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Nonlinear silicon waveguides for integrated fiber laser systems. / CUHK electronic theses & dissertations collectionJanuary 2013 (has links)
Wong, Chi Yan. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2013. / Includes bibliographical references (leaves 134-149). / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Abstract also in Chinese.
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Graphene-on-silicon suspended membrane planar lightwave circuits. / CUHK electronic theses & dissertations collectionJanuary 2013 (has links)
Cheng, Zhenzhou. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2013. / Includes bibliographical references. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Abstract also in Chinese.
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Technology and properties of InP-based photonic crystal structures and devicesShahid, Naeem January 2012 (has links)
Photonic crystals (PhCs) are periodic dielectric structures that exhibit a photonic band gap; a range of wavelengths for which light propagation is forbidden. 2D PhCs exhibit most of the properties as their three dimension counterparts with a compatibility with standard semiconductor processing techniques such as epitaxial growth, electron beam lithography, Plasma deposition/etching and electromechanical lapping/polishing. Indium Phosphide (InP) is the material of choice for photonic devices especially when it comes to realization of coherent light source at 1.55 μm wavelength. Precise engineering of the nanostructures in the PhC lattice offers novel ways to confine, guide and control light in phonic integrated circuits (PICs). Strong confinement of light in PhCs offer novel opportunities in many areas of physics and engineering. Dry etching, a necessary process step in PhC device manufacturing, is known to introduce damage in the etched material. Process induced damage and its impact on the electrical and optical properties of PhCs depends on the etched material, the etching technique and process parameters. We have demonstrated a novel post-etch process based on so-called mass-transport (MT) technology for the first time on InP-based PhCs that has significantly improved side-wall verticality of etched PhC holes. A statistical analysis performed on several devices fabricated by MT process technology shows a great deal of improvement in the reliability of optical transmission characteristics which is very promising for achieving high optical quality in PhC components. Several PhC devices were manufactured using MT technology. Broad enough PhC waveguides that operate in the mono/multi-mode regime are interesting for coarse wavelength de-multiplexing. The fundamental mode and higher order mode interaction creates mini-stop band (MSB) in the dispersion diagram where the higher order mode has a lower group velocity which can be considered as slow light regime. In this thesis work, the phenomena of MSBs and its impact on transmission properties have been evaluated. We have proposed and demonstrated a method that enables spectral tuning with sub-nanometer accuracy which is based on the transmission MSB. Along the same lines most of the thesis work relates to broad enough PhC guides that operated in the multimode regime. Temperature tuning experiments on these waveguides reveals a clear red-shift with a gradient of dλ/dT=0.1 nm/˚C. MSBs in these waveguides have been studied by varying the width in incremental amounts. Analogous to semiconductors heterostructures, photonic heterostructures are composed of two photonic crystals with different band-gaps obtained either by changing the air-fill factor or by the lattice constant. Juxtaposing two PhC and the use of heterostructures in waveguide geometry has been experimentally investigated in this thesis work. In particular, in multimode line defect waveguides the “internal” MSB effect brings a new dimension in single junction-type photonic crystal waveguide (JPCW) and heterostructure W3 (HW3) for fundamental physics and applications. We have also fabricated an ultra-compact polarization beam splitter (PBS) realized by combining a multimode waveguide with internal PhC. MSBs in heterostructure waveguides have shown interesting applications such as designable band-pass flat-top filters, and resonance-like filters with high transmission. In the course of this work, InGaAsP suspended membrane technology was developed. An H2 cavity with a linewidth of ~0.4 nm, corresponding to a Q value of ~3675 has been shown. InGaAsP PhC membrane is an ideal platform to study coupled quantum well/dot-nanocavity system. / <p>QC 20120831</p>
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Development of high quality silicon nitride chips for integrated nonlinear photonics / Développement de circuits photoniques intégrés de haute qualité en nitrure de silicium pour l'optique non-linéaireEl Dirani, Houssein 07 October 2019 (has links)
La montée exponentielle du trafic de données liée au développement de l’interconnexion entre objets et personnes sur la toile nécessite de nouvelles technologies. Au cours de la dernière décennie, les peignes de fréquences optiques ont révolutionné le secteur des télécommunications, ouvrant la voie à une transmission de données à un débit de données auparavant inaccessible. Mis à part le domaine des télécommunications, les peignes de fréquences optiques ont été avantageusement exploités dans d’autres domaines comme la détection optique, la détection chimique, les horloges optiques… L'efficacité du phénomène de mélange à quatre ondes, qui sous-tend la génération des peignes de fréquences, dépend de manière significative des pertes par propagation dans les guides d’ondes optiques et, par conséquent, de la rugosité de ces derniers. De plus, l'absorption intrinsèque du matériau réduit l'efficacité des phénomènes non linéaires tout en contribuant à l’atténuation du signal lumineux dans le milieu optique de propagation. Grâce à la maturité des procédés de fabrication dits CMOS, la rugosité peut être réduite en optimisant la gravure, tandis que l’absorption peut être réduite par des traitements thermiques. L'utilisation d'un matériau CMOS permet donc une fabrication à faible coût et la co-intégration avec d’autres dispositifs optoélectroniques sur la même puce. Le nitrure de silicium sur isolant est une plateforme prometteuse pour la génération de peignes de fréquences optiques grâce à la faible absorption à deux photons dans ce matériau par rapport au silicium cristallin. Cependant, le nitrure présente une absorption dans la bande des télécommunications relié à la présence des liens moléculaires N-H. Tandis que des recuits à haute température ont été utilisés pour réduire le contenu en hydrogène du film et démontrer avec succès la génération de peignes de fréquence, ces procédés rendent la co-intégration monolithique de ces dispositifs en nitrure de silicium avec une optoélectronique à base de silicium très difficile, réduisant ainsi considérablement sa compatibilité avec les autres matériaux CMOS. Dans cette thèse, nous décrivons la conception, la fabrication et les caractérisations de circuits photoniques non-linéaires en nitrure de silicium sans recuit. En particulier, nous avons mis au point un procédé de fabrication de films de Si3N4 d'une épaisseur de 740 nm, sans utilisation de recuit et avec une maitrise de la gestion des contraintes typiquement associées à ce type de matériau pour l’optique non linéaire. Cette approche offre une compatibilité de fabrication technologique avec la photonique sur silicium. Des preuves expérimentales montrent que les micro-résonateurs utilisant de tels films de nitrure de silicium sans recuit sont capables de générer un peigne de fréquence s'étendant sur 1300-2100 nm via une oscillation paramétrique optique basée sur du mélange à quatre ondes. En allant encore plus loin, nous présentons également les travaux d’optimisation technologique portant sur des microrésonateurs en nitrure de silicium recuits avec des guides d’onde à fort confinement modal, qui nous ont permis d’atteindre des pertes de propagation record. Ces résultats ont été rendus possible grâce à une optimisation fine des étapes de gravure des guides d’onde ainsi qu’à l'utilisation de traitements thermiques-chimiques efficaces. Cette nouvelle approche nous a permis de démontrer par ailleurs des sources de peignes de fréquences intégrées sur puce utilisant des résonateurs en nitrure de silicium couplés par aboutement à un laser III-V DFB utilisé comme une pompe. Cette preuve de concept prouve la validité de notre plateforme de circuits photoniques non-linéaires en Si3N4 pour la réalisation de peignes de fréquences optiques ultra-compacts à faible consommation. / The data traffic need for ultra-high definition videos as well as for the mobile data continues to grow. Within the last decade, optical frequency combs have revolutionized the telecommunications field and paved the way for groundbreaking data transmission demonstrations at previously unattainable data rates. Beside the telecommunications field, optical frequency combs brought benefits also for many other applications such as precision spectroscopy, chemical and bio sensing, optical clocks, and quantum optics. The efficiency of the four-wave mixing phenomenon from which the optical frequency comb arises critically depends on the propagation losses and consequently on the device roughness induced by the lithography and the etching processes. In addition, the bulk material absorption reduces the efficiency of the nonlinear phenomena. By using state-of-the-art complementary metal oxide semiconductor processes, the roughness can be reduced thanks to the maturity of the manufacturing, while the material bulk absorption can be reduced by thermal treatments. In addition, using a CMOS material enables a low-cost fabrication and the co-integration with electronic devices into the same chip. Silicon-nitride-on-insulator is an attractive CMOS-compatible platform for optical frequency comb generation in the telecommunication band because of the low two-photon absorption of silicon nitride when compared with crystalline silicon. However, the as deposited silicon nitride has a hydrogen related absorption in the telecommunication band. Although high-temperature annealing has been traditionally used to reduce the hydrogen content and successfully demonstrate silicon nitride-based frequency combs, this approach made the co-integration with silicon-based optoelectronics elusive, thus reducing dramatically its effective complementary metal oxide semiconductor compatibility. In this thesis, we report on the fabrication and test of annealing-free silicon nitride nonlinear photonic circuits. In particular, we have developed a process to fabricate low-loss, annealing-free and crack–free Si3N4 740-nm-thick films for Kerr-based nonlinear photonics, featuring a full process compatibility with front-end silicon photonics. Experimental evidence shows that micro-resonators using such annealing-free silicon nitride films are able to generate a frequency comb spanning 1300-2100 nm via optical parametrical oscillation based on four-wave mixing. In addition, we present the further optimized technological process related to annealed silicon nitride optical devices using high-confinement waveguides, allowing us to achieve record-low losses. This was enabled via a carefully tailored patterning etching process and an annealing treatment particularly efficient due to the already low hydrogen content in our as-deposited silicon nitride. Such improved Si3N4 platform allowed us to demonstrate on-chip integrated Kerr frequency comb sources using silicon nitride resonators that were butt-coupled to a III-V DFB laser used as a pump source. This proof of concept proves the validity of our approach for realizing fully packaged compact optical frequency combs.
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Hybrid Silicon and Lithium Niobate Integrated PhotonicsChen, Li 19 May 2015 (has links)
No description available.
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