No description available.

In this thesis, we demonstrate in-situ scanning electron microscopy techniques for both electron beam lithography (EBL) and in-situ one dimensional nano materials electrical characterization. A precise voltage contrast image positioning for in-situ EBL to integrate nanowires into suspended structures for nanoswitch fabrication has been developed. The in-situ EBL eliminates the stage movement error and field stitching error by preventing any movements of the stage during the nanolithography process; hence, a high precision laser stage and alignment marks on the substrate are not needed, which simplifies the traditional EBL process. The ZnO piezoelectronics is also studied using nano-manipulators in scanning electron microscope. Methods to improve the contact have been demonstrated and the contacts between probe tips and the nanowires are found to have significant impact on the measurement results.

A inoculação de sementes de leguminosas de grãos tais como soja [Glycine max. (L.)], feijão (Phaseolus vulgaris L.) e pastagens tem sido uma estratégia efetiva e conveniente para introduzir estirpes eficientes de Bradyrhizobium/Rhizobium em solos agrícolas sem histórico de cultivo anterior dessa cultura ou quando as estirpes ivas são ineficientes no processo biológico de aquisição de nitrogênio. Através do uso de substrato turfoso previamente esterilizado como veículo da bactéria, os efeitos ambientais adversos podem ser amenizados, pois este substrato atua diretamente, na sobrevivência da bactéria através do fornecimento de nutrientes. O Brasil requer que os substratos turfosos sejam pré-esterilizados através de radiação gama de cobalto-60 (60Co), sendo recomendada a dose de 50 kGy para uma efetiva eliminação de patógenos e saprófitas, que podem competir com a bactéria introduzida. Recentemente, a utilização de aceleradores de elétrons foi considerada uma nova alternativa de radiação para pré-esterilização da turfa, pois, por se constituir de processo oxidativo avançado, gera radicais altamente reativos, eficientes na eliminação de agentes contaminantes. Esta técnica é considerada ecologicamente mais segura que a radiação gama, além de ser um processo mais rápido. Há, porém, a característica de ter menor profundidade de penetração da radiação em relação ao 60Co. O presente estudo comparou o método usando doses crescentes de radiação gama por 60Co e por feixe de elétrons (0, 10, 20, 30, 40 e 50 kGy). Os dados experimentais (7, 14, 21 e 28 dias para a fase curta e 150, 180 e 210 dias para a fase longa de incubação) mostraram um elevado número de células da bactéria Rhizobium tropici CM-01 gusA+ inoculada em substratos turfosos submetidos aos dois processos de esterilização, sendo que ambos processos atenderam aos padrões mínimos requeridos pelas normas brasileiras (validade de 180 dias e presença acima de 1 x 108 células/g de substrato). Sob doses mais elevadas, acima de 40 kGy, o método por feixe de elétrons foi mais eficiente em eliminar actinobactérias, consideradas sérias antagonistas de bactérias inoculantes em turfas e que surgiram após 150 dias. Em um segundo estudo, usando o isolado CM-01 celB+ por um período de 30 dias, os resultados confirmaram a eficiência do método por feixe de elétrons na fase de crescimento bacteriano, mesmo para dose baixa de 10 kGy. / Inoculation of root nodule bacteria into legume seeds such as soybean [Glycine max. (L.)], common bean (Phaseolus vulgaris L.) and forrage pasture has been effective and convenient as this simple procedure may introduce effective strains of Bradyrhizobium/Rhizobium into agricultural soils without a past history of successful cropping systems with the legume hosts. Peat-based substrates previously sterilized have been used for decades as bacteria carrier, protecting them from the prevailing harsh conditions in tropical soils and ensuring their survival with nutrient and protection against the soil antagonists. The Brazilian Government requires that all peat-based substrates must be gamma-sterilized from a cobalt-60 (60Co) source, prior the introduction of the root nodule bacteria into the package. The recommendation is for a dose up to 50 kGy for an effective suppression of pathogens and saprophytes, in order to avoid competition among the substrate microbiota. Recently, the use of the electron beam (EB) accelerator has shown to be a new alternative for peat pre-sterilization, as this technique may promote reactive free-radicals which are efficient to suppress microbial contaminants. This fast technology is considered more environment and ecology friendly-sound than gamma radiation (γ). The disvantage of not reaching higher depth than gamma rays from 60Co must be considered, and attempts of optimizing the technique are crucial. This study compared both methods by using increasing rates of radiation by 60Co by the EB method - 0, 10, 20, 30, 40 e 50 kGy in a commercial peat used for inoculants. Experimental data from days 7, 14, 21 and 28 days (growth period) and 150, 180 and 210 days (storage period) indicated high numbers of the strain Rhizobium tropici CM-01, labelled with gusA+ (Study 1) and celB+ (Study 2) from both eat-sterilizing techniques, reaching values above the minimum of 1x108 cells g-1 peat. At high rates, above 40 kGy, and after long incubation periods (ex. after 150 days), EB method was more efficient to suppress actinobacteria, one serious antagonist for rhizobia. Strain CM-01 celB+, data for the period of bacterial growth confirmed the efficiency of the method even at rates as low as 10 kGy.

Terahertz (THz) technologies have numerous applications such as biological and medical imaging, security screening, remote sensing, and industrial process control. However, the lack of practical THz sources and detectors is still a significant problem limiting the impact of these applications. In this Thesis work, three novel THz radiation mechanisms are proposed and investigated, based on the distinctive electronic properties of charge carriers in 2D single-layer graphene and related 1D conductors (i.e., graphene nanoribbons and carbon nanotubes), combined with the use of nanoscale dielectric gratings. Numerical simulations as well as fabrication and characterization activities are carried out. The first proposed radiation mechanism is based on the mechanical corrugation of a single-layer sheet of graphene or 1D carbon conductor, deposited on a lithographically-defined sinusoidal grating. In the presence of a dc voltage, carriers will therefore undergo periodic angular motion and correspondingly radiate (similar to cyclotron emission but without the need for any external magnetic field). My numerical simulations indicate that technologically significant output power levels can correspondingly be obtained at geometrically tunable THz frequencies. Initial graphene samples on sinusoidal gratings were fabricated and found to undergo significant strain redistribution, which affects their structural quality. Charge carriers moving in a flat sheet of graphene or linear 1D carbon conductor parallel to a nanoscale grating can also produce THz radiation based on the Smith-Purcell effect. The role of the grating in this case is to diffract the evanescent electromagnetic fields produced by the moving electrons and holes so that THz light can be radiated. Once again, numerical simulations indicate that this approach is promising for the realization of ultra-compact THz sources capable of room-temperature operation. Initial experimental results with ultra-high-mobility graphene samples embedded in boron nitride films show promising THz electroluminescence spectra. The last approach considered in this Thesis involves graphene plasmons at THz frequencies, which can be excited through the decay of hot electrons injected with an applied bias voltage. A nearby grating can then be used to outcouple the guided electromagnetic fields associated with these collective charge oscillations into radiation. The excitation of these THz plasmonic resonances at geometrically tunable frequencies has been demonstrated experimentally via transmission spectroscopy measurements. / 2017-06-21T00:00:00Z

A inoculação de sementes de leguminosas de grãos tais como soja [Glycine max. (L.)], feijão (Phaseolus vulgaris L.) e pastagens tem sido uma estratégia efetiva e conveniente para introduzir estirpes eficientes de Bradyrhizobium/Rhizobium em solos agrícolas sem histórico de cultivo anterior dessa cultura ou quando as estirpes ivas são ineficientes no processo biológico de aquisição de nitrogênio. Através do uso de substrato turfoso previamente esterilizado como veículo da bactéria, os efeitos ambientais adversos podem ser amenizados, pois este substrato atua diretamente, na sobrevivência da bactéria através do fornecimento de nutrientes. O Brasil requer que os substratos turfosos sejam pré-esterilizados através de radiação gama de cobalto-60 (60Co), sendo recomendada a dose de 50 kGy para uma efetiva eliminação de patógenos e saprófitas, que podem competir com a bactéria introduzida. Recentemente, a utilização de aceleradores de elétrons foi considerada uma nova alternativa de radiação para pré-esterilização da turfa, pois, por se constituir de processo oxidativo avançado, gera radicais altamente reativos, eficientes na eliminação de agentes contaminantes. Esta técnica é considerada ecologicamente mais segura que a radiação gama, além de ser um processo mais rápido. Há, porém, a característica de ter menor profundidade de penetração da radiação em relação ao 60Co. O presente estudo comparou o método usando doses crescentes de radiação gama por 60Co e por feixe de elétrons (0, 10, 20, 30, 40 e 50 kGy). Os dados experimentais (7, 14, 21 e 28 dias para a fase curta e 150, 180 e 210 dias para a fase longa de incubação) mostraram um elevado número de células da bactéria Rhizobium tropici CM-01 gusA+ inoculada em substratos turfosos submetidos aos dois processos de esterilização, sendo que ambos processos atenderam aos padrões mínimos requeridos pelas normas brasileiras (validade de 180 dias e presença acima de 1 x 108 células/g de substrato). Sob doses mais elevadas, acima de 40 kGy, o método por feixe de elétrons foi mais eficiente em eliminar actinobactérias, consideradas sérias antagonistas de bactérias inoculantes em turfas e que surgiram após 150 dias. Em um segundo estudo, usando o isolado CM-01 celB+ por um período de 30 dias, os resultados confirmaram a eficiência do método por feixe de elétrons na fase de crescimento bacteriano, mesmo para dose baixa de 10 kGy. / Inoculation of root nodule bacteria into legume seeds such as soybean [Glycine max. (L.)], common bean (Phaseolus vulgaris L.) and forrage pasture has been effective and convenient as this simple procedure may introduce effective strains of Bradyrhizobium/Rhizobium into agricultural soils without a past history of successful cropping systems with the legume hosts. Peat-based substrates previously sterilized have been used for decades as bacteria carrier, protecting them from the prevailing harsh conditions in tropical soils and ensuring their survival with nutrient and protection against the soil antagonists. The Brazilian Government requires that all peat-based substrates must be gamma-sterilized from a cobalt-60 (60Co) source, prior the introduction of the root nodule bacteria into the package. The recommendation is for a dose up to 50 kGy for an effective suppression of pathogens and saprophytes, in order to avoid competition among the substrate microbiota. Recently, the use of the electron beam (EB) accelerator has shown to be a new alternative for peat pre-sterilization, as this technique may promote reactive free-radicals which are efficient to suppress microbial contaminants. This fast technology is considered more environment and ecology friendly-sound than gamma radiation (γ). The disvantage of not reaching higher depth than gamma rays from 60Co must be considered, and attempts of optimizing the technique are crucial. This study compared both methods by using increasing rates of radiation by 60Co by the EB method - 0, 10, 20, 30, 40 e 50 kGy in a commercial peat used for inoculants. Experimental data from days 7, 14, 21 and 28 days (growth period) and 150, 180 and 210 days (storage period) indicated high numbers of the strain Rhizobium tropici CM-01, labelled with gusA+ (Study 1) and celB+ (Study 2) from both eat-sterilizing techniques, reaching values above the minimum of 1x108 cells g-1 peat. At high rates, above 40 kGy, and after long incubation periods (ex. after 150 days), EB method was more efficient to suppress actinobacteria, one serious antagonist for rhizobia. Strain CM-01 celB+, data for the period of bacterial growth confirmed the efficiency of the method even at rates as low as 10 kGy.

This thesis describes the development, characterization andoptimization of compact, high-brightness, liquid-jet-targetx-ray sources. Two different source types have been developedfor different wavelength regions and applications. A laser-plasma source for generating soft x-ray andextreme-ultraviolet radiation has been further developed forsoft x-ray microscopy and extreme-ultraviolet lithography. Thiswork focused on improved target stability, increased conversionefficiency and decreased debris production. For x-raymicroscopy applications using carbon-containingliquid-jetdroplet targets, the droplet stability has beeninvestigated and a method for source stabilization introduced.This source has also been optimized in terms of flux per debriswith respect to target material and size. Forextreme-ultraviolet lithography applications, aliquid-xenon-jet-target laser-plasma source system has beengreatly improved, especially in terms of stability andconversion efficiency. This source has also been characterizedin terms of, e.g., source size, angular distribution, andrepetition-rate capability. For extremeultraviolet lithography,the possible use of tin as a target material has also beenstudied and conversion efficiency and debris measurementsperformed. A new anode concept for electron-impact hard x-ray sourcesbased on high-speed liquidmetal jets has been introduced.Initial calculations show that this new target concept couldpotentially allow more than a hundred-fold increase in sourcebrightness compared to existing state-of-the-art technology. Alow-power, proof-of-principle, experiment has been performed,verifying the basic source concept. Scaling tohigh-poweroperation is discussed and appears plausible. A main obstaclefor high-power operation, the generation of a microscopichigh-speed jet in vacuum, is investigated usingdynamic-similarity experiments and shown to be feasible.Finally, initial medium-power experiments, approaching currentstate-of-the-art sources in terms of brightness, have beenperformed.

No description available.

Electron beam lithography (EBL) and Nanoimprint Lithography (NIL) are the promising tools for today’s technology in terms of resolution capability, fidelity and cost of operation. Achieving highest possible resolution is a key concept for EBL where there is a huge request in applications of nanotechnology for sub-20 nm feature sizes. Defining features at these length scales is a challenge, and there is a large demand for resist that is not only capable of giving high resolution but also having low cost and ease of process. In this work I studied Polystyrene (PS) which is an alternative organic e-beam resist in terms of ease of process and resolution capability. I examined the process of electron-beam exposure and attempted to characterize the factors that affect the achieved resolution and sensitivity. Besides this work, I designed and fabricated a new type of mold for NIL since mold fabrication is a key factor for NIL technology. The resolution of NIL process depends on the mold features and polymer mold technology received great attention in terms of cost of fabrication and process, fidelity, and reliability. I used MD 700 Fluoropolymer as a new type of polymer mold which was believed to be a good candidate for the polymer mold of high throughput NIL.

Electron beam lithography is gaining widespread utilization as the semiconductor industry progresses towards both advanced optical and non-optical lithographic technologies for high resolution patterning. The current resist technologies are based on organic systems that are imaged most commonly through chain scission, networking, or a chemically amplified polarity change in the material. Alternative resists based on inorganic systems were developed and characterized in this research for high resolution electron beam lithography and their interactions with incident electrons were investigated using Monte Carlo simulations. A novel inorganic resist imaging scheme was developed using metal-organic precursors which decompose to form metal oxides upon electron beam irradiation that can serve as inorganic hard masks for hybrid bilayer inorganic-organic imaging systems and also as directly patternable high resolution metal oxide structures. The electron beam imaging properties of these metal-organic materials were correlated to the precursor structure by studying effects such as interactions between high atomic number species and the incident electrons. Optimal single and multicomponent precursors were designed for utilization as viable inorganic resist materials for sub-50nm patterning in electron beam lithography. The electron beam imaging characteristics of the most widely used inorganic resist material, hydrogen silsesquioxane (HSQ), was also enhanced using a dual processing imaging approach with thermal curing as well as a sensitizer catalyzed imaging approach. The interaction between incident electrons and the high atomic number species contained in these inorganic resists was also studied using Monte Carlo simulations. The resolution attainable using inorganic systems as compared to organic systems can be greater for accelerating voltages greater than 50 keV due to minimized lateral scattering in the high density inorganic systems. The effects of loading nanoparticles in an electron beam resist was also investigated using a newly developed hybrid Monte Carlo approach that accounts for multiple components in a solid film. The resolution of the nanocomposite resist process was found to degrade with increasing nanoparticle loading. Finally, the electron beam patterning of self-assembled monolayers, which were found to primarily utilize backscattered electrons from the high atomic number substrate materials to form images, was also investigated and characterized. It was found that backscattered electrons limit the resolution attainable at low incident electron energies.

A three-Dimensional deflection of the electron-beam resulting a missed joint due to thermoelectric magnetism generated in welding dissimilar metal is experi- mentally and analytically investigated. In theoretical analyisis a narrow welding cavity is assumed to be a paraboloid of revolution. Applying a three-dimensional analytical solution of thermolectric currents, magnetic fiux densities, and deflections of the electron beam are determined from Maxwell's electromagnetic equations. The computed magnetic fields,thermoelectric currents and beam deflection will be compared to experimental results. Factors affect-ing deflection are discussed. The major advantage of welding with a high-power-density-electron-beam is the ability to weld dissimilar metals, unfortunately, can be missed. when the beam from the electron gun is properly aligned with the joint, subsequent deflection of the beam can result in nonsymmetric fusion along a joint, or the fusion zone may miss the joint .One reason responsible for the beam deflection is due to thermoelectric magnetic fields. Since temperature gradients exist between the top and bottom and in front and be-hind the deep and narrow cavity ,thermoelectric currents due to the Seebeck effect are produced in dissimilar metals. The induced magnetic field above and below the top surface therefore deflects the electron-beam and induces a missed joint in S-shaped. In this study, experiments will be conducted to measure missed joints. A three-dimensional thermoelectric and heat conduction model is also to predict deflection of an electron-beam From the surroundings and to bulk workpieces, the entire trajectory of the beam can be determined.a more systematical and realistic understanding on missed joint parameters.