Development of an electron cyclotron resonance plasma source with an internal antenna for carbon film deposition / 炭素膜蒸着用内部アンテナを用いた電子サイクロトロン共鳴プラズマ源の開発 / タンソマク ジョウチャクヨウ ナイブ アンテナ オ モチイタ デンシ サイクロトロン キョウメイ プラズマゲン ノ カイハツ

Description

An electron cyclotron resonance (ECR) plasma source which couples microwave to the plasma using an internal antenna was developed. The use of internal antenna provides a "windowless" power coupling method that can eliminate the issues of contamination which require frequent source maintenance. Antenna structure, magnetic configuration and plasma parameters were modified for carbon film deposition by chemical sputtering. The ECR source generated low-plasma-potential (10 V), high-plasma-density (10^16 m^-3) discharges at low gas pressures (10^-1 Pa) and low input power (100 W). The antenna realized stable operation for more than 5 h and can be utilized for carbon film deposition. / 博士(工学) / Doctor of Philosophy in Engineering / 同志社大学 / Doshisha University

Links & Downloads

1. https://doshisha.repo.nii.ac.jp/?action=repository_uri&item_id=1404
2. http://id.nii.ac.jp/1707/00001396/
3. 理工学研究科
4. Graduate School of Science and Engineering
5. BB27354297
6. https://doshisha.repo.nii.ac.jp/?action=repository_action_common_download&item_id=1404&item_no=1&attribute_id=21&file_no=1
7. https://doshisha.repo.nii.ac.jp/?action=repository_action_common_download&item_id=1404&item_no=1&attribute_id=21&file_no=2
8. 34310甲第892号

Tags

ECR プラズマ

マイクロ波

アンテナ

カーボンフィルム

ECR plasma

microwave

antenna

carbon film

Additional Fields

Identifer	oai:union.ndltd.org:doshisha.ac.jp/oai:doshisha.repo.nii.ac.jp:00001404
Date	01 March 2018
Creators	ロメーロ カミール フェイス パスクワ, Camille Faith Pascua Romero
Source Sets	Doshisha University
Language	English
Detected Language	English
Type	Thesis or Dissertation
Format	application/pdf
Source	https://doors.doshisha.ac.jp/opac/opac_link/bibid/BB13071665/?lang=0