• Refine Query
  • Source
  • Publication year
  • to
  • Language
  • 2268
  • 400
  • 393
  • 260
  • 87
  • 69
  • 63
  • 42
  • 37
  • 37
  • 25
  • 18
  • 18
  • 18
  • 18
  • Tagged with
  • 4521
  • 645
  • 637
  • 480
  • 353
  • 349
  • 308
  • 307
  • 305
  • 300
  • 299
  • 290
  • 282
  • 265
  • 263
  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
191

Controlled growth and integration of silicon nanowires for electrical and electrochemical device applications

Ogata, Ken January 2012 (has links)
No description available.
192

Ohmic contact to silicon carbide

Frick, James Albert, 1933- January 1972 (has links)
No description available.
193

Photoelectronic properties of zinc-compensated silicon.

Rabie, Sameh A. January 1973 (has links)
No description available.
194

The use of sulfolane in the photometric determination of silicon

Tice, John Joseph 08 1900 (has links)
No description available.
195

The application of porous silicon surface and photo- and electrochemical properties to sensor development

Seals, Lenward Thurman, III 08 1900 (has links)
No description available.
196

Production and Application of AlCl as a Reductant for Solar Grade Silicon Manufacture

SKRECKY, KRISTIN 20 September 2011 (has links)
Solar grade silicon is currently produced mainly through blending semiconductor grade silicon waste with metallurgical grade silicon. As the demand for solar cells continues to increase rapidly, soon demand will outstrip supply of semiconductor grade silicon waste. A process for producing solar grade silicon efficiently and without relying on other industries is needed. It is proposed to produce solar grade silicon of 6N purity (99.9999%) by reacting silicon tetrachloride with aluminum monochloride via the following reaction: 2 AlCl(g) + SiCl4(g)= Si(s) + 2 AlCl3(g) Aluminum monochloride is proposed as the reductant for silicon tetrachloride because it is an extremely strong reducing agent and the reaction will produce all gaseous by-products. Additionally, the aluminum trichloride produced can be recycled to form more aluminum monochloride, which is produced by reacting aluminum metal with aluminum trichloride in the following reaction: AlCl3(g) + 2 Al(l)= 3 AlCl(g) High yields of AlCl have only been found above 1200°C, with very little AlCl present in equilibrium with Al and AlCl3 at lower temperatures. The high temperatures under which AlCl can be found in larger quantities makes it difficult to determine if the AlCl3 reacting with Al is actually producing AlCl as opposed to another subhalide such as AlCl2. Numerous IR spectroscopy studies have been undertaken to confirm that the reaction of aluminum trichloride gas with molten aluminum does produce aluminum monochloride, with all such studies confirming that this theoretical path is correct. Unlike previous studies, which pass the AlCl3 gas over molten aluminum, it is proposed to bubble the AlCl3 gas into the molten aluminum. This should increase yield of aluminum monochloride, which was not a priority in previous studies. In order to achieve the project objectives a literature review of silicon manufacturing techniques as well as aluminum monochloride production was completed. Experiments to determine the rate of sublimation of aluminum trichloride were to be done in order to determine what temperature at which to sublime the aluminum trichloride. Aluminum trichloride was bubbled into aluminum metal to form aluminum monochloride with experimental conditions being varied to increase yield. Yield was determined through analysis of the reaction products, which was difficult due to the instability of aluminum monochloride, which dissociates at room temperature back into aluminum trichloride and aluminum metal. After the yield of aluminum monochloride was maximized, silicon tetrachloride was introduced into the reactor to react with the aluminum monochloride to form silicon metal. / Thesis (Master, Mining Engineering) -- Queen's University, 2011-09-18 18:16:36.31
197

Characterization of photoconductors containing deep impurities applied to zinc in silicon

Rabie, Sameh A. January 1976 (has links)
No description available.
198

Synthesis and characterization of a new class of silyl-transition metal compounds

Pelletier, Emilien. January 1983 (has links)
Some new inorganic and organometallic derivatives of methylcyclosiloxanes have been prepared and characterized by IR, MS and ('1)H NMR. Compounds, {CH(,3)(Br)SiO}(,3) and {CH(,3)(Br)SiO}(,4) were prepared by cleavage of silicon-phenyl bond with bromine at low temperature. The reaction of {CH(,3)(Br)SiO}(,3) with Na(sec-butyl)(,3)BH at low temperature produced the highly reactive trimer, {CH(,3)(H)SiO}(,3). Compounds {CH(,3)(Co(CO)(,4))SiO}(,4), {CH(,3)(Fe(CO)(,2)(eta)('5)-C(,5)H(,5))SiO}(,4), and {CH(,3)(Co(CO)(,4)SiO}(,5) were prepared by the hydrogen elimination reaction of {CH(,3)(H)SiO}(,n), n = 4 and 5 with Co(,2)(CO)(,8) and {Fe(CO)(,2)(eta)('5)-C(,5)H(,5)}(,2). It was also possible to isolate the compound {CH(,3)(Co(CO)(,4))SiO}(,1){CH(,3)(Fe(CO)(,2)(eta)('5)-C(,5)H(,5))SiO}(,3) by reacting {CH(,3)(H)SiO}(,1){CH(,3)(Fe(CO)(,2)(eta)('5)-C(,5)H(,5))SiO}(,3) with a stoichiometric amount of Co(,2)(CO)(,8). A detailed study of mass spectra of {CH(,3)(R)SiO}(,n), where R = H, (n = 4, 5, and 6), R = C(,6)H(,5), (n = 3 and 4), R = Br, (n = 3 and 4), R = Co(CO)(,4), (n = 4 and 5) and R = Fe(CO)(,2)(eta)('5)-C(,5)H(,5), (n = 4) was achieved. Compounds R = Co(CO)(,4) show stepwise loss of all CO groups from ions {M}('+(.)), {M-Co(CO)(,4)}('+), and also {M}('++). A simple empirical approach based on the chemical environment of methyl protons was used to assign ('1)H NMR spectra of geometric isomers of substituted methylcyclosiloxanes. The total assignment of ('1)H NMR spectra allowed the determination of the isomeric composition of most new compounds mentioned above.
199

Low temperature growth of Amorphous Silicon thin film.

Malape, Maibi Aaron. January 2007 (has links)
<p>The growth of amorphous hydrogenated silicon (a-Si:H) thin films deposided by hot wire chemical vapor deposition (HWCVD) has been studied. The films have been characterised for optical and structural properties by means of UV/VIS,FITR,ERDA, XRD.XTEM and Raman spectroscopy. Low subtrate heater temperatures in the range form 130 to 200 degrees celcius were used in this thesis because it is believed to allow for the deposition of device quality a-Si:H which can be used for electronic photovoltaic devices. Furthermore, low temperatures allows the deposition of a-Si:H on any subtrate and thus offers the possibility of making large area devices on flexible organic substances. We showed that the optical and structural properties of grown a-Si:H films depended critically upon whether the films were produced with silane gas or silane diluted with hydrogen gas. We also showed that it is possible to to deposit crystalline materials at low temperature under high hydrogen dilution ratio of silane gas.</p>
200

Silicon Integration of “Lab-on-a-Chip” Dielectrophoresis Devices

Masood, Nusraat Fowjia 10 September 2010 (has links)
To harness the wealth of success and computational power from the microelectronics industry, lab-on-a-chip (LOAC) applications should be fully integrated with silicon platforms. This works demonstrates a dielectrophoresis-based LOAC device built entirely on silicon using standard CMOS (complementary metal oxide semiconductor) processing techniques. The signal phases on multiple electrodes were controlled with only four electrical contacts, which connected to the device using three metal layers separated with interlayer dielectric. Indium tin oxide was deposited on a milled plastic lid to provide the conductivity and optical clarity necessary to electrically actuate the particles and observe them. The particles and medium were in the microfluidic chamber formed by using conductive glue to bond the plastic milled lid to the patterned silicon substrate. A correlation between the particle velocities and the electric field gradients was made using video microscopy and COMSOL Multiphysics ® simulations.

Page generated in 0.0403 seconds