Silicon (Si) and silicon nitride (Si3N4) have become the dominant photonic integrated circuit (PIC) material platforms, due to their low-cost, wafer-scale production of high-performance circuits. However, novel materials can offer additional functionalities that cannot be easily accessed in Si and Si3N4, such as light emission. Tellurium oxide (TeO2) is a novel material of interest because of its large linear and non-linear refractive indices, low material losses and large rare-earth dopant solubility, with applications including compact low-loss waveguides and on-chip light sources and amplifiers. This thesis investigates the post-processing integration of TeO2 devices onto standardized Si and Si3N4 chips to incorporate TeO2 material advantages into high-performance PICs. Chapter 1 introduces the state-of-the-art functionality for various integrated photonic materials as well as methods for integrating multiple materials onto single chips. Chapter 2 presents the development of a high-quality TeO2 thin film fabrication process by reactive RF sputtering, with material refractive indices of 2.07 and optical propagation losses of <0.1 dB/cm at 1550 nm. Chapter 3 investigates a conformally coated TeO2-Si3N4 waveguide platform capable of large TeO2 optical confinement and tight bending radii, characterizing fiber-chip edge couplers down to ~5 dB/facet, waveguide propagation losses of <0.5 dB/cm, directional couplers with 100% cross-over ratio, and microresonators with internal Q factors of 7.3 × 105. In Chapter 4 a spectroscopic study of TeO2:Er3+-coated Si3N4 waveguide amplifiers was undertaken, with internal net gains of up to 1.4 dB/cm in a 2.2-cm-long waveguide and 5 dB total in a 6.7-cm-long sample demonstrated, predicted to reach >10 dB could 150 mW of pump power be launched based on a developed rate-equation model. Chapter 5 demonstrates TeO2-coated microtrench resonators coupled to silicon waveguides, with internal Q factors of up to 2.1×105 and investigates environmental sensing metrics of devices. Chapter 6 summarizes the thesis and provides avenues for future work. / Thesis / Doctor of Philosophy (PhD)

This research introduces tellurium oxide (TeO2) glass doped with optically active erbium ions (Er3+) as an active oxide cladding material for silicon-on-insulator (SOI) waveguides for realization of a silicon-based erbium-doped waveguide amplifier (EDWA) for integrated optics. Optical amplification of this nature is enabled by energy transitions, such as stimulated absorption and emission, within the shielded 4f shell of the rare-earth atomic structure caused by excitation from photons incident on the system. Er3+ ions are doped into the TeO2 film during deposition onto the SOI waveguides using a reactive magnetron co-sputtering system operated by McMaster’s Centre for Emerging Device Technologies (CEDT). Prior to fabrication, the waveguides are designed using photonic CAD software packages, for optimization of the modal behaviour in the device, and Matlab, for characterization of the optical gain performance through numerical analysis of the rate and propagation equations of the Er3+-based energy system. Post fabrication, the waveguide loss and gain of the coated devices are experimentally measured. The fabricated waveguide amplifier produces a peak signal enhancement of 3.84 dB at 1533 nm wavelength for a 1.7 cm-long waveguide device. High measured waveguide losses (> 10 dB/cm) produce a negative internal net gain per unit length. However, the demonstration and implementation of an active rare-earth doped cladding material on a silicon waveguide is successful, which is a major step in developing integrated optical amplifiers for conventional silicon photonics platforms. / Thesis / Master of Applied Science (MASc)

Silicon photonics (SiP) has evolved into a mature platform for cost-effective low power compact integrated photonic microsystems for many applications. There is a looming capacity crunch for telecommunications infrastructure to overcome the data-hungry future, driven by streaming and the exponential increase in data traffic from consumer-driven products. To increase data capacity, researchers are now looking at the wavelength window of the thulium-doped fiber amplifier (TDFA), centered near 2 µm as an attractive new transmission window for optical communications, motivated by the demonstrations of low loss, low nonlinearity, and high bandwidth transmission. Large-scale implementation of SiP telecommunication infrastructure will require light sources (lasers) and amplifiers to generate signals and boost transmitted and/or received signals, respectively. Silicon (Si) and silicon nitride (Si3N4) have become the leading photonic integrated circuit (PIC) material platforms, due to their low-cost and wafer-scale production of high-performance circuits. Silicon does however have a number of limitations as a photonic material, including that it is not an ideal light-emitting/amplifying material. This proposed research pertains to the fabrication of on-chip silicon and silicon nitride lasers and amplifiers to be used in a newly accessible optical communications window of the TDFA band, which is a significant step towards compact PICs for the telecommunication networks. Tellurium oxide (TeO2) is an interesting host material due to its large linear and non-linear refractive indices, low material losses and large rare-earth dopant solubility showing good performance for compact low-loss waveguides and on-chip light sources and amplifiers. Chapter 1 provides an overview of silicon photonics in the context of particularly rare earth lasers and amplifiers, operating at extended wavelengths enabled by the Thulium doped fiber amplifier. Chapter 2 presents a theoretical performance of waveguides and microresonators as the efficient structure for laser and amplifiers applications designed for optimized use in Erbium and Thulium doped fiber amplifier wavelength bands. Then spectroscopic study thulium (Tm3+) has been studied as the rare earth element for Thulium doped fiber amplifier wavelength bands. Chapter 3 presents an experimental study of TeO2:Tm3+ coated Si3N4 waveguide amplifiers with internal net gains of up to 15 dB total in a 5-cm long spiral waveguide. Chapter 4 provides a study of TeO2:Tm3+ -coated Si3N4 waveguide lasers with up to 16 mW double-sided on-chip output power. Chapter 5 presents an experimental study of low loss and high-quality factor silicon microring resonators coated with TeO2 for active, passive, and nonlinear applications. Chapter 6 represents the first demonstration of an integrated rare-earth silicon laser, with high performance, including single-mode emission, a lasing threshold of 4 mW, and bidirectional on-chip output powers of around 1 mW. Further results with a different design are presented showing lasers with more than 2 mW of double-sided on-chip output power, threshold pump powers of < 1 mW and lasing at wavelengths over a range of > 100 nm. Importantly, a simple, low-cost design was used which is compatible with silicon photonics foundry processes and enables wafer scale integration of such lasers in SiP PICs using robust materials. Chapter 7 summarizes the thesis and provides paths for future work. / Dissertation / Doctor of Engineering (DEng)

Silicon photonics (SiP) has become a cornerstone technology of the modern age by leveraging the mature fabrication processes and infrastructure of the microelectronics industry for the cost-effective and high-volume production of compact and power-efficient photonic integrated circuits (PICs). The impact that silicon (Si)-based PICs have had on data communications, particularly data center interconnection and optical transceiver technologies, has encouraged SiP chip development and their use in other applications such as artificial intelligence, biomedical sensing and engineering, displays for augmented/virtual reality, free-space communications, light detection and ranging, medical diagnostics, optical spectroscopy, and quantum computing and optics. To expand the functionality and improve the performance of SiP circuits for these surging applications, subwavelength grating (SWG) metamaterials have been thoroughly investigated and implemented in various passive integrated photonic components fabricated on the silicon-on-insulator (SOI) platform. SWG metamaterials are periodic structures composed of two materials with different permittivities that exhibit unnatural properties by using a period shorter than the guided wavelength of light propagating through them. The ability to synthesize the constituent SiP materials without any need to alter standard fabrication procedures enables precise, flexible control over the electromagnetic field and sophisticated selectively over anisotropy, dispersion, polarization, and the mode effective index in these metastructures. This provides significant benefits to SOI devices, such as low loss mode conversion and propagation, greater coupling efficiencies and alignment tolerances for fiber-chip interfaces, ultrabroadband operation in on-chip couplers, and improved sensitivities and limits of detection in integrated photonic sensors. Parallel to the rise of SiP technology is the development of other materials compatible with mature PIC fabrication methods both in the foundry (e.g., silicon nitride (Si3N4)) and outside the foundry (e.g., high-index oxide glasses such as aluminum oxide (Al2O3) and tellurium oxide (TeO2)). Si3N4 offsets the pitfalls of Si as a passive waveguiding material, providing lower scattering and polarization-dependent losses, optical transparency throughout the visible spectrum, increased tolerance to fabrication error, and better handling of high-power optical signals. Meanwhile, Al2O3 and TeO2 both serve as excellent host materials for rare-earth ions, and TeO2 possesses strong nonlinear optical properties. Using a single-step post-fabrication thin film deposition process, these materials can be monolithically integrated onto Si PICs at a wafer scale, enabling the realization of complementary-metal-oxide-semiconductor (CMOS)-compatible, hybrid SiP devices for linear, nonlinear, and active functionalities in integrated optics. While SWG metamaterials have widely impacted the design space and applicability of integrated photonic devices in SOI, they have not yet made their mark in other material systems outside of Si. Furthermore, demonstrations of their capabilities in active processes, including optical amplification, are still missing. In this thesis, we present a process for developing various SWG metamaterial-engineered integrated photonic devices in different material systems both within and beyond SOI. The demonstrations in this thesis emphasize the benefits of SWG metamaterials in these devices and realize their potential for enhancing functionality in applications such as sensing and optical amplification. The objective of the thesis is to highlight the prospects of SWG metamaterial implementation in different media used in integrated optics. This is accomplished by experimentally demonstrating SWG metamaterial waveguides, ring resonators and other components composed of different hybrid core-cladding material systems, including Si-TeO2 and Si3N4-Al2O3. Chapter 1 introduces the background and motivation for integrated optics and SWG metamaterials and provides an overview and comparison of the different materials explored in this work. Chapter 2 presents an initial experimental demonstration of TeO2-coated SOI SWG metamaterial waveguides and mode converters. It also details the design of fishbone-style SWG waveguides aimed at lowering loss and enhancing mode overlap with the active TeO2 cladding material in the hybrid SiP platform. Chapter 3 details an open-access Canadian foundry process for rapid prototyping of Si3N4 PICs, emphasizing the Si3N4 material and waveguide fabrication methods, as well as the design and characterization of various integrated photonic components included in a process design kit. The platform is compared against other Si3N4 foundries, and plans for further development are also discussed. Chapter 4 reports the first demonstration of SWG metamaterial waveguides and ring resonators fabricated using a Si3N4 foundry platform. The measured devices have a propagation loss of ∼1.5 dB/cm, an internal quality factor of 2.11·10^5, and a bulk sensitivity of ∼285 nm/RIU in the C-band, showcasing competitive metrics with conventional Si3N4 waveguides and SWG ring resonators and sensors reported in SOI. Chapter 5 presents work towards an SWG metamaterial-engineered waveguide amplifier. The fabricated device, based in Si3N4 and functionalized by an atomic layer deposited, erbium-doped Al2O3 thin film cladding, exhibited a signal enhancement of ∼8.6 dB, highlighting its potential for on-chip optical amplification. Methods to reduce the loss within the material system are proposed to achieve net gain in future devices. Chapter 6 summarizes the thesis and discusses pathways for optimizing the current devices as well as avenues for exploring new and intriguing materials and devices for future applications in integrated photonics. / Thesis / Doctor of Philosophy (PhD)