The low-field magnetoresistance of colossal magnetic thin film can be enhanced by proton implantation. Compare with the as grown sample, the implantation samples has lower transition temperature and higher resistivity. By the hall measurement, we can get the carrier type and carrier concentration. The hall magnetoresistance (MRH) is much greater than the longitude magnetoresistance (MR). Chapter 1. Introduce experiment purpose and expected results. Chapter 2. Introduce the basic theorem of colossal magnetic materials. Chapter 3. The steps of experiment. Chapter 4. Results and discussion. Chapter 5. The conclusion.

In modern times the increasing complexity of transistors and their constant decreasingsize require more effective techniques to display and interpret the processes that are inside of devices. In this work, we are modeling a two‐dimensional n‐MOSFET with a long channeland uniformly doped substrate. We assume that this device is a large geometry device so that short‐channel and narrow‐width effects can be neglected. As a result of the thesis, a demonstration program was built. In this executable file, the user can choose parameters of the MOSFET‐model: drain and gate voltage, and different geometrical parameters of the device (junction depth and effective channel length). In the advanced regime of the program, the user can also specify the model re‐calculation parameter, doping concentration in n+ and bulk regions. The program shows the channel between the source and drain region with surface diagrams of carrier density and potential energy as an output. It is possible to save all calculated results to a file and process it in any other program, for example, plot graphics in Matlab or Matematica. The model can be used in lectures that are related to semiconductor physics in order to explain the basic working mechanisms of MOSFETs as well as for further detailed analysis of the processes in MOSFETs. It is possible to use our modeling techniques to rebuild the model in another computer language, or even to build other models of transistors, performing similar calculations and approximations. It is possible to download the executable file of the model here: http://studentdevelop.com/projects/MOSFET_model.zip

The doping concentration and resistivity of tin doped Gallium arsenide nanowires (GaAs NWs) have been investigated using Hall effect-, 4-probe-, transmission line-, and field effect measurements. Single nanowires were contacted using electron beam lithography followed by thermal evaporation of Au/Ti (900/100 Å). The Sn precursor (TESn) molar ratios of the investigated nanowires were 8.5·10-7, 1.7·10-6, 3.4·10-6 and 6.8·10-6 resulting in doping concentrations ranging from 4.64·1013 to 2.11·1017 cm-3 and resistivities from ~0.01 to ~1 Ωcm. The yield of the device fabrication was 2.4-7.1 % and evaluation of additional samples should be done in order to establish the validity of the results. The contact material was proved to work well with the higher doped samples but non-ohmic, highly resistive behavior was seen in the lower doped devices. A resistivity gradient along the length of the nanowires was found to be present, most likely the result of a doping gradient. The sample series with TESn molar ratio 1.7·10-6 showed more tapering than the other series possibly leading to a highly doped shell, which was indicated by 4-probe measurements.

The objective of this dissertation is to understand the structural and optoelectronic properties of group III-nitride materials grown by High-Pressure Metal Organic Chemical Vapor Deposition (HP-MOCVD) and Migration Enhanced Plasma Assisted MOCVD by FTIR reflectance spectroscopy, Raman spectroscopy, X-ray diffraction, and Atomic Force Microscopy. The influence of the substrates/templates (Sapphire, AlN, Ga-polar GaN, N-polar GaN, n-GaN, and p-GaN) on the free carrier concentration, carrier mobility, short-range crystalline ordering, and surface morphology of the InN layers grown on HP-MOCVD were investigated using those techniques. The lowest carrier concentration of 7.1×1018 cm-3 with mobility of 660 cm2V-1s-1 was found in the InN film on AlN template, by FTIR reflectance spectra analysis. Furthermore, in addition to the bulk layer, an intermediate InN layers with different optoelectronic properties were identified in these samples. The best local crystalline order was observed in the InN/AlN/Sapphire by the Raman E2 high analysis. The smoothest InN surface was observed on the InN film on p-GaN template. The influence of reactor pressures (2.5–18.5 bar) on the long-range crystalline order, in plane structural quality, local crystalline order, free carrier concentration, and carrier mobility of the InN epilayers deposited on GaN/sapphire by HP-MOCVD has also been studied using those methods. Within the studied process parameter space, the best material properties were achieved at a reactor pressure of 12.5 bar and a group-V/III ratio of 2500 with a free carrier concentration of 1.5x1018 cm-3, a mobility in the bulk InN layer of 270 cm2 V-1s-1 and the Raman (E2 high) FWHM of 10.3 cm-1. The crystalline properties, probed by XRD 2θ–ω scans have shown an improvement with the increasing reactor pressure. The effect of an AlN buffer layer on the free carrier concentration, carrier mobility, local crystalline order, and surface morphology of InN layers grown by Migration-Enhanced Plasma Assisted MOCVD were also investigated. Here, the AlN nucleation layer was varied to assess the physical properties of the InN layers. This study was focused on optimization of the AlN nucleation layer (e.g. temporal precursor exposure, nitrogen plasma exposure, and plasma power) and its effect on the InN layer properties.

An experimental investigation of the electronic transport properties of bismuth telluride nanocomposite materials is presented. The primary transport measurements are electrical conductivity, Seebeck coefficient and Hall effect. An experimental apparatus for measuring Hall effect and electrical conductivity was designed, constructed and tested. Seebeck coefficient measurements were performed on a commercial instrument. The Hall effect and Seebeck coefficient measurements are two of the most important tools for characterizing thermoelectric materials and are widely used in the semiconductor industry for determining carrier types, carrier concentration and mobility. Further, these transport parameters are used to determine the thermal to electrical conversion efficiency of a thermoelectric material. The Boltzmann transport equation was used to analyze the Seebeck coefficient, carrier mobility and electrical conductivity as a function of carrier concentration for eleven samples. The relationship between the electronic transport and material/composite composition is discussed.

abstract: The challenging search for clean, reliable and environmentally friendly energy sources has fueled increased research in thermoelectric materials, which are capable of recovering waste heat. Among the state-of-the-art thermoelectric materials β-Zn4Sb3 is outstanding because of its ultra-low glass-like thermal conductivity. Attempts to explore ternary phases in the Zn-Sb-In system resulted in the discovery of the new intermetallic compounds, stable Zn5Sb4In2-δ (δ=0.15) and metastable Zn9Sb6In2. Millimeter-sized crystals were grown from molten metal fluxes, where indium metal was employed as a reactive flux medium.Zn5Sb4In2-δ and Zn9Sb6In2 crystallize in new structure types featuring complex framework and the presence of structural disorder (defects and split atomic positions). The structure and phase relations between ternary Zn5Sb4In2-δ, Zn9Sb6In2 and binary Zn4Sb3 are discussed. To establish and understand structure-property relationships, thermoelectric properties measurements were carried out. The measurements suggested that Zn5Sb4In2-δ and Zn9Sb6In2 are narrow band gap semiconductors, similar to β-Zn4Sb3. Also, the peculiar low thermal conductivity of Zn4Sb3 (1 W/mK) is preserved. In the investigated temperature range 10 to 350 K Zn5Sb4In2-δ displays higher thermoelectric figure of merits than Zn4Sb3, indicating a potential significance in thermoelectric applications. Finally, the glass-like thermal conductivities of binary and ternary antimonides with complex structures are compared and the mechanism behind their low thermal conductivities is briefly discussed. / Dissertation/Thesis / Ph.D. Chemistry 2011

Film thickness, free carrier concentration and free carrier mobility are critical figures of merit for silicon carbide epitaxial growth. Room temperature Fourier Transform Infrared (FTIR) reflection spectroscopy can estimate these parameters non-destructively and is capable of high-resolution wafer mapping. Commercially available equipment has greatly simplified the application of this technique by coupling a high performance automated spectrometer with model-based data analysis and interpretation based on the personal computer. While powerful numerical techniques run fast and efficient on modern computers, it is essential that low-order, well-conditioned models are needed. The observed reflectance spectrum is the result of reflection and refraction of light at different interfaces due to constructive and destructive interference. The estimation of film thickness and free carrier concentration for single epitaxial layers has been improved by studying the Longitudinal Optical Phonon Plasmon (LPP) coupled modes. However, the addition of multiple layers introduces many degrees of freedom, which complicates parameter extraction. The multiple epitaxial layer stacks studied were intended for Metal Semiconductor Field Effect Transistor (MESFET?s) on both conducting and semi-insulating substrates. The thickness estimation of the n-channel in the MESFET stack on semi-insulating substrate is improved by preconditioning the curve fit for plasma frequency obtained from doping estimation from capacitance voltage profiling or by observing an LPP- peak.

Near-field optical microscopy has attracted remarkable attention, as it is the only technique that allows the investigation of local optical properties with a resolution far below the diffraction limit. Especially, the scattering-type near-field optical microscopy allows the nondestructive examination of surfaces without restrictions to the applicable wavelengths. However, its usability is limited by the availability of appropriate light sources. In the context of this work, this limit was overcome by the development of a scattering-type near-field microscope that uses a widely tunable free-electron laser as primary light source. In the theoretical part, it is shown that an optical near-field contrast can be expected when materials with different dielectric functions are combined. It is derived that these differences yield different scattering cross-sections for the coupled system of the probe and the sample. Those cross-sections define the strength of the near-field signal that can be measured for different materials. Hence, an optical contrast can be expected, when different scattering cross-sections are probed. This principle also applies to vertically stacked or even buried materials, as shown in this thesis experimentally for two sample systems. In the first example, the different dielectric functions were obtained by locally changing the carrier concentration in silicon by the implantation of boron. It is shown that the concentration of free charge-carriers can be deduced from the near-field contrast between implanted and pure silicon. For this purpose, two different experimental approaches were used, a non-interferometric one by using variable wavelengths and an interferometric one with a fixed wavelength. As those techniques yield complementary information, they can be used to quantitatively determine the effective carrier concentration. Both approaches yield consistent results for the carrier concentration, which excellently agrees with predictions from literature. While the structures of the first system were in the micrometer regime, the capability to probe buried nanostructures is demonstrated at a sample of indium arsenide quantum dots. Those dots are covered by a thick layer of gallium arsenide. For the first time ever, it is shown experimentally that transitions between electron states in single quantum dots can be investigated by near-field microscopy. By monitoring the near-field response of these quantum dots while scanning the wavelength of the incident light beam, it was possible to obtain characteristic near-field signatures of single dots. Near-field contrasts up to 30 % could be measured for resonant excitation of electrons in the conduction band of the indium arsenide dots. / Die optische Nahfeldmikroskopie hat viel Beachtung auf sich gezogen, da sie die einzige Technologie ist, welche die Untersuchung lokaler optischer Eigenschaften mit Auflösungen unterhalb der Beugungsgrenze ermöglicht. Speziell die streuende Nahfeldmikroskopie erlaubt die zerstörungsfreie Untersuchung von Oberflächen ohne Einschränkung der verwendbaren Wellenlängen. Die Nutzung ist jedoch durch das Vorhandensein entsprechender Lichtquellen beschränkt. Im Rahmen dieser Arbeit wurde diese Beschränkung durch Entwicklung eines streuenden Nahfeldmikroskops überwunden, das einen weit stimmbaren Freie-Elektronen-Laser als primäre Lichtquelle benutzt. Im theoretischen Teil wird gezeigt, dass ein optischer Kontrast erwartet werden kann, wenn Materialien mit unterschiedlichen Dielektrizitätskonstanten kombiniert werden. Es wird hergeleitet, dass diese Unterschiede in unterschiedlichen Streuquerschnitten für das gekoppelte System aus Messkopf und Probe resultieren. Diese Streuquerschnitte definieren die Stärke des Nahfeldsignals, welches auf unterschiedlichen Materialien gemessen werden kann. Ein optischer Kontrast kann also erwartet werden, wenn unterschiedliche Streuquerschnitte untersucht werden. Dass dieses Prinzip auch auf übereinander geschichtete oder sogar verborgene Strukturen angewendet werden kann, wird in dieser Doktorarbeit an zwei Probensystemen experimentell gezeigt. Im ersten Beispiel wurden die unterschiedlichen Dielektrizitätskonstanten durch örtliches Ändern der Ladungsträgerdichte in Silizium durch Bor-Implantation erreicht. Es wird gezeigt, dass die Dichte der freien Ladungsträger an Hand des optischen Kontrastes zwischen implantiertem und reinem Silizium ermittelt werden kann. Zu diesem Zweck wurden zwei unterschiedliche Ansätze verwendet, ein nicht-interferometrischer mittels variabler Wellenlängen und ein interferometrischer mit einer konstanten Wellenlänge. Weil diese Techniken gegensätzliche Informationen liefern, können sie genutzt werden, um die effektive Ladungsträgerdichte quantitativ zu bestimmen. Beide Ansätze lieferten konsistente Resultate für die Trägerdichte, welche sehr gut mit den Vorhersagen der Literatur übereinstimmt. Während die Strukturen im ersten Beispiel im Mikrometer-Bereich lagen, wird die Möglichkeit, verborgene Nanostrukturen zu untersuchen, an Hand einer Probe mit Indiumarsenid Quantenpunkten demonstriert. Diese sind von einer dicken Schicht Galliumarsenid bedeckt. Zum ersten Mal wird experimentell gezeigt, dass Übergänge zwischen Elektronenzuständen in einzelnen Quantenpunkten mit Nahfeldmikroskopie untersucht werden können. Durch die Messung der Nahfeld-Antwort der Quantenpunkte unter Änderung der Wellenlänge des eingestrahlten Lichtes war es möglich, charakteristische Nahfeld-Signaturen der einzelnen Quantenpunkte zu erhalten. Nahfeld-Kontraste bis zu 30 Prozent konnten für die resonante Anregung der Elektronen im Leitungsband der Indiumarsenid Punkte beobachtet werden.

A fully automated Temperature Dependent Hall (TDH) measurement setup has been assembled for the purposes of this study. This TDH setup is capable of measuring samples in the 20 K to 370 K temperature range. Sample sizes of up to 20 mm × 20 mm can be accommodated by the custom designed and manufactured sample holder. Samples with a resistance in the 1Ω to 250 MΩ range can be measured with this setup provided that the mobility of the sample is greater than 1 cm²/Vs. The computer program controlling the automated measurement processwas written in LabView™ version 6.1. Single crystal Zinc Oxide (ZnO) was the material under investigation in this study. Bulk ZnO samples grown by three different methods, namely pressurized melt growth, seeded chemical vapor transport (SCVT) growth and hydrothermal growth, were measured in the 20 K to 370 K range. The effect of annealing in argon atmosphere in the 550 ºC to 930 ºC range was investigated on all three ZnO types. In addition, hydrogen-implanted layers on semi-insulating hydrothermally grown ZnO were studied. These samples were annealed in the 200 ºC to 400 ºC range and Hall measurements in the 20 K to 330 K range were performed. Programs were written to fit, wherever possible, the obtained temperature dependent carrier concentration and mobility profiles to suitable theoretical models. The carrier concentration data was fitted to a multi-donor single acceptor charge balance equation for the purpose of extracting donor concentrations and activation energies. Before fitting, the data was corrected for the Hall scattering factor and, where necessary, for two-layer effects particularly a degenerate surface conduction channel that developed through annealing on the SCVT-grown and hydrothermally grown samples. The acceptor concentrations of the samples were obtained by fitting the mobility data to a model based on D.L. Rode’s method of solving the Boltzmann transport equation. Scattering mechanisms included in the model were piezoelectric and deformation potential acoustic modes, polar optic modes and ionized impurity scattering. It was found that the mobility data did not fit the model very well without assigning questionable values to other parameters, in this case the deformation potential. Plausible values for the acceptor concentration were however obtained. The carrier concentration data fitted the model well, but due to the large number of parameters to be extracted (up to six parameters in the case of three donors) there was often not much certainty in the extracted values This study shows that TDH analysis is a valuable tool to assess the quality of semiconductors. Bulk and degenerate surface (or interfacial) conduction are separated with relative ease, and shallow defect concentrations as well as compensation level concentrations could be extracted. The generally observed uncertainty in values obtained in the multi-parameter regression of carrier concentration data indicates that supplementary techniques such as photoluminescence are needed to support results obtained by the TDH technique. / Dissertation (MSc (Physics))--University of Pretoria, 2007. / Physics / MSc / unrestricted

Near-field optical microscopy has attracted remarkable attention, as it is the only technique that allows the investigation of local optical properties with a resolution far below the diffraction limit. Especially, the scattering-type near-field optical microscopy allows the nondestructive examination of surfaces without restrictions to the applicable wavelengths. However, its usability is limited by the availability of appropriate light sources. In the context of this work, this limit was overcome by the development of a scattering-type near-field microscope that uses a widely tunable free-electron laser as primary light source. In the theoretical part, it is shown that an optical near-field contrast can be expected when materials with different dielectric functions are combined. It is derived that these differences yield different scattering cross-sections for the coupled system of the probe and the sample. Those cross-sections define the strength of the near-field signal that can be measured for different materials. Hence, an optical contrast can be expected, when different scattering cross-sections are probed. This principle also applies to vertically stacked or even buried materials, as shown in this thesis experimentally for two sample systems. In the first example, the different dielectric functions were obtained by locally changing the carrier concentration in silicon by the implantation of boron. It is shown that the concentration of free charge-carriers can be deduced from the near-field contrast between implanted and pure silicon. For this purpose, two different experimental approaches were used, a non-interferometric one by using variable wavelengths and an interferometric one with a fixed wavelength. As those techniques yield complementary information, they can be used to quantitatively determine the effective carrier concentration. Both approaches yield consistent results for the carrier concentration, which excellently agrees with predictions from literature. While the structures of the first system were in the micrometer regime, the capability to probe buried nanostructures is demonstrated at a sample of indium arsenide quantum dots. Those dots are covered by a thick layer of gallium arsenide. For the first time ever, it is shown experimentally that transitions between electron states in single quantum dots can be investigated by near-field microscopy. By monitoring the near-field response of these quantum dots while scanning the wavelength of the incident light beam, it was possible to obtain characteristic near-field signatures of single dots. Near-field contrasts up to 30 % could be measured for resonant excitation of electrons in the conduction band of the indium arsenide dots. / Die optische Nahfeldmikroskopie hat viel Beachtung auf sich gezogen, da sie die einzige Technologie ist, welche die Untersuchung lokaler optischer Eigenschaften mit Auflösungen unterhalb der Beugungsgrenze ermöglicht. Speziell die streuende Nahfeldmikroskopie erlaubt die zerstörungsfreie Untersuchung von Oberflächen ohne Einschränkung der verwendbaren Wellenlängen. Die Nutzung ist jedoch durch das Vorhandensein entsprechender Lichtquellen beschränkt. Im Rahmen dieser Arbeit wurde diese Beschränkung durch Entwicklung eines streuenden Nahfeldmikroskops überwunden, das einen weit stimmbaren Freie-Elektronen-Laser als primäre Lichtquelle benutzt. Im theoretischen Teil wird gezeigt, dass ein optischer Kontrast erwartet werden kann, wenn Materialien mit unterschiedlichen Dielektrizitätskonstanten kombiniert werden. Es wird hergeleitet, dass diese Unterschiede in unterschiedlichen Streuquerschnitten für das gekoppelte System aus Messkopf und Probe resultieren. Diese Streuquerschnitte definieren die Stärke des Nahfeldsignals, welches auf unterschiedlichen Materialien gemessen werden kann. Ein optischer Kontrast kann also erwartet werden, wenn unterschiedliche Streuquerschnitte untersucht werden. Dass dieses Prinzip auch auf übereinander geschichtete oder sogar verborgene Strukturen angewendet werden kann, wird in dieser Doktorarbeit an zwei Probensystemen experimentell gezeigt. Im ersten Beispiel wurden die unterschiedlichen Dielektrizitätskonstanten durch örtliches Ändern der Ladungsträgerdichte in Silizium durch Bor-Implantation erreicht. Es wird gezeigt, dass die Dichte der freien Ladungsträger an Hand des optischen Kontrastes zwischen implantiertem und reinem Silizium ermittelt werden kann. Zu diesem Zweck wurden zwei unterschiedliche Ansätze verwendet, ein nicht-interferometrischer mittels variabler Wellenlängen und ein interferometrischer mit einer konstanten Wellenlänge. Weil diese Techniken gegensätzliche Informationen liefern, können sie genutzt werden, um die effektive Ladungsträgerdichte quantitativ zu bestimmen. Beide Ansätze lieferten konsistente Resultate für die Trägerdichte, welche sehr gut mit den Vorhersagen der Literatur übereinstimmt. Während die Strukturen im ersten Beispiel im Mikrometer-Bereich lagen, wird die Möglichkeit, verborgene Nanostrukturen zu untersuchen, an Hand einer Probe mit Indiumarsenid Quantenpunkten demonstriert. Diese sind von einer dicken Schicht Galliumarsenid bedeckt. Zum ersten Mal wird experimentell gezeigt, dass Übergänge zwischen Elektronenzuständen in einzelnen Quantenpunkten mit Nahfeldmikroskopie untersucht werden können. Durch die Messung der Nahfeld-Antwort der Quantenpunkte unter Änderung der Wellenlänge des eingestrahlten Lichtes war es möglich, charakteristische Nahfeld-Signaturen der einzelnen Quantenpunkte zu erhalten. Nahfeld-Kontraste bis zu 30 Prozent konnten für die resonante Anregung der Elektronen im Leitungsband der Indiumarsenid Punkte beobachtet werden.