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The PhD dissertation is organized in two parts. In the first part, we present an experimental study of stimulated Raman scattering in a silicon-on-insulator (SOI) nanowire. We demonstrate that the Raman amplification of a narrow-band Stokes wave experiences a saturation effect for high pump intensities because of self phase modulation of the pump beam. Moreover, an analytical model is presented that describes the experimental results remarkably well. The model furthermore provides an estimation of the Raman gain coefficient γR of silicon. The second part is devoted to the experimental study of stimulated Raman scattering in a doubly resonant planar GaAs microcavity. The nonlinear measurements clearly show some totally unexpected results. We experimentally demonstrate that the relaxation of the electrons in the conduction band of GaAs is significantly modified through the interaction with coherently excited Raman phonons.

Le transistor est la brique élémentaire des circuits intégrés présents dans tous les appareils électroniques. Années après années l’industrie de la microélectronique a amélioré les performances des circuits intégrés (rapidité, consommation énergétique) en réduisant les dimensions du transistor. De nos jours, en plus de la réduction de la taille du transistor d’autres techniques permettent de soutenir cette croissance: ce sont les « booster » technologiques. Les contraintes mécaniques ou encore le remplacement du Silicium par d’autres matériaux tels que germanium (Ge) et les matériaux semi-conducteurs de type III-V sont des exemples de booster technologiques. Grâce à la modélisation numérique, cette thèse propose d’étudier les effets de booster technologiques sur les performances électriques de la future génération de transistors. / The transistor is the elementary brick of Integrated circuits found in all electronic devices. Years after years the microelectronic industry has enhanced the performances of integrated circuits (speed and energy consumption) by downscaling the transistor. Nowadays besides the transistor’s downscaling, other techniques have been considered to maintain this growth: they are called technological boosters. Mechanical strain or new material, such as germanium (Ge) and III-V semiconductors, to replace Silicon are example of technological boosters. By the means of numerical quantum simulations and modeling, this these work propose a study of the effect of technological boosters on the electric performances of the next generation of transistors.

<div> Challenges in the semiconductor industry have resulted in the discovery of a plethora of promising materials and devices such as the III-Vs (InGaAs, GaSb, GaN/InGaN) and 2D materials (Transition-metal dichalcogenides [TMDs]) with wide-ranging applications from logic devices, optoelectronics to biomedical devices. Performance of these devices suffer significantly from scattering processes such as polar-optical phonons (POP), charged impurities and remote phonon scattering. These scattering mechanisms are long-ranged, and a quantitative description of such devices require non-local scattering calculations that are computationally expensive. Though there have been extensive studies on coherent transport in these materials, simulations are scarce with scattering and virtually non-existent with non-local scattering. </div><div> </div><div>In this work, these scattering mechanisms with full non-locality are treated rigorously within the Non-Equilibrium Green's function (NEGF) formalism. Impact of non-locality on charge transport is assessed for GaSb/InAs nanowire TFETs highlighting the underestimation of scattering with local approximations. Phonon, impurity scattering, and structural disorders lead to exponentially decaying density of states known as Urbach tails/band tails. Impact of such scattering mechanisms on the band tail is studied in detail for several bulk and confined III-V devices (GaAs, InAs, GaSb and GaN) showing good agreement with existing experimental data. A systematic study of the dependence of Urbach tails with dielectric environment (oxides, charged impurities) is performed for single and multilayered 2D TMDs (MoS2, WS2 and WSe2) providing guideline values for researchers. </div><div><br></div><div>Often, empirical local approximations (ELA) are used in the literature to capture these non-local scattering processes. A comparison against ELA highlight the need for non-local scattering. A physics-based local approximation model is developed that captures the essential physics and is computationally feasible.</div>

Doctor of Philosophy / Department of Physics / Itzhak Ben-Itzhak / Patrick Richard / This work focuses on the ultrafast dynamics of electrons and phonons in graphitic materials. In particular, we experimentally investigated the factors which influence the transport properties of graphite and carbon nanotubes. In the first part of this dissertation, we used Time-resolved Two Photon photoemission (TR-TPP) spectroscopy to probe the dynamics of optically excited charge carriers above the Fermi energy of double-wall carbon nanotubes (DWNTs). In the second part of this study, time-resolved anti-Stokes Raman (ASR) spectroscopy is applied to investigating in real time the phonon-phonon interactions, and addressing the way the temperature affects the dynamics of single-wall carbon nanotubes (SWNTs) and graphite. With respect to the first part, we aim to deeply understand the dynamics of the charge carriers and electron-phonon interactions, in order to achieve an as complete as possible knowledge of DWNTs. We measured the energy transfer rate from the electronic system to the lattice, and we observed a strong non-linear increase with the temperature of the electrons. In addition, we determined the electron-phonon coupling parameter, and the mean-free path of the electrons. The TR-TPP technique enables us to measure the above quantities without any electrical contacts, with the advantage of reducing the errors introduced by the metallic electrodes. The second investigation uses time-resolved ASR spectroscopy to probe in real time the G-mode non-equilibrium phonon dynamics and the energy relaxation paths towards the lattice by variation of the temperature in SWNTs and graphite. The lifetime range of the optically excited phonons obtained is 1.23 ps to 0.70 ps in the lowest (cryogenic temperatures) and highest temperature limits, respectively. We have also observed an increase in the energy of the G-mode optical phonons in graphite with the transient temperature. The findings of this study are important since the non-equilibrium phonon population has been invoked to explain the negative differential conductance and current saturation in high biased transport phenomena.