<p>Idag används guld som kontaktmaterial på elektriska kontakter för lågströmstillämpningar. Guldhar emellertid låg nötningsbeständighet, är dyrt och miljömässigt påfrestande att utvinna. Ettalternativt kontaktmaterial till guld är nanokomposit Ti-Si-C-Ag belagt medlikströmsmagnetronsputtring. Nanokomposit Ti-Si-C-Ag har hittills belagts med sammansatt Ti-Si-C sputterkälla och separat silverkälla.</p><p>I detta arbete har filmer belagts från tre olika sammansatta Ti-Si-C-Ag-källor med tre olikakolhalter. Filmerna har belagts i två olika beläggningssystem: Ett konventionellt batchladdat ochett sekventiellt med sluss.</p><p>Filmernas fas- och ämnessammansättning har studerats med XRD och EDX. Tjocklek ochmikrostruktur har analyserats med SEM. Vidhäftning och resistivitet har analyserats medRockwellindentation och ytresistansmätning med fyrpunktsprob. Kontaktresistansen har ävenstuderats i begränsad mån.</p><p>Arbetet visar att ökat kolinnehåll i källan ger kolrikare filmer med större titankarbidkorn.Resistiviteten ökar p.g.a. tilltagen amorf fas mellan kornen men kontaktresistansen sjunker givetduktilare film.</p> / <p>Today gold is used as contact material on electric contacts for low current applications. Gold, however,has low wear resistance, is expensive and environmentally stressful to produce. An alternative contactmaterial to gold is nano composite Ti-Si-C-Ag deposited with DC-magnetron sputtering. Nanocomposite Ti-Si-C-Ag has so far been deposited by a compound Ti-Si-C sputter source with a separateAg source.</p><p>In this work films have been deposited by three different compound Ti-Si-C-Ag sources with threedifferent carbon contents. The films have been deposited in two separate PVD systems: Oneconventional batch loaded and one sequential with a load-lock.</p><p>The phase- and elemental composition of the films has been studied with XRD and EDX respectively.Thickness and microstructure have been analysed with SEM. Adhesion and resistivity has beenanalysed with Rockwell indentation and surface resistivity measurement with four point probe. Contactresistance has also been studied to a limited extent.</p><p>The work shows that the increment of carbon content in the source yields more carbon rich films withlarger titanium carbide crystallites. The resistivity is increasing due to an increased amorphous phasebetween the crystallites but the contact resistance is decreasing due to a more ductile film.</p>

<p>The high pressure and high temperature (HPHT) behavior of Ti_1-xAl_xN coatings on cutting tool inserts have been of interest for this diploma work. A literature study of HPHT techniques as well as measurement methods has been done. A diamond anvil cell (DAC) would be a good device to achieve high pressure and high temperature conditions on small samples. Another way to obtain these conditions would be a cutting test, which has been performed on a Ti_1-xAl_xN coated cutting tool insert with x = 0.67. Also a cubic press could be used to apply HPHT on a     Ti_1-xAl_xN sample or a large volume press on a whole cutting tool insert. To measure hardness on thin coatings a nanoindentor could be used, which have been done on heat-treated Ti_0.33Al_0.67N and TiN samples. X-ray diffraction (XRD) is a suitable method to measure phase composition of a sample and was performed on the cutting tested insert as well as on an untreated reference insert. Three ways to continue this project have been outlined all starting with more comprehensive cutting tests.</p>

Idag används guld som kontaktmaterial på elektriska kontakter för lågströmstillämpningar. Guldhar emellertid låg nötningsbeständighet, är dyrt och miljömässigt påfrestande att utvinna. Ettalternativt kontaktmaterial till guld är nanokomposit Ti-Si-C-Ag belagt medlikströmsmagnetronsputtring. Nanokomposit Ti-Si-C-Ag har hittills belagts med sammansatt Ti-Si-C sputterkälla och separat silverkälla. I detta arbete har filmer belagts från tre olika sammansatta Ti-Si-C-Ag-källor med tre olikakolhalter. Filmerna har belagts i två olika beläggningssystem: Ett konventionellt batchladdat ochett sekventiellt med sluss. Filmernas fas- och ämnessammansättning har studerats med XRD och EDX. Tjocklek ochmikrostruktur har analyserats med SEM. Vidhäftning och resistivitet har analyserats medRockwellindentation och ytresistansmätning med fyrpunktsprob. Kontaktresistansen har ävenstuderats i begränsad mån. Arbetet visar att ökat kolinnehåll i källan ger kolrikare filmer med större titankarbidkorn.Resistiviteten ökar p.g.a. tilltagen amorf fas mellan kornen men kontaktresistansen sjunker givetduktilare film. / Today gold is used as contact material on electric contacts for low current applications. Gold, however,has low wear resistance, is expensive and environmentally stressful to produce. An alternative contactmaterial to gold is nano composite Ti-Si-C-Ag deposited with DC-magnetron sputtering. Nanocomposite Ti-Si-C-Ag has so far been deposited by a compound Ti-Si-C sputter source with a separateAg source. In this work films have been deposited by three different compound Ti-Si-C-Ag sources with threedifferent carbon contents. The films have been deposited in two separate PVD systems: Oneconventional batch loaded and one sequential with a load-lock. The phase- and elemental composition of the films has been studied with XRD and EDX respectively.Thickness and microstructure have been analysed with SEM. Adhesion and resistivity has beenanalysed with Rockwell indentation and surface resistivity measurement with four point probe. Contactresistance has also been studied to a limited extent. The work shows that the increment of carbon content in the source yields more carbon rich films withlarger titanium carbide crystallites. The resistivity is increasing due to an increased amorphous phasebetween the crystallites but the contact resistance is decreasing due to a more ductile film.

The high pressure and high temperature (HPHT) behavior of Ti1-xAlxN coatings on cutting tool inserts have been of interest for this diploma work. A literature study of HPHT techniques as well as measurement methods has been done. A diamond anvil cell (DAC) would be a good device to achieve high pressure and high temperature conditions on small samples. Another way to obtain these conditions would be a cutting test, which has been performed on a Ti1-xAlxN coated cutting tool insert with x = 0.67. Also a cubic press could be used to apply HPHT on a     Ti1-xAlxN sample or a large volume press on a whole cutting tool insert. To measure hardness on thin coatings a nanoindentor could be used, which have been done on heat-treated Ti0.33Al0.67N and TiN samples. X-ray diffraction (XRD) is a suitable method to measure phase composition of a sample and was performed on the cutting tested insert as well as on an untreated reference insert. Three ways to continue this project have been outlined all starting with more comprehensive cutting tests.