrumentation --- p.11 / Chapter 3.2.1.1 --- Vacuum system --- p.11 / Chapter 3.2.1.2 --- Sputter target and power supplies --- p.12 / Chapter 3.2.1.3 --- Substrate mounting --- p.13 / Chapter 3.2.2 --- Experimental --- p.13 / Chapter 3.3 --- X-ray Photoelectron Spectroscopy (XPS) --- p.14 / Chapter 3.3.1 --- Basic Principles --- p.14 / Chapter 3.3.2 --- Instrumentation --- p.17 / Chapter 3.3.3 --- Qualitative and quantitative analysis --- p.17 / Chapter 3.3.3.1 --- Spectra interpretations --- p.17 / Chapter 3.3.3.2 --- X-ray emission line width --- p.18 / Chapter 3.3.3.3 --- Qualification --- p.18 / Chapter 3.3.3.3.1 --- Chemical composition --- p.18 / Chapter 3.3.3.3.2 --- Sputter depth profiling --- p.18 / Chapter 3.3.3.3.3 --- Auger parameter --- p.19 / Chapter 3.4 --- Transmission Electron Microscopy (TEM) --- p.19 / Chapter 3.4.1 --- An overview of TEM --- p.19 / Chapter 3.4.2 --- Imaging mode and diffraction mode --- p.21 / Chapter 3.4.3 --- Electron-Specimen interactions --- p.21 / Chapter 3.4.3.1 --- Elastic scattering --- p.22 / Chapter 3.4.3.2 --- Inelastic scattering --- p.22 / Chapter 3.4.4 --- Imaging mechanisms for TEM --- p.23 / Chapter 3.4.4.1 --- Mass-thickness contrast --- p.23 / Chapter 3.4.4.2 --- Diffraction contrast --- p.23 / Chapter 3.4.5 --- TEM sample preparation --- p.25 / Chapter CHAPTER 4 --- Chemical and Structure Characterization of Cu(CuOx)/Al2O3 Composite Thin Films / Chapter 4.1 --- Overview --- p.26 / Chapter 4.2 --- Results and discussions --- p.26 / Chapter 4.2.1 --- Set I: Achieving the stoichiometry of A1203 matrix --- p.26 / Chapter 4.2.2 --- Set II: keeping A1203 stoichiometry and studying on the correlation of CuLMM spectra and average Cu cluster size --- p.32 / Chapter 4.2.2.1 --- Chemical information obtained by XPS --- p.32 / Chapter 4.2.2.2 --- Nanostructure studied by TEM --- p.38 / Chapter 4.2.2.3 --- Mechanical properties inspected by nano-indentation --- p.43 / Chapter 4.2.2.4 --- Optical properties --- p.43 / Chapter 4.2.3 --- Set III: Duration of deposition --- p.44 / Chapter 4.2.4 --- Set VI: Pressure effect on the average size of Cu nanoclusters --- p.45 / Chapter CHAPTER 5 --- Conclusions --- p.48 / References --- p.50

Chan, Wing Chit = (La₀.₆₇Ca₀.₃₃MnO₃/La₀.₃₀Ca₀.₇₀MnO₃/La₀.₆₇Sr₀.₃₃MnO₃/La₀.₃₀Ca₀.₇₀MnO₃)多層薄膜的電子輸運特性 / 陳榮捷. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2009. / Includes bibliographical references. / Abstract also in Chinese. / Chan, Wing Chit = (La₀.₆₇Ca₀.₃₃MnO₃/La₀.₃₀Ca₀.₇₀MnO₃/La₀.₆₇Sr₀.₃₃MnO₃/La₀.₃₀Ca₀.₇₀MnO₃) duo ceng bo mo de dian zi shu yun te xing / Chen Rongjie. / Abstract --- p.i / 論文摘要 --- p.iii / Acknowledgements --- p.iv / Table of Contents --- p.v / List of Figures --- p.viii / List of Tables --- p.xiii / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Review of Magnetoresistance --- p.1 / Chapter 1.1.1 --- Giant magnetoresistance (GMR) --- p.4 / Chapter 1.1.2 --- Colossal magnetoresistance (CMR) --- p.7 / Chapter 1.2 --- Possible origins of CMR in manganites --- p.10 / Chapter 1.2.1 --- Double exchange mechanism --- p.10 / Chapter 1.2.2 --- Tolerance factor --- p.14 / Chapter 1.2.3 --- Jahn-Teller Distortion --- p.16 / Chapter 1.2.4 --- Magnetic phase diagram and charge ordering (CO) --- p.19 / Chapter 1.2.5 --- Phase separation and percolation theory --- p.23 / Chapter 1.2.6 --- Phase separation at the interfaces in thin films --- p.28 / Chapter 1.3 --- Our motivation --- p.29 / Chapter 1.4 --- Literature review of some manganite multilayer systems --- p.31 / Chapter 1.4.1 --- Ferromagnetic (FM)/antiferromagnetic (AF) multilayers --- p.31 / Chapter 1.4.2 --- Ferromagnetic (FM)/insulating oxides multilayers --- p.32 / Chapter 1.4.3 --- Ferromagnetic (FM)/ferromagnetic (FM) multilayers --- p.33 / Chapter 1.5 --- Scope of this thesis --- p.34 / References --- p.36 / Chapter Chapter 2 --- Instrumentation / Chapter 2.1 --- Thin film deposition --- p.40 / Chapter 2.1.1 --- Facing-target sputtering --- p.41 / Chapter 2.1.2 --- Vacuum system --- p.44 / Chapter 2.2 --- Characterization --- p.46 / Chapter 2.2.1 --- α-step profilometer --- p.46 / Chapter 2.2.2 --- x-ray diffraction (XRD) --- p.46 / Chapter 2.2.3 --- Resistance measurement --- p.49 / References --- p.51 / Chapter Chapter 3 --- Epitaxial growth and characterization of single layer thin films / Chapter 3.1 --- Introduction --- p.52 / Chapter 3.2 --- Fabrication of the sputtering targets --- p.52 / Chapter 3.3 --- Epitaxial growth of single layer thin films --- p.53 / Chapter 3.3.1 --- Substrate materials --- p.54 / Chapter 3.3.2 --- Deposition conditions --- p.55 / Chapter 3.3.3 --- Deposition procedures --- p.57 / Chapter 3.3 --- Characterization of single layer thin films --- p.58 / References --- p.63 / Chapter Chapter 4 --- La0 67Ca0.33MnO3/La030Ca0.70MnO3/La067Sr0.33MnO3/La0.30Ca070MnO3 multilayers / Chapter 4.1 --- Sample preparation --- p.64 / Chapter 4.2 --- Structure characterization of as-deposited samples --- p.68 / Chapter 4.3 --- Transport properties of as-deposited samples --- p.79 / Chapter 4.3.1 --- Series of samples with fixed Lao.3oCao.7oMn03 barrier layer thickness --- p.79 / Chapter 4.3.3.1 --- Samples with thin ferromagnetic layers: C20 and S20 series --- p.82 / Chapter 4.3.1.2 --- Series of samples with thick ferromagnetic layers --- p.87 / Chapter 4.3.1.3 --- Parallel resistors network --- p.96 / Chapter 4.3.2 --- Series of samples with varying Lao.3oCao.7oMn03 barrier layer thickness --- p.101 / Chapter 4.4 --- Discussion --- p.108 / References --- p.114 / Chapter Chapter 5 --- Conclusion / Chapter 5.1 --- Conclusion --- p.116 / Chapter 5.2 --- Future outlook --- p.119 / References --- p.121

L’objet de ce travail expérimental est l’étude de la mécanique de films de mousses dont la structure est confinée par leur faible épaisseur. A partir d’une méthode de moussage de dispersion de particules de polyuréthane, nous sommes parvenus à contrôler, de façon indépendante, la fraction d’air (ou la densité) de ces films, leur épaisseur e et la distribution des tailles de leurs pores (de diamètre moyen D ̅_b). Pour ce dernier paramètre, nous nous sommes intéressés au cas de distributions monodisperse, bidisperse et polydisperses. Les différentes structures obtenues ont été étudiées par tomographie aux rayons X, de manière à quantifier l’ordre induit par le confinement (profils de densité, position des centres de pores, tailles des éléments structuraux,…). Nous nous sommes intéressés à la mécanique de ces films de mousse en tension (dans le plan du film) et en compression (dans le plan orthogonal au film). Un travail spécifique mené sur la matrice de polymère nous a permis de déterminer des grandeurs adimensionnées (modules et contraintes caractéristiques) permettant une comparaison avec les données et les modèles de la littérature. Nous montrons qu’en plus de l’effet classique de la densité, le nombre moyen de bulles à travers l’épaisseur, i.e. e⁄D ̅_b , est un paramètre déterminant pour les deux directions de sollicitation. En élongation, les couches pariétales contribuent à augmenter le module élastique des films par rapport à une mousse non-confinée. Ce renforcement est d’autant plus important (jusqu’à deux fois) lorsque e⁄D ̅_b est faible, quel que soit le type de distribution des tailles de pores. En compression, les couches pariétales ne contribuent pas directement, mais le confinement joue également un rôle important, avec cette fois-ci un impact déterminant de la distribution des tailles de pores. Ainsi, un film de mousse monodisperse est ordonné comme un polycristal et présente des caractéristiques mécaniques nettement plus élevées qu’un film de mousse polydisperse, comportant de nombreuses zones de faiblesse mécanique engendrées par les défauts d’empilement des bulles initiales. Les films de mousse bidisperses ont une réponse mécanique qui se rapproche soit des mousses monodisperses, pour de relativement grands rapports e⁄D ̅_b , soit des mousses polydisperses, pour de relativement petits rapports( e)⁄D ̅_b / The subject of this experimental work is the study of foam films mechanics with a confined structure because of their low thickness. With our foaming method using polyurethane particles dispersion, we generated foam films with independent control over the gas fraction (or the density), the thickness e or the pore size distribution (with a mean diameter D ̅_b). For this last parameter, we focused on monodisperse, bidisperse and polydisperse distributions. Obtained structures were studied using X-ray tomography to quantify confinement-induced order (density profiles, pore center spatial position, structural elements size,…). The mechanics of such foam films was studied in both uniaxial tension (in-plane) and compression (orthogonal plan). A particular work was done on the polymer matrix in order to determine reduced values (moduli and characteristic stress) to compare our results with models in the literature. We show that in addition to the classic density effect, the mean number of bubbles across the thickness, i.e. e⁄D ̅_b is a determinant parameter for both stress directions. In tension, parietal walls contribute to increase the elastic modulus of films with respect to non-confined foam. This effect on the mechanical strength is even more important (up to two times) when e⁄D ̅_b is small without any effect regarding the pore size distribution. In compression, parietal walls do not contribute directly to the measured values but the confinement still has an important role, this time depending on the pore size distribution. Indeed, monodisperse foam films are organized in polycrystals with much better mechanical characteristics compared to polydisperse foam films that present numerous mechanical weak spots caused by initial bubble packing defects. Bidisperse foam films mechanical behavior is either close to monodisperse or polydisperse foam films respectively for high or small e⁄D ̅_b ratio

Thesis (Ph. D.)--State University of New York at Binghamton, Department of Materials Science, 2006. / Includes bibliographical references.

In this thesis the concept of inhomogeneous dielectrics is demonstrated for various optical coating applications. Compositionally-varying silicon oxynitride (SiON) dielectric layers, with the refractive index varying as a function of position, are grown by computer-controlled plasma-enhanced chemical vapor deposition (PECVD) using silane, nitrogen, and nitrous oxide reactant gases. Compositionally graded and superlattice-like SiON layers are grown and their compositional profiles are confirmed by Auger electron spectroscopy sputter profiling. Inhomogeneous antireflection coatings and rugate filters, with sinusoidally varying refractive index profiles, are designed and fabricated and their measured spectral responses are found to be in excellent agreement with simulated results. Alternating-current thin film electroluminescent (ACTFEL) devices with multiple layer dielectrics also are designed, fabricated, and the insulating layers are shown to increase the optical outcoupling efficiency of an ACTFEL devices by approximately 14 % compared to that of a conventional ACTFEL structure. / Graduation date: 1993

Vertically aligned nanocomposite (VAN) thin films have recently stimulated significant research interest to achieve better material functionality or multifunctionalities. In VAN thin films, both phases grow epitaxially in parallel on given substrates and form a unique nano-checkerboard structure. Multiple strains, including the vertical strain which along the vertical interface and the substrate induced strain which along the film and substrate interface, exist in VAN thin films. The competition of these strains gives a promise to tune the material lattice structure and future more the nanocomposite film physical properties. Those two phases in the VAN thin films are selected based on their growth kinetics, thermodynamic stability and epitaxial growth ability on given substrates. In the present work, we investigated unique epitaxial two-phase VAN (BiFeO3)x:(Sm2O3)1-x and (La0.7Sr0.3MnO3)x:(Mn3O4)1-x thin film systems by pulsed laser deposition. These VAN thin films exhibit a highly ordered vertical columnar structure with good epitaxial quality. The strain of the two phases can be tuned by deposition parameters, e.g. deposition frequency and film composition. Their strain tunability is found to be related directly to the systematic variation of the column widths and domain structures. Their physical properties, such as dielectric loss and ferromagnetisms can be tuned systematically by this variation. The growth morphology, microstructure and material functionalities of VAN thin films can be varied by modifying the phase ratio, substrate orientation or deposition conditions. Systematic study has been done on growing (SrTiO3)0.5:(MgO)0.5 VAN thin films on SrTiO3 and MgO substrates, respectively. The variation of column width demonstrates the substrate induced strain plays another important role in the VAN thin film growth. The VAN thin films also hold promise in achieving porous thin films with ordered nanopores by thermal treatment. We selected (BiFeO3)0.5:(Sm2O3)0.5 VAN thin films as a template and get uniformly distributed bi-layered nanopores. Controllable porosity can be achieved by adjusting the microstructure of VAN (BiFeO3):(Sm2O3) thin films and the annealing parameters. In situ heating experiments within a transmission electron microscope column provide direct observations into the phases transformation, evaporation and structure reconstruction during the annealing. Systematic study in this dissertation demonstrate that the vertically aligned nanocomposite microstructure is a brand new architecture in thin films and an exciting approach that promises tunable material functionalities as well as novel nanostructures.

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Akademisk avhandling--Uppsala, 2003. / Bibliogr. p. 368-397. Filmogr. p. 398-404.

Thesis--Auburn University, 2006. / Abstract. Includes bibliographic references (p.94-97).