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A Novel High Integration-Density CMOS Inverter with Unique Shared Contact

A novel CMOS inverter has been proposed. We utilize gated N-I-P transistor to
replace the conventional PMOSFET for solving the problem of width compensation.
Also, we carefully investigate and analyze the non-conventional CMOS characteristics
with NTFET and/or UTB JL MOSFET as driver and gated N-I-P transistor as a load.
According to the results, our proposed novel CMOS inverter has correct logic behavior
and its delay time is reduced about 87.2 % when compared with the CTFET. Also, our
proposed CMOS still can get a 43.2 % reduction in delay time when compared with JL
CMOS. In addition, because of the N-type output drain node and the SOI structure, our
proposed CMOS does not need any physical isolation technique, thereby improving the
packing density. Our proposed CMOS indeed obtain a 54.1 % reduction of the total area
compared with the conventional CMOS. Our proposed CMOS also can achieve a 40.1
% reduction in the total area when compared with the SOI-based CMOS. More
importantly, due to the reduced process steps, the cost reduction can be achieved. We
therefore believe that a high packing density novel CMOS inverter with reduced process
steps can become one of the contenders for future CMOS scaling.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0805111-101326
Date05 August 2011
CreatorsLu, Kuan-Yu
ContributorsFeng-Der Chin (Albert Chin), Jyi-Tsong Lin, Chun-Hsing Shih, Wen-Kuan Yeh, Chee-Wee Liu
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0805111-101326
Rightsuser_define, Copyright information available at source archive

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