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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Chemical applications of ultra-high vacuum techniques

Lawrence, Charles P. January 1967 (has links)
No description available.
2

Surface reactions, solvation, and adsorption phenomena of electrolytic adlayers on metal surfaces /

Lim, Seng Woon. January 2000 (has links)
Thesis (Ph. D.)--University of Washington, 2000. / Vita. Includes bibliographical references (leaves 200-218).
3

A new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts

許小亮, Xu, Xiaoliang. January 1996 (has links)
published_or_final_version / Physics / Master / Master of Philosophy
4

Temperature programmed desorption of graphene oxide under ultra-high vacuum /

Field, Daniel Alexander, January 1900 (has links)
Thesis (M.S.)--Texas State University--San Marcos, 2008. / Vita. Includes bibliographical references (leaves 61-63). Also available on microfilm.
5

A new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts /

Xu, Xiaoliang. January 1996 (has links)
Thesis (M. Phil.)--University of Hong Kong, 1997. / Includes bibliographical references (leaf 151-152).
6

Investigation of the solid-liquid interface of systems with fuel cell and semiconductor applications /

Sauer, David Edward, January 1994 (has links)
Thesis (Ph. D.)--University of Washington, 1994. / Vita. Includes bibliographical references (leaves [163]-174).
7

Atomistic interactions in STM atom manipulation

Deshpande, Aparna. January 2007 (has links)
Thesis (Ph.D.)--Ohio University, March, 2007. / Title from PDF t.p. Includes bibliographical references.
8

Investigation of Gas-Surface Dynamics Using an Ar Atomic Beam and Functionalized Self-Assembled Monolayers

Shuler, Shelby 22 May 2002 (has links)
Interactions of gas-phase molecules with surfaces are important in many ordinary events, such as ozone depletion, corrosion of metals, and heterogeneous catalysis. These processes are controlled by the bonding, diffusion, and reactivity of the impinging gas species. Our research employs molecular beam techniques and well-characterized surfaces to study these processes. The goal of this study is to better understand how the physical and chemical nature of the surface interface influences energy transfer dynamics in gas-surface collisions. An atomic beam is used to probe the energy transfer dynamics in collisions of Argon with model surfaces of functionalized self-assembled monolayers (SAMs) (1-dodecanethiol and 11-mercapto-1-undecanol) on gold. The beam is directed towards the surface at an incident angle of 30 degrees and the scattered Ar atoms are detected at the specular angle of 30 degrees. Time-of-flight scans measure the velocity distributions of atoms leaving the surface, which correlate with the energy transfer dynamics of the impinging gas atoms. Gas-surface energy transfer experiments are accomplished by directing an 80 kJ/mol Ar atomic beam at a clean Au(111) surface and surfaces composed of hydroxyl-terminated or methyl-terminated SAMs on Au(111). The fractional energy transferred to the bare gold surface is 69 %, while it is grater than 77 % for the monolayer-covered surfaces. The extent of thermalization on the surface during the collision is significantly greater for the methyl-terminated surface than for the hydroxyl-terminated surface. Since the two monolayers are similar in structure, packing density, and mass, the differences in scattering dynamics are likely due to a combination of factors that may include differences in the available energy modes between the two terminal groups and the hydrogen-bonding nature of the hydroxyl-terminated SAM. / Master of Science
9

Μελέτη της ηλεκτρονικής δομής διεπιφανειών οργανικών υμενίων με ανόργανα υποστρώματα με τη χρήση επιφανειακά ευαίσθητων τεχνικών / Study of the interfacial electronic structure of organic films with inorganic substrates using surface sensitive techniques

Παπαευθυμίου, Βασιλική 25 June 2007 (has links)
Η κατασκευή συσκευών μικροηλεκτρονικής με οργανικούς ημιαγωγούς όπως τρανζίστορς και φωτοεκπομποί δίοδοι οργανικών (FETs, OLEDs), αναπτύσσεται ταχύτατα τα τελευταία χρόνια. Οι φυσικές και χημικές αλληλεπιδράσεις που συμβαίνουν στις διεπιφάνειες των οργανικών με τα ηλεκτρόδια παίζουν καθοριστικό ρόλο στη λειτουργία τέτοιων συσκευών και επομένως η μελέτη της διεπιφανειακής ηλεκτρονικής δομής είναι σημαντική για την κατανόηση της λειτουργίας αυτών των διατάξεων. Στην παρούσα εργασία η ηλεκτρονική δομή των διεπιφανειών ενός συζυγιακού ολιγομερούς (Ooct-OPV5) με ανόργανα υποστρώματα, συγκεκριμένα το οξείδιο Ινδίου-Κασσιτέρου (ITO), τον πολυκρυσταλλικό Au, την επιφάνεια Si(111) (Si με προσμίξεις τύπου –Ν και -P) και υπέρλεπτα υμένια SiO2(1-5 nm) / Si(111), μελετήθηκε με φασματοσκοπίες φωτοηλεκτρονίων από ακτίνες –Χ και υπεριώδες (XPS, UPS). Το Ooct-OPV5 χρησιμοποιείται ως πρότυπο για το poly(p-phenylenevinylene) (PPV), ένα πολυμερές που έχει ήδη χρησιμοποιηθεί σε συσκευές OLEDs. Το ITO χρησιμοποιείται ως άνοδος στα OLEDs επειδή είναι διαφανές και έχει υψηλή ηλεκτρική αγωγιμότητα. Ο χρυσός είναι αδρανές υπόστρωμα που χρησιμοποιείται ως ηλεκτρόδιο στα FETs. Τέλος, η μελέτη διεπιφανειών του οργανικού με το Si παρουσιάζει ενδιαφέρον, προκειμένου να ενσωματωθούν οι οργανικοί ημιαγωγοί σε μικροηλεκτρονικές συσκευές με βάση το Si. Η μελέτη έγινε σε σύστημα υπερυψηλού κενού (UHV) με τις τεχνικές XPS και UPS. Τα υποστρώματα καθαρίζονταν in-situ με ιοντοβολή με Ar+ και θέρμανση. Ακολούθως γινόταν σταδιακή απόθεση του ολιγομερούς και παρασκευάζονταν υπέρλεπτα υμένια (πάχους ~10 nm) πάνω στα καθαρά υποστρώματα. Σε κάθε στάδιο της απόθεσης λαμβάνονταν τα φάσματα XPS του οργανικού και των υποστρωμάτων. Από την ανάλυση των φασμάτων αυτών προσδιορίζονται οι διεπιφανειακές αλληλεπιδράσεις και η μεταβολή της κάμψης των ζωνών των ημιαγώγιμων υλικών. Με τη φασματοσκοπία UPS μελετάται η ζώνη σθένους της διεπιφάνειας και μετράται η διεπιφανειακή διπολική στοιβάδα. Από το συνδυασμό των πειραματικών αποτελεσμάτων μπορούν να κατασκευάζονται σχηματικά διαγράμματα των ζωνών στις διεπιφάνειες. Με βάση τα πειραματικά αποτελέσματα καταλήγουμε στα εξής συμπεράσματα: Στις διεπιφάνειες του ολιγομερούς με το ITO, τον Au, το Si (τύπου -p) και το SiO2(1-1.8 nm)/Si(111) υπάρχει διεπιφανειακή διπολική στοιβάδα (eD) ενώ στη διεπιφάνεια Ooct-OPV5/ Si (τύπου -n) όχι. Αυτά τα διεπιφανειακά δίπολα σχετίζονται με την ύπαρξη διεπιφανειακών καταστάσεων και εξυπηρετούν τη μεταφορά φορτίου μεταξύ των υλικών που έρχονται σε επαφή στα πρώτα στάδια του σχηματισμού των διεπιφανειών. Κατά το σχηματισμό της διεπιφάνειας Ooct-OPV5/ Si (τύπου - p), το eD σχετίζεται με την αλληλεπίδραση των μορίων του ολιγομερούς με τις επιφανειακές καταστάσεις του Si. Στις διεπιφάνειες Ooct-OPV5/ με Au και Si, η μεταφορά φορτίου ολοκληρώνεται με τη μεταβολή της κάμψης των ζωνών του οργανικού υμενίου κατά ~0.20 eV. Τα φράγματα έγχυσης οπών (eΦbh) ή τα valence band offsets (ΔEV) καθορίστηκαν επίσης σε όλες τις περιπτώσεις. Στη διεπιφάνεια Ooct-OPV5 / Au το eΦbh μετρήθηκε 1.05 eV και επομένως ο Au είναι ακατάλληλο ηλεκτρόδιο για την έγχυση οπών. Το ITO αποδεικνύεται επίσης ακατάλληλο (eΦbh=1.45 eV) και η επιφάνειά του θα πρέπει να υφίσταται κατεργασία προκειμένου να χρησιμοποιείται ως άνοδος σε συσκευές OLEDs. Στην περίπτωση του Si, το valence band offset μεταξύ αυτού και του ολιγομερούς βρέθηκε ~0.4 eV. Η παραπέρα τροποποίηση της επιφάνειας του Si(111) με υπέρλεπτα υμένια SiO2 αυξάνει το ΔEV κατά ~0.2 eV. / The development of organic-based devices, like transistors and light emitting diodes (FETs, OLEDs), is progressing rapidly over the past few years. A great deal of the physics and chemistry that govern the performance of such devices occur at the interfaces between the organic components and the inorganic electrodes, making the study of the interfacial electronic properties essential. In this work, the electronic structure of the interface formed between a conjugated oligomer (Ooct-OPV5) and inorganic substrates, ιn particular indium-tin oxide (ITO), polycrystalline Au, the Si(111) surface (Si n- and p-doped), and ultrathin (1-5 nm) SiO2 films on Si(111), was studied by X-ray and Ultraviolet photoelectron spectroscopies (XPS, UPS). Ooct-OPV5 is a model for poly(p-phenylenevinylene) (PPV), a polymer that has already been used in OLEDs. ITO is the common anode used in OLEDs because of its transparency and high electrical conductivity. Gold was chosen due to its inert nature and because it is used as a source/drain in FETs. Finally, the study of organic/silicon structures is of great importance for the incorporation of organics in Si-based microelectronic systems. All XPS and UPS measurements were carried out in an ultrahigh vacuum (UHV) apparatus. All substrates were cleaned in-situ by Ar+ sputtering and annealing. High purity oligomer films of up to ~10 nm thickness were produced in-situ by stepwise deposition on the clean substrates. The evolution of the oligomer and substrate-related XPS peaks was followed during Ooct-OPV5 deposition on all substrates. Analysis of these spectra clarified the interfacial chemistry and band bending in the semiconducting materials. UPS spectroscopy is used for the determination of the valence band at the interface and the interfacial dipoles. The interfacial energy band diagrams were deduced in all cases from the combination of experimental results. Based on our experimental data we reached the following conclusions: Dipoles are formed at the interfaces of the oligomer with ITO, Au, Si (p-doped) and SiO2(1-1.8 nm)/Si(111), while the Ooct-OPV5/ Si (n-doped) interface is dipole free. These interface dipoles (eD) are related to the existence of interfacial states and serve for the charge transfer between the materials in contact at the initial stages of the interface formation. In the case of the Ooct-OPV5/ Si (p-doped) interface, eD is related to the interaction of the oligomer molecules with Si surface states. At the Ooct-OPV5/Au and Si interfaces, the charge transfer is completed with a band bending of ~0.20 eV in the oligomer film. The hole injection barriers (eΦbh) or valence band offsets (ΔEV) were also determined in all interfaces. This barrier was measured 1.05 eV at the Ooct-OPV5/ Au interface, and thus Au is inappropriate electrode for hole injection. ITO is also proved a poor hole-injecting electrode (eΦbh=1.45 eV), and thus its surface should be modified by treatments when used as an anode in OLEDs. On the other hand, the valence band offset between the Si substrate and the oligomer is measured ~0.4 eV. Modification of the Si(111) surface with ultra-thin SiO2 layers increases ΔEV by ~0.2 eV.
10

Temperature control instrumentation for scanning tunnelling microscopy

Visser, Jason Willem 04 June 2008 (has links)
This thesis describes three different design projects that are intellectually connected by the fact that they all involve the development of apparatus to facilitate the precise control of sample temperature in modern microscopes. The first project is a low-temperature sample stage, for a beetle-type scanning tunnelling microscope. The design for this sample stage, and images taken on it with atomic resolution at 114 K are presented. This stage has the capability for variable-temperature sample cooling, which is also discussed. The second project is a set of low- and variable-temperature isothermal radiation shields for a new microscope that is currently being designed and assembled by our research group. These shields provide temperature control between 5 K and room temperature, with measured stability better than +/- 0.1 K. Controlled and stable temperature changes at rates up to 1.5 K per minute have been produced. The shields are modular and can easily accommodate future modifications. The design for the shields, along with their cooling and temperature control capabilities, is presented. The third project is a new stage design for heating, cleaning, and transferring metal and semiconductor samples. Also for use with the new microscope, this stage uses electron bombardment to provide precision temperature control between room temperature to temperatures in excess of 1250 C‰. With this stage, the sample temperature can be determined by measuring the power applied to the sample. The design of this stage, its heating performance, and a method to calculate the sample temperature is presented. / Thesis (Master, Physics, Engineering Physics and Astronomy) -- Queen's University, 2008-06-03 12:47:18.808

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