The conventional large radii bends used in large cross section silicon-on-insulator waveguides were replaced with novel wet etched corner mirrors, potentially allowing much smaller devices, therefore lower costs. If such corners had been based on reactive ion etch techniques they would have had the disadvantage of rougher surfaces and poor alignment in the vertical direction. Wet etching overcomes these two problems by providing smooth corner facets aligned precisely to the vertical {100} silicon crystallographic planes. The waveguides obtained had angled walls, and so numerical analysis was undertaken to establish the single mode condition for such trapezoidal structures. To show the relationship between fabrication tolerances and optical losses a three dimensional simulation tool was developed, based on expansion of the incident mode into plane waves. Various new fabrication techniques were are proposed, namely: the use of titanium as a mask for deep silicon wet anisotropic etching, a technique for aligning masks to the crystal plane on silicon-oninsulator wafers, a corner compensation method for sloping sidewalls, and the suppression of residues and pyramids with the use of acetic acid for KOH etching. Also, it was shown that isopropyl alcohol may be used in KOH etching of vertical walls if the concentration and temperature are sufficiently high. As the proposed corner mirrors were convex structures the problem of undercutting by high order crystal planes arose. This was uniquely overcome by the addition of some structures to effectively convert the convex structures into concave ones. The corner mirrors had higher optical losses than were originally hoped for, similar to those of mirrors in thin film waveguides made by RIE. The losses were possibly due to poor angular precision of the lithography process. The design also failed to provide adequate mechanisms to allow the etch to be stopped at the optimal time. The waveguides had the advantage over thin film technology of large, fibre-compatible cross sections. However the mirror losses must be reduced for the technology to compete with existing large cross section waveguides using large bends. Potential applications of the technology are also discussed. The geometry of the crystal planes places fundamental limits on the proximity of any two waveguides. This causes some increase in the length of MMI couplers used for channel splitting. The problem could possibly be overcome by integrating one of the mirrors into the end of the MMI coupler to form an L shaped junction.

The ever-increasing need for higher bandwidth and density is one of the motivations for extensive research on planar optoelectronic structures on printed circuit board (PCB) substrates. Among these applications, optical interconnects have received considerable attention in the last decade. Several optical interconnect techniques, such as free space, guided wave, board level and fiber array interconnects, have been introduced for system level applications. In all planar optoelectronic systems, optical waveguides are crucial elements that facilitate signal routing. Low propagation loss, high reliability and manufacturability are among the requirements of polymer optical waveguides and polymer passive devices on PCB substrates for practical applications. Besides fabrication requirements, reliable characterization tools are needed to accurately and nondestructively measure important guiding properties, such as waveguide propagation loss. In three-dimensional (3D) fully embedded board-level optical interconnects, another key challenge is to realize efficient optical coupling between in-plane waveguides and out-of-plane laser/detector devices. Driven by these motivations, the research presented in this thesis focuses on some fundamental studies of optical interconnects for PCB substrates, e.g., developing low-loss optical polymer waveguides with integrated efficient out-of-plane couplers for optical interconnects on printed circuit board substrates, as well as the demonstration of a novel free-space optical interconnect system by using a volume holographic thin film. Firstly, the theoretical and experimental investigations on the limitations of using mercury i-line ultraviolet (UV) proximity photolithography have been carried out, and the metallization techniques for fine copper line formation are explored. Then, a new type of low-loss polymer waveguides (i.e., capped waveguide) is demonstrated by using contact photolithography with considerable performance improvement over the conventional waveguides. To characterize the propagation properties of planar optical waveguides, a reliable, nondestructive, and real-time technique is presented based on accurately imaging the scattered light from the waveguide using a sensitive charge coupled device (CCD) camera that has a built-in integration functionality. To provide surface normal light coupling between waveguides and optoelectronic devices for optical interconnects, a simple method is presented here to integrate 45° total internal reflection micro-mirrors with polymer optical waveguides by an improved tilted beam photolithography (with the aid of de-ionized water) on PCBs. A new technique is developed for a thin layer of metal coating on the micro-mirrors to achieve higher reflection and coupling efficiency (i.e., above 90%). The combination of the capped waveguide technique and the improved tilted UV exposure technique along with a hard reusable metal mask for metal deposition eliminates the usage of the traditional lift-off process, greatly simplifies the process, and reduces fabrication cost without sacrificing the coating quality. For the study of free-space optical interconnects, a simple system is presented by employing a single thin-film polymeric volume holographic element. One 2-spherical-beam hologram is used to link each point light source with the corresponding photodetector. An 8-channel free-space optical interconnect system with high link efficiency is demonstrated by using a single volume holographic element where 8 holograms are recorded.

La structure moléculaire d'un cristal liquide cholestérique (CLC) est hélicoïdale et donne lieu à des propriétés optiques remarquables comme la réflexion sélective de la lumière. La structure cholestérique soulève des questions fondamentales comme la relation entre chiralités moléculaire et mésoscopique, et son impact sur les propriétés optiques. Elle est omniprésente en biologie (organisation de la chitine, de la cellulose, du collagène ou de la chromatine). Elle est aussi utilisée en technologie : en cosmétologie, dans les afficheurs nématiques super-torsadés, les écrans réflecteurs, les capteurs de température ou pression, les matériaux pour les applications photoniques en général. Le but du présent travail est de décrire et comprendre l'interaction de la lumière avec différents types de structures hélicoïdales non-monotones élaborées dans cette thèse - films cholestériques synthétiques (monocomposant ou hybrides i.e. dopés en nanoparticules d'or) - ou dans un matériau biologique (carapace du scarabée Chrysina gloriosa). Différentes techniques de caractérisation optique ont été utilisées suivant le matériau à étudier et les questions posées. La partie principale du manuscrit est dédiée aux microlentilles et micro-miroirs cholestériques. Nous avons étudié la texture polygonale cholestérique et mis en évidence qu'elle se comporte comme un réseau de microlentilles chirales à l'aide de la microscopie confocale couplée à la spectrophotométrie. Ces microlentilles organiques, élaborées en deux étapes par auto-assemblage, ont la particularité d'être sélectives en longueur d'onde. Nous avons ensuite montré que la texture polygonale de la carapace de Chrysina gloriosa, analogue biologique, est un réseau de micro-miroirs sphériques et de microlentilles convergentes. La seconde partie du manuscrit est consacrée à l'élaboration de matériaux hybrides CLC et nanoparticules d'or et à l'étude de leurs propriétés optiques. Les propriétés optiques de ces nanocomposites ont été sondées à l'aide de différentes techniques (résonance plasmon, spectrométrie Raman etc). / The molecular structure of a cholesteric liquid crystal (CLC) is helical and gives rise to outstanding optical properties like the selective reflection of the light. Cholesteric structure raises fundamental questions such as the relationship between molecular chirality and mesoscopic chirality, and its impact on optical properties. It is omnipresent in biology (organisation of chitin, cellulose, collagen or chromatin). It is also used in technology: cosmetology, super-twisted nematic displays, reflective screens, temperature or pressure sensors, materials for photonic applications in general. The purpose of this work is to describe and understand the interaction of light with different types of non-monotonous helical structures elaborated in this thesis - synthetic cholesteric films (single-component or hybrid i.e. doped with gold nanoparticles) - or in a biological material (Chrysina gloriosa beetle). Several optical characterisation techniques have been used, depending on the sample to study and the questions which are rised. The main part of the manuscript is dedicated to cholesteric microlenses and micro-mirrors. We studied the cholesteric polygonal texture and highlighted that it acts as a chiral microlens array by using confocal microscopy coupled to spectrophotometry. These organic microlenses, developed in a two-step process by self-assembly, have the specificity of being wavelength-selective. We then showed that the polygonal texture of Chrysina gloriosa, as a biological analogous, is an array of spherical micro-mirrors and convergent microlenses. The second part of the manuscript is devoted to the elaboration of hybrid materials composed of CLC and gold nanoparticules and the study of their optical properties. Optical properties of these nanocomposites were probed using various techniques (plasmon resonance, Raman spectroscopy etc).

This paper describes technology and process development for a hybrid lithography approach pairing UV-lithography for planar single mode waveguides with 2-photon-polymerization direct-laser-writing for out-of-plane coupling mirrors. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV-lithography are presented. Near square core cross sections are achieved. Minimum alignment accuracy at ≈ 3 μm is observed. Cut-back measurement on single mode waveguides shows attenuation of 0.64 dB cm −1 and 1.5 dB cm −1 at 1310 nm and 1550 nm respectively. Up to 2.5-times increase of shear-strength after thermal exposure up to 300 ◦ C is found using shear tests and compared for various surface treatments. Mechanical compatibility to reflow soldering is derived. An extensive study on the pattering of ORMOCER® using 2-photon-polymerization is performed. Flat 45 ◦ -micro mirrors with sub-10 μm dimensions are 3D-printed both in OrmoCore and OrmoComp. Outlook to further research on hybrid lithography integration approach is given.

This paper describes design and advances in process development for UV-lithography of planar single mode waveguides with openings for out-of-plane coupling µ-mirrors. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV-lithography are presented. Near square core cross sections are achieved. However, non uniformity across 4” wafer is shown due to varying proximity and UV-intensity. Openings in full stack with steep sidewalls without residual layer are patterned. Reduction in stack thickness for very small exposure doses due to inhibition even under inert atmosphere is shown. 45° -µ-mirrors are integrated in these openings to manufacture a U-link via a single mode waveguide and two adjacent micro-mirrors. Optical characterization of U-link demonstrates the feasibility of hybrid lithography approach. However, non-uniformity of core cross-section leads to cross coupling of planar waveguides. Outlook to further research on UV-lithography of multi-layer waveguide stack and alignment with µ-mirror printing is given.

This paper describes advances in hybrid-lithography process, combining UV-lithography for planar, single mode redistribution layer (RDL) and 2-photon-polymerization direct-laser-writing (2PP-DLW) for micro-mirrors inside RDL-opening. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV-lithography and need for broadband UV-LED source are presented. Near square core cross sections and smooth sidewalls are achieved. Openings in full stack with steep sidewalls without residual layer are patterned. To optimize 2PP-DLW-process processing window for both OrmoComp and IP-DIP is thoroughly characterized. Roughness measurements prove feasibility even of coarsely printed structure as reflective μ-mirror for 1550 nm wavelength. Finally these results are applied to periscope probe for wafer-level-testing of edge emitting lasers and proof of concept is shown. Outlook to further research on UV-lithography of multi-layer waveguide stack and alignment with μ-mirror printing is given.