An analysis and development of controls for exposures to maintenance personnel working on the plasma metal etchers

Description

Thesis, PlanB (M.S.)--University of Wisconsin--Stout, 1998. / Includes bibliographical references.

Links & Downloads

1. http://www.uwstout.edu/lib/thesis/1998/1998boysenc.pdf

Tags

Plasma etching Semiconductor industry

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/41997514
Date	January 1998
Creators	Boysen, Christopher J.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Online version