In recent years, there has been an increasing interest in the study of hydrophobic surfaces. Hydrophobic surfaces have been used in multiple applications in microfluidic devices due to their properties of self-cleaning, and also in deicing products. Conventionally, hydrophobic surfaces were created by laser cutting, self-assembly and other chemical processing methods. However, in most of these methods, hydrophobicity of the surface cannot be maintained for an extended time or restricted to limited set of materials. A low-cost, high-throughput method to generate highly hydrophobic anisotropic surface has been developed in this thesis which uses Computer Numerical Control (CNC) machining employing diamond tools whose tips have been micro-structured using Focused Ion Beam (FIB) built tips. The versatility of this method has been demonstrated by machining both metal and polymeric materials. Significant anisotropic wetting has been observed on the machined surface with the anisotropic contact angle can reach up to 71.6 degree and highly-hydrophobic property with contact angle of 163.1degree on 6061 Aluminum Alloy and 155.7 degree on PMMA surface. / Thesis / Master of Science in Mechanical Engineering (MSME)

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The purposes of this thesis are to prepare ZnO and tin-doped In2O3 (ITO) films at low temperature and study their microstructure and optoelectronic properties. Low-temperature growth of undoped ZnO films with high transparency and low electrical resistance was prepared by ion beam sputtering. After systematic testing, a sheet resistivity as low as 2.95 x 10-3 £[-cm was obtained at a substrate temperature of 150 oC, ion source voltage of 850 V, and ion beam current of 30 mA. The transmittance of the ZnO films was in the range of 85-90%. Hall measurements showed that a high mobility of 21.41 cm2/Vs was obtained for films less than 200 nm thick. The related microstructures and physical properties were measured and discussed. ZnO nanofilm of (2-1-10) and (01-11) surfaces were prepared on NaCl (001) surface at 200 oC and 400 oC to produce nearly pure (2-1-10) and (01-11) textures respectively and the orientation relationships were determined and the interface discussed. By dissolving the NaCl substrate, the ZnO (2-1-10) and (01-11) surfaces several cm2 in area, which may have some useful applications, can be easily prepared. The photoluminescence spectrum from the (2-1-10) surface showed only a near-band-edge UV emission peak while the (01-11) surface showed a near band-edge UV emission and a broad green emission. Low-temperature preparation of transparent conducting electrode is essential for flexible optoelectronic devices. ITO films of high transparency and low electrical resistance were prepared at room temperature with a radio-frequency ion beam sputtering system. Specimens with a low sheet resistivity of 10-4 £[-cm and a high visible-light transmittance of 85-90% were obtained. Hall measurement was used to measure the mobility and carrier concentrations and the effects on resistivity were discussed. ITO films were deposited on glass substrates at 200 oC at various oxygen flow rates. At low oxygen flow rate the film surface has ITO whiskers with metallic In tips and a crystallographic relationship of (010)In//(110)ITO and (001)In//(001)ITO is present between them. The In tips act as the seeds for the growth of ITO whiskers by a vapor-liquid-solid growth mechanism. As the oxygen flow rate increases, the crystallinity of the ITO film decreases till an amorphous phase is formed. The microstructure, resistivity and transmittance of the films were studied as a function of oxygen flow rate. Thin films of high transmittance (~90%) and low resistivity (6 x 10-4 Ω-cm) were prepared at an intermediate oxygen flow rates.

Nanocrystalline £\-Zr condensates deposited by ion beam sputtering on the NaCl (100) surfaces and then annealed at 100 oC to 750 oC in air. The phases present were identified by transmission electron microscopy to be nanometer-size £\-Zr+ZrO¡B£\-Zr+ZrO+c-ZrO2¡Bc-ZrO2¡Bc-+t-ZrO2¡Bt-ZrO2¡Band t-+m-ZrO2 phase assemblages with increasing annealing temperature. The zirconia showed strong {100} preferred orientation due to parallel epitaxy with NaCl (100) when annealed between 150 oC and 500 oC in air. The c- and t-zirconia condensates also showed (111)-specific coalescence among themselves. The c- and/or t-ZrO2 formation can be accounted for by the small grain size, the presence of low-valence Zr cation and the lateral constraint of the neighboring grains.

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Due to the fast expansion and development in the optical communication industry, the demand for the film quality has correspondingly increased. Ion beam sputter deposition (IBSD) achieves the lowest loss, but low throughput. In our Lab., E-beam system was used for CaO, MgO and Cr2O3 evaporation on the circumference of the Cr:YAG crystal fiber. Although the substrate was heated to around 275oC, the thin film didn¡¦t achieve low loss and high laser-induced damage threshold film. Adding ion-beam assisted deposition (IAD) system to enhance the thin film energy and packing density is the main theme of this thesis. The thesis mainly focuses on the characteristics of TiO2 and SiO2 thin film based on E-beam with IAD system. Spectrometer analyzer and Macleod software were used to calculate the refractive index and extinction coefficient. ESCA (electron spectroscopy for chemical analyzer) was adopt to measure the thin film composition of Ti, Si, O. SEM (scanning electron microscope) was used to observe the thin film quality. Low loss and high laser-induced damage threshold thin film are the goal of the present research. With optimized parameters, the refractive index of TiO2 film was achieved to be 2.51 at 500 nm, and the extinction coefficient was less than 2x10-4. The refractive index of SiO2 film can be achieved to be 1.466 at 500 nm, and the extinction coefficient was less than 1x10-4. An HR (R>99.83%) coating at 1233 nm was successfully demonstrated by the IAD deposition system.

Gloveboxes, where special nuclear material is handled and such as those present at Los Alamos National Labs, LANL, provide an experimental area confined within a protective shell and with strict environmental controls. These gloveboxes allow workers to indirectly interact with hazardous material. Unfortunately, these gloveboxes are not fail proof and are subject to occasional accidental failures resulting in possible breaches of containment and release of nuclear material. In particular, fires within the gloveboxes are of major concern with regard to the potential for breaches and damage to not only the glovebox but also to surrounding areas as well. Another, potentially even catastrophic, result of glovebox fires is the potential for the spread of radioactive contamination. There is some historical precedent of contaminant release resulting from glovebox fires, such as those at the Rocky Flats Plant (Buffer, 2012). Gloveboxes at LANL are currently equipped with manually activated fire suppression systems. In the event of an incident, a worker would hit a nearby emergency button and the system would be activated. However, this method relies on the worker to have the presence of mind in the face of danger to activate the system, and as such there is no true guarantee that the systems will be triggered. Since the level of consequence is dire, then the ideal situation requires that other fire suppression systems be present which do not rely on human interaction to function. The Fire Foe™ system has been chosen as a secondary failsafe measure in order to meet this need. Analysis of how the casing of the Fire Foe™ system, composed of nylon 6,6 polymer, weathers under irradiation in gloveboxes is paramount in determining the effectiveness and potential lifetimes of the systems within the gloveboxes. Samples of nylon 6,6 were exposed to a 5 Ci PuBe neutron source located at the University of Texas as well as a high dose rate beam of 4.5 MeV alpha particles located at Los Alamos to determine the effect of neutron and alpha particle damage on the polymer material. Subsequent mechanical testing was conducted to determine alteration to the tensile properties of the nylon 6,6 material for both irradiated and non-irradiated samples. / text

Orientadores: Jacobus Willibrordus Swart, Stanislav Moshkalev / Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Eletrica e de Computação / Made available in DSpace on 2018-08-13T05:10:33Z (GMT). No. of bitstreams: 1 Silva_MarceloMacchida_M.pdf: 6148337 bytes, checksum: d4ca724ac84a5417bdd4995685227913 (MD5) Previous issue date: 2007 / Resumo: A nanotecnologia e uma área nova e promissora que englobam muitas disciplinas de ciência e engenharia. Seu rápido crescimento nas ultimas duas décadas é devido ao crescimento simultâneo na fabricação e caracterização de materiais em escala nanométrica. O objetivo deste trabalho é desenvolver uma técnica de processo híbrido para a fabricação de micro e nanocontatos assim como sua caracterização elétrica. Esse processo híbrido combina a fotolitografia seguida da técnica de lift-off e a deposição de platina por FIB. Para determinar a resistividade da platina depositada por FIB (Focuded Ion Beam), foram fabricas estruturas quadradas variando sua espessura de 5 nm - 100 nm e sua área 150 µm 150 µm e 20 µm x 20 µm. Resistores com comprimento de 30 µm variando sua área de secção (50 nm x 50 nm - 1 µm x 1 µm) foram fabricados a fim de uma melhor na caracterização do processo de deposição do filme de Pt assim como sua caracterização elétrica. As medidas elétricas foram realizadas na estação Keythley 4200 SCS, onde foi utilizado o método de quatro pontas nas estruturas quadradas para a caracterização da resistividade. Nos resistores utilizamos a configuração de dois terminais para a caracterização de resistência dos nanocontatos. / Abstract: Nanoscale science and technology is a young and burgeoning field that encompasses nearly every discipline of science and engineering, the rapid growth of the field in the past decades has been enable by the sustained advances in the fabrication and characterization of materials. This work presents the hybrid process for fabrication of micro and nanocontacts, this process include the lift - off technique and platinum deposited by FIB. For measurements, two types of test structures were fabricated: (i) 150 x 150 µm and 20 x 20 µm squares with thickness of 5, 10, 30 and 100 nm, and (ii) 30 µm long resistors with variable cross - section (50 nm x 50 nm to 1 µm x 1 µm). The Pt film resistivity has been measured by a four points probe method. / Mestrado / Eletrônica, Microeletrônica e Optoeletrônica / Mestre em Engenharia Elétrica