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Modeling and optimization of plasma-enhanced chemical vapor deposition using neural networks and genetic algorithms

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1. http://hdl.handle.net/1853/14904
2. 437042

Identifer	oai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/14904
Date	12 1900
Creators	Han, Seung Soo
Publisher	Georgia Institute of Technology
Source Sets	Georgia Tech Electronic Thesis and Dissertation Archive
Detected Language	English
Type	Dissertation
Rights	Access restricted to authorized Georgia Tech users only.