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Ověření nové metody na hodnocení stresové relaxace tablet / Validation of a new method for the evaluation of stress relaxation of tabletsČerná, Pavlína January 2013 (has links)
Charles University in Prague, Faculty of Pharmacy in Hradec Králové Department of Pharmaceutical technology Supervisor: Doc. RNDr. Milan Řehula, CSc. Title of Dissertation: Validation of a new method for the evaluation of stress relaxation of tablets Keywords: tablets, stress relaxation test, elastic and plastic deformation The theoretical part of this thesis deals with the elastic relaxation of tablets. It describes various methods used in the evaluation of elastic recovery of tablets. The present work explores the factors affecting the elastic relaxation of tablets. The experimental part is focused on the stress relaxation test. Until present only one delay was studied. This work studies the stress relaxation after relieving tablet. The parameters A2, T2 and P2 were reviewed. The relationship between the parameters P2 and compression force relief were studied. For experiments microcrystalline cellulose Avicel PH 102 (MCC) was used. Tablets were compressed in a device used for testing the strength of the material in pressure and tension T1-FRO 50. For the determination of the stress relaxation test, the tablets were compressed with 180 sec first delay. The second delay was always 60 sec but it was measured from certain decrease of pressure (7 kN, 6 kN, 5 kN, 4 kN, 3 kN, 2 kN, 1 kN and 0.1 kN). To...
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Time-dependent behavior of pretensioned stainless steel bars used for structural rehabilitation and retrofittingShah, Falak Dipak 12 January 2015 (has links)
The objective of this study is to characterize the long-term behavior of an austenitic-ferritic stainless steel-based pretensioned system for strengthening reinforced concrete bridge pier caps in shear. Stress relaxation experiments were conducted on UNS S32101 stainless steel bars subjected to various initial stresses and temperatures within the low homologous temperature (LHT) regime. Data from these experiments were used to develop a viscoplastic constitutive model to describe the long-term time- and temperature-dependent behavior of the stainless steel bars. This mechanics-based approach is integrated with an analytical method based on strut-and-tie analysis to compute the shear strength of reinforced concrete pier caps strengthened with this external pretensioned system.
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In situ microviscoelastic measurements by polarization interferometryWilliams, Valorie Sharron, 1960- January 1988 (has links)
A new type of computer-controlled instrument has been developed to measure microviscoelastic properties of thin materials. It can independently control and measure indentation loads and depths in situ revealing information about material creep and relaxation. Sample and indenter positions are measured with a specially designed polarization interferometer. Indenter loadings can be varied between 0.5 and 10 grams and held constant to ±41 mg. The resulting indentation depths can be measured in situ to ±1.2 nm. The load required to maintain constant indentation depths from 0.1 to 5.0 microns can be measured in situ to ±3.3 mg and the depth held constant to ±15 nm.
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Study of stress relaxation and electromigration in Cu/low-k interconnectsYoon, Sean Jhin 28 August 2008 (has links)
Not available / text
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Thermal stress induced voids in nanoscale Cu interconnects by in-situ TEM heatingAn, Jin Ho, 1973- 28 August 2008 (has links)
Stress induced void formation in Cu interconnects, due to thermal stresses generated during the processing of semiconductors, is an increasing reliability issue in the semiconductor industry as Cu interconnects are being downscaled to follow the demand for faster chip speed. In this work, 1.8 micron and 180 nm wide Cu interconnects, fabricated by Freescale Semiconductors, were subjected to thermal cycles, in-situ in the TEM, to investigate the stress relaxation mechanisms as a function of interconnect linewidth. The experiments show that the 1.8 micron Cu interconnect lines relax the thermal stresses through dislocation nucleation and motion while the Cu interconnect 180 nm lines exhibit void formation. Void formation in 180 nm lines occurs predominantly at triple junctions where the Ta diffusion barrier meets a Cu grain boundary. In order to understand void formation in 180 nm lines, the grain orientation and local stresses are determined. In particular, Nanobeam Diffraction (NBD) in the TEM is used to obtain the diffraction pattern of each grain, from which the crystal orientation is evaluated by the ACT (Automated Crystallography for TEM) software. In addition, 2D Finite Element Method (FEM) simulations are performed using the Object Oriented Finite Modeling (OOF2) software to correlate grain orientation with local stresses, and consequently void formation. According to the experimental and simulation results obtained, void formation in 180nm Cu interconnects does not seem to be solely dependent on local stresses, but a combination of diffusion paths available, stress gradients and possibly the presence of defects. In addition, based on the in-situ TEM observations, void growth seems to occur through grain boundary and/or interfacial diffusion. However, in-situ STEM observations of fully opened voids post-failure show pileup of material at the Cu grain surfaces. This means that surface or interface diffusion is also very active during void growth in the presence of thermal stresses.
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Synchrotron tomography of pressboard during in-situ compression loading : Construction of compression rig, image acquisition procedure and methods for image processingJonsson, Åsa, Skarsgård, Grim January 2015 (has links)
Pressboard, a high density cellulose-based material used for insulation in high voltage power transformers, exhibits stress relaxation during compressive loading. Investigating the micro-mechanical mechanisms responsible for the relaxation can lead to modifications of the production process to control the behaviour of the material. This investigation can be done using Synchrotron X-ray micro Computed Tomography which provides sufficient temporal and spatial resolutions to capture the stress relaxation process. In the present thesis, a compression rig for in-situ mechanical loading during X-ray micro Computed Tomography was designed and constructed. Local tomography scans with sub-micrometre resolution were obtained at the TOMCAT beamline at the Swiss Light Source, Paul Scherrer Institut, Switzerland. Several fibre segmentation techniques are analysed, together with Optical Flow and Digital Volume Correlation (DVC), methods used for estimating displacement, strain and velocity vector fields. Suitability of the tested methods is evaluated, and it is found that segmentation of individual fibres in a cellulose material of such a high density is probably not possible using currently available segmentation techniques. The movements during relaxation are measurable at the used resolution, and can be estimated using Optical Flow. Further work into correction of image shift due to rig movement between scans, as well as image artefact reduction should allow for measurement and comparisons of displacement during relaxation as well as DVC-computed strain measurements during compression, recreating earlier results.
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Thermal stress induced voids in nanoscale Cu interconnects by in-situ TEM heatingAn, Jin Ho, January 1900 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2007. / Vita. Includes bibliographical references.
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Simplified inelastic analysis of notched components subjected to mechanical and thermal loads /Raghavan, Prasanna, January 1998 (has links)
Thesis (M. Eng.), Memorial University of Newfoundland, 1998. / Bibliography: leaves 94-98.
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Experimental study and numerical analysis of compression molding process for manufacturing precision aspherical glass lensesJain, Anurag, January 2006 (has links)
Thesis (Ph. D.)--Ohio State University, 2006. / Title from first page of PDF file. Includes bibliographical references (p. 167-175).
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Study of stress relaxation and electromigration in Cu/low-k interconnectsYoon, Sean Jhin, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2005. / Vita. Includes bibliographical references.
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