>Magister Scientiae - MSc / In this thesis, I explore the subjects of fluid dynamics and the Hot-Wire Chemical Vapour
Deposition (HWCVD) process. HWCVD, in its simplicity, is one of the more powerful and
elegant deposition techniques available in thin film research which allows for both the growth and
post deposition treatments of functional thin films. In the HWCVD process, the quality of the
final films is determined by a fixed set of deposition parameters namely: temperature, pressure
and the gas flow rate. Finding the optimal combination of these parameters is key to obtaining
the desired film specifications during every deposition. Conducting multiple trial experiments
to determine said parameters can be expensive and time consuming, this is where simulation
methods come into play. One such simulation method is Computational Fluid Dynamics (CFD)
modelling
| Identifer | oai:union.ndltd.org:netd.ac.za/oai:union.ndltd.org:uwc/oai:etd.uwc.ac.za:11394/7523 |
| Date | January 2020 |
| Creators | Fourie, Lionel Fabian |
| Contributors | Square, L. C., Arendse, C. J. |
| Publisher | University of Western Cape |
| Source Sets | South African National ETD Portal |
| Language | English |
| Detected Language | English |
| Rights | University of Western Cape |
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