Silicon (Si) and silicon nitride (Si3N4) have become the dominant photonic integrated circuit (PIC) material platforms, due to their low-cost, wafer-scale production of high-performance circuits. However, novel materials can offer additional functionalities that cannot be easily accessed in Si and Si3N4, such as light emission. Tellurium oxide (TeO2) is a novel material of interest because of its large linear and non-linear refractive indices, low material losses and large rare-earth dopant solubility, with applications including compact low-loss waveguides and on-chip light sources and amplifiers. This thesis investigates the post-processing integration of TeO2 devices onto standardized Si and Si3N4 chips to incorporate TeO2 material advantages into high-performance PICs. Chapter 1 introduces the state-of-the-art functionality for various integrated photonic materials as well as methods for integrating multiple materials onto single chips. Chapter 2 presents the development of a high-quality TeO2 thin film fabrication process by reactive RF sputtering, with material refractive indices of 2.07 and optical propagation losses of <0.1 dB/cm at 1550 nm. Chapter 3 investigates a conformally coated TeO2-Si3N4 waveguide platform capable of large TeO2 optical confinement and tight bending radii, characterizing fiber-chip edge couplers down to ~5 dB/facet, waveguide propagation losses of <0.5 dB/cm, directional couplers with 100% cross-over ratio, and microresonators with internal Q factors of 7.3 × 105. In Chapter 4 a spectroscopic study of TeO2:Er3+-coated Si3N4 waveguide amplifiers was undertaken, with internal net gains of up to 1.4 dB/cm in a 2.2-cm-long waveguide and 5 dB total in a 6.7-cm-long sample demonstrated, predicted to reach >10 dB could 150 mW of pump power be launched based on a developed rate-equation model. Chapter 5 demonstrates TeO2-coated microtrench resonators coupled to silicon waveguides, with internal Q factors of up to 2.1×105 and investigates environmental sensing metrics of devices. Chapter 6 summarizes the thesis and provides avenues for future work. / Thesis / Doctor of Philosophy (PhD)

This research introduces tellurium oxide (TeO2) glass doped with optically active erbium ions (Er3+) as an active oxide cladding material for silicon-on-insulator (SOI) waveguides for realization of a silicon-based erbium-doped waveguide amplifier (EDWA) for integrated optics. Optical amplification of this nature is enabled by energy transitions, such as stimulated absorption and emission, within the shielded 4f shell of the rare-earth atomic structure caused by excitation from photons incident on the system. Er3+ ions are doped into the TeO2 film during deposition onto the SOI waveguides using a reactive magnetron co-sputtering system operated by McMaster’s Centre for Emerging Device Technologies (CEDT). Prior to fabrication, the waveguides are designed using photonic CAD software packages, for optimization of the modal behaviour in the device, and Matlab, for characterization of the optical gain performance through numerical analysis of the rate and propagation equations of the Er3+-based energy system. Post fabrication, the waveguide loss and gain of the coated devices are experimentally measured. The fabricated waveguide amplifier produces a peak signal enhancement of 3.84 dB at 1533 nm wavelength for a 1.7 cm-long waveguide device. High measured waveguide losses (> 10 dB/cm) produce a negative internal net gain per unit length. However, the demonstration and implementation of an active rare-earth doped cladding material on a silicon waveguide is successful, which is a major step in developing integrated optical amplifiers for conventional silicon photonics platforms. / Thesis / Master of Applied Science (MASc)

Silicon photonics (SiP) has evolved into a mature platform for cost-effective low power compact integrated photonic microsystems for many applications. There is a looming capacity crunch for telecommunications infrastructure to overcome the data-hungry future, driven by streaming and the exponential increase in data traffic from consumer-driven products. To increase data capacity, researchers are now looking at the wavelength window of the thulium-doped fiber amplifier (TDFA), centered near 2 µm as an attractive new transmission window for optical communications, motivated by the demonstrations of low loss, low nonlinearity, and high bandwidth transmission. Large-scale implementation of SiP telecommunication infrastructure will require light sources (lasers) and amplifiers to generate signals and boost transmitted and/or received signals, respectively. Silicon (Si) and silicon nitride (Si3N4) have become the leading photonic integrated circuit (PIC) material platforms, due to their low-cost and wafer-scale production of high-performance circuits. Silicon does however have a number of limitations as a photonic material, including that it is not an ideal light-emitting/amplifying material. This proposed research pertains to the fabrication of on-chip silicon and silicon nitride lasers and amplifiers to be used in a newly accessible optical communications window of the TDFA band, which is a significant step towards compact PICs for the telecommunication networks. Tellurium oxide (TeO2) is an interesting host material due to its large linear and non-linear refractive indices, low material losses and large rare-earth dopant solubility showing good performance for compact low-loss waveguides and on-chip light sources and amplifiers. Chapter 1 provides an overview of silicon photonics in the context of particularly rare earth lasers and amplifiers, operating at extended wavelengths enabled by the Thulium doped fiber amplifier. Chapter 2 presents a theoretical performance of waveguides and microresonators as the efficient structure for laser and amplifiers applications designed for optimized use in Erbium and Thulium doped fiber amplifier wavelength bands. Then spectroscopic study thulium (Tm3+) has been studied as the rare earth element for Thulium doped fiber amplifier wavelength bands. Chapter 3 presents an experimental study of TeO2:Tm3+ coated Si3N4 waveguide amplifiers with internal net gains of up to 15 dB total in a 5-cm long spiral waveguide. Chapter 4 provides a study of TeO2:Tm3+ -coated Si3N4 waveguide lasers with up to 16 mW double-sided on-chip output power. Chapter 5 presents an experimental study of low loss and high-quality factor silicon microring resonators coated with TeO2 for active, passive, and nonlinear applications. Chapter 6 represents the first demonstration of an integrated rare-earth silicon laser, with high performance, including single-mode emission, a lasing threshold of 4 mW, and bidirectional on-chip output powers of around 1 mW. Further results with a different design are presented showing lasers with more than 2 mW of double-sided on-chip output power, threshold pump powers of < 1 mW and lasing at wavelengths over a range of > 100 nm. Importantly, a simple, low-cost design was used which is compatible with silicon photonics foundry processes and enables wafer scale integration of such lasers in SiP PICs using robust materials. Chapter 7 summarizes the thesis and provides paths for future work. / Dissertation / Doctor of Engineering (DEng)