Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 158-170). Available also in a digital version from Dissertation Abstracts.

Thesis (M.S.)--University of Florida, 2004. / Title from title page of source document. Document formatted into pages; contains 41 pages. Includes vita. Includes bibliographical references.

Thesis (M.S.)--Rutgers University, 2009. / "Graduate Program in Mechanical and Aerospace Engineering." Includes bibliographical references (p. 64-67).

Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.

Thesis (Ph. D.)--School of Materials Science and Engineering, Georgia Institute of Technology, 2004. Directed by Meilin Liu. / Includes bibliographical references (leaves 180-190).

Thesis (Ph. D.)--University of Missouri-Columbia, 1998. / Typescript. Vita. Includes bibliographical references (leaves 154-161). Also available on the Internet.

Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 147-151). Available also in a digital version from Dissertation Abstracts.

Thesis (Ph.D)--Chemical Engineering, Georgia Institute of Technology, 2009. / Committee Chair: Deng,Yulin; Committee Member: Hsieh, Jeffery S.; Committee Member: Nair, Sankar; Committee Member: Singh, Preet; Committee Member: Yao, Donggang. Part of the SMARTech Electronic Thesis and Dissertation Collection.

Thesis (Ph. D.)--Chemistry and Biochemistry, Georgia Institute of Technology, 2010. / Committee Chair: Orlando, Thomas; Committee Member: El-Sayed, Mostafa; Committee Member: First, Phillip; Committee Member: Lackey, Jack; Committee Member: Tolbert, Laren. Part of the SMARTech Electronic Thesis and Dissertation Collection.

Chemical vapor deposition is a process that enables the deposition of thin films material with a high degree of thickness control, composition and film quality. In an ultra-high vacuum environment (UHV), films of high purity and controlled crystal structure can be achieved. The control of the crystal structure is achieved thanks to reduced contamination, e.g. oxygen, which allows the grown film to align itself with the underlying substrate. The film purity is also ensured by the reduced amount of contaminants present in the UHV environment. This master’s thesis discusses the design and construction of a cold wall reactor using a pyrolytic graphite heater encased in a thin layer of pyrolytic boron nitride, and an Oerlikon-Leybold Turbovac 361 turbomolecular pump. This heater is shown to achieve temperatures greater than 1200°C, as well as reach pressures in the 10-10 Torr range. Graphene growth on copper is discussed as well as the ultra-high vacuum annealing of graphene devices on boron nitride substrates. The graphene growth experiments coupled with this system’s annealing capabilities demonstrate the functionality and versatility of this type of chemical vapor deposition system. / text