• Refine Query
  • Source
  • Publication year
  • to
  • Language
  • 1598
  • 689
  • 348
  • 186
  • 180
  • 93
  • 71
  • 54
  • 46
  • 32
  • 19
  • 18
  • 11
  • 10
  • 7
  • Tagged with
  • 3972
  • 574
  • 489
  • 467
  • 464
  • 428
  • 404
  • 399
  • 370
  • 360
  • 330
  • 315
  • 311
  • 306
  • 306
  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
651

Ultra high vacuum low temperature scanning tunneling microscope for single atom manipulation on molecular beam epitaxy grown samples /

Clark, Kendal. January 2005 (has links)
Thesis (M.S.)--Ohio University, June, 2005. / Includes bibliographical references (p. 46-50)
652

Unraveling photonic bands : characterization of self-collimation in two-dimensional photonic crystals

Yamashita, Tsuyoshi. January 2005 (has links)
Thesis (Ph. D.)--School of Materials Science and Engineering, Georgia Institute of Technology, 2006. / Summers, Christopher, Committee Chair ; Chang, Gee-Kung, Committee Member ; Carter, Brent, Committee Member ; Wang, Zhong Lin, Committee Member ; Meindl, James, Committee Member ; Li, Mo, Committee Member.
653

Study of an optical power splitter with high power capacity using prism coupling and tapered waveguides

Aubuchon, Matthew Stephen. January 2004 (has links)
Thesis (M.S.)--University of Missouri-Columbia, 2004. / Typescript. Includes bibliographical references (leaves 65-67). Also available on the Internet.
654

Titanium dioxide thin films : understanding nanoscale oxide heteroepitaxy for silicon-based applications /

Schmidt, Diedrich A. January 2005 (has links)
Thesis (Ph. D.)--University of Washington, 2005. / Vita. Includes bibliographical references (leaves 106-116).
655

Ultra high vacuum low temperature scanning tunneling microscope for single atom manipulation on molecular beam epitaxy grown samples

Clark, Kendal. January 2005 (has links)
Thesis (M.S.)--Ohio University, June, 2005. / Title from PDF t.p. Includes bibliographical references (p. 46-50)
656

Fabrication and characterization of a double torsional mechanical oscillator and its applications in gold micromass measurements

Lu, Wei, January 1900 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2008. / Vita. Includes bibliographical references.
657

Analysis of residual stresses in laser trimmed alumina microelectronic substrates /

Venzant, Kenneth L., January 1993 (has links)
Thesis (M.S.)--Virginia Polytechnic Institute and State University, 1994. / Vita. Abstract. Includes bibliographical references (leaves 121-126). Also available via the Internet.
658

Θεωρητική και υπολογιστική μελέτη δημιουργίας σύμπλεκτων καταστάσεων με τη χρήση διαχωριστών δεσμών φερμιονίων

Δερλώπα, Σοφία 20 April 2011 (has links)
Στην παρούσα εργασία μελετάμε τη λειτουργία των διαχωριστών δέσμης, καθώς και τη στατιστική κατανομή ενός και δύο σωματιδίων σε απλό και διπλό πηγάδι δυναμικού. Εξετάζουμε υπό ποιες συνθήκες τα δύο αυτά συστήματα μας δίνουν σύμπλεκτες καταστάσεις. Για τους διαχωριστές δέσμης καταλήγουμε στο συμπέρασμα ότι η καταλληλότερη διάταξή τους για να έχουμε μέγιστη απόδοση σύμπλεκτων καταστάσεων, είναι αυτοί να βρίσκονται σε διαδοχική σειρά μεταξύ τους. Από την άλλη μεριά, η μελέτη πηγαδιών δυναμικού, που έγινε γραφικά και αριθμητικά, μας έδειξε ότι τα γεωμετρικά χαρακτηριστικά τού κάθε πηγαδιού, δηλαδή το πάχος και το ύψος του, καθορίζουν τις ιδιοενέργειες τού συστήματος, τις πυκνότητες πιθανότητας των κυματοπακέτων και τελικά την πιθανότητα δημιουργίας σύμπλεκτων καταστάσεων. Γνωρίζοντας τη στατιστική κατανομή των σωματιδίων, ελέγχουμε τη συμπεριφορά τους άρα και την πληροφορία που αυτά μεταφέρουν. Τα παραπάνω βρίσκουν εφαρμογή στα qubits και τους κβαντικούς υπολογιστές. / In the current project we study the function of the beam splitters as well as the statistical behavior of one and two particles in a single and a double quantum well. We examine the conditions under which these two systems provide us with entangled states. For the beam splitters we come to the conclusion that the most appropriate array for having entangled states, is to put them in successive line. On the other hand, the graphical and numerical study of the quantum wells showed that the geometrical characteristics of a quantum well, that is to say thickness and height, define the energy of the system, the density probability of the wave packets and finally the probability for having entangled states. Having knowledge of the statistical behavior of the particles, we may then control the informations that they carry. All the above have many applications in qubits and quantum computers.
659

Contribuicao a cintilografia de alta resolucao e baixa distorcao .Utilizacao de radiofarmacos de baixa energia

DIAS NETO, ALIPIO L. 09 October 2014 (has links)
Made available in DSpace on 2014-10-09T12:23:28Z (GMT). No. of bitstreams: 0 / Made available in DSpace on 2014-10-09T13:57:35Z (GMT). No. of bitstreams: 1 00975.pdf: 8447772 bytes, checksum: 57efc3cd214a3c9ef96ce7216cb7dd50 (MD5) / Tese (Doutoramento) / IEA/T / Faculdade de Medicina, Universidade de Sao Paulo - FM/USP
660

PMMA-Assisted Plasma Patterning of Graphene

Bobadilla, Alfredo D., Ocola, Leonidas E., Sumant, Anirudha V., Kaminski, Michael, Seminario, Jorge M. January 2018 (has links)
Microelectronic fabrication of Si typically involves high-temperature or high-energy processes. For instance, wafer fabrication, transistor fabrication, and silicidation are all above 500°C. Contrary to that tradition, we believe low-energy processes constitute a better alternative to enable the industrial application of single-molecule devices based on 2D materials. The present work addresses the postsynthesis processing of graphene at unconventional low temperature, low energy, and low pressure in the poly methyl-methacrylate- (PMMA-) assisted transfer of graphene to oxide wafer, in the electron-beam lithography with PMMA, and in the plasma patterning of graphene with a PMMA ribbon mask. During the exposure to the oxygen plasma, unprotected areas of graphene are converted to graphene oxide. The exposure time required to produce the ribbon patterns on graphene is 2 minutes. We produce graphene ribbon patterns with ∼50 nm width and integrate them into solid state and liquid gated transistor devices. / )e submitted manuscript has been created by UChicago Argonne, LLC, Operator of Argonne National Laboratory (“Argonne”). Argonne, a U.S. Department of Energy Office of Science laboratory, is operated under Contract DE-AC02-06CH11357. )e U.S. Government retains for itself, and others acting on its behalf, a paid-up nonexclusive, irrevocable worldwide license in said article to reproduce, prepare derivative works, distribute copies to the public, and perform publicly and display publicly, by or on behalf of the government. Funding text #2 )e Center for Nanoscale Materials was supported by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract DE-AC02-06CH11357. )e authors also acknowledge financial support from Argonne National Laboratory’s Laboratory-Directed Research and Development Strategic Initiative. / Revisión por pares

Page generated in 0.0221 seconds