In past studies, several techniques have been employed to create microscopic features on relatively simple surfaces. Of these, lithography-based techniques have proven effective at manufacturing large fields of deterministic microasperities and microcavities on planar and cylindrical substrates. The present study focuses on adapting UV-lithography to a more complex substrate. Machined from stainless steel, a conical mold insert introduces an interesting geometry designed for the injection molding of radial lip seal elastomer. The distinct shape of this mold insert poises unique challenges to a conventional lithography procedure. Spray application is investigated as a feasible means to deposit layers of photoresist on the surface. An appropriate masking element is designed and created to facilitate transfer of a particular pattern via UV exposure. A clamping technique is implemented to align and secure the photomask. These techniques are incorporated into a three-day process, and results are obtained through optical microscopy and light interferometry. By applying Design of Experiments (DOE) and Analysis of Variance (ANOVA), significant process variables are indentified. Based on these findings, refinements to the process are enabled and future considerations are made evident.