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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
81

A study of some thin transition metal oxide films

Yagoubi, Benabdella January 1989 (has links)
This thesis analyses the effect of varying the compositions of co-evaporated V205/TeO2, W03/CeO2, SiO/TeO2 and W03/TeO2 amorphous thin films on their electrical and optical properties. Some information about the electronic properties of these oxides may be obtained by comparison of the results. In the oxide systems containing transition metal ions the expression for hopping energy at low temperatures contains a term due to the hopping energy of polarons in addition to that due to the disorder. In the dielectric SiO/TeO2 thin films the distortion of 'the molecule is thought to be quite weak and thus the carriers do not form polarons. They would move by hopping at the band edge at low temperatures and by excitation to a mobility edge at high temperatures. The electrical conductivity of V205/TeO2 amorphous thin films is discussed in the light of the Mott(1968) theory. The optical absorption edge was found to obey the direct forbidden transitions equation cc ico=B(fiw-EOP)3'2. The frequency-squared dependence of the conductivity of W03/CeO2 thin films (high content of CeO2) in the frequency region where the capacitance is constant is associated with the lead resistance according to Street et al (1971). The optical energy gap of the films varies with the composition in same way as in doped crystalline semiconductors. The value of the, optical W03/Ce02 was calculated using the Davis and Mott (1970) formula for non-direct optical transitions. The capacitance of SiO/TeO2 thin films is found to be almost independent of frequency as well as of temperature. This is due to a strong ionic bonding which characterises a good insulator. The optical absorption edge of SiO/TeO2 is found to be sharper than that of W03/ CeO2 and very similar to that found in most crystalline solids. The value of the optical energy gap is calculated using the same formula as in W03/CeO2. The systematic change of the optical gap with composition is observed only in a limited range of compositions. The a. c electrical properties of W03/Te02 amorphous thin films are described using the Springett(1974) and Elliott(1977) models. The optical absorption edge of WO3/TeO2 is found to lead to new arguments about the origin of the Urbach edges.The a. c electrical conductivity shows a frequency dependence of the form as ca wS in all samples studied in the present work. The mechanism of conduction at low temperatures with the index varying from 0.5 to I is thought to be due to hopping of electrons between localized states in the gap. At high fields the d. c current shows a non-linear dependence on the applied electric field. This is thought to be due to either space charge or Schottky effects in the oxides containing transition metal ions. In SiO/TeO2 dielectric films, the non-linear dependence of current on the electric field is thought to be due to either the Poole-Frenkel effect or at slightly lower fields it could be due to impurities.
82

Substituted poly(benzo[c]thiophenes) : new low band-gap conducting polymers

King, Geoffrey January 1995 (has links)
No description available.
83

Optically excited surface polaritons using strongly absorbing media

Yang, Fuzi January 1991 (has links)
No description available.
84

Dielectric response of metals using optically excited surface plasmon-polaritons

Tillin, Martin David January 1989 (has links)
No description available.
85

Electrical and optical characterisations of novel phthalocyanine Langmuir-Blodgett films

Mukhopadhyay, Sabarna January 1990 (has links)
No description available.
86

Mechanistic studies of plasma polymerization

Ryan, Martin Edward January 1995 (has links)
Plasma polymerization is a solventless method for depositing polymeric layers onto any substrate at room temperature. This technique comprises excitation, fragmentation, and polymerization of precursor molecules by an electrical discharge. Although widely used, the fundamental molecular processes associated with plasma polymerization are not fully understood. Basic plasma / polymer interactions were studied by investigating the surface treatment of polytetrafluoroethylene (PTFE) using inert and reactive gas discharges. Depending upon the feed gas employed, chemical, UV, or ion beam modification of the PTFE surface were found to be important. Argon glow discharge treatment was found to result in similar physicochemical phenomena at the PTFE surface to that observed during argon ion beam studies, thereby supporting the relative importance of ion bombardment during noble gas plasma modification. In high power discharges it has been shown that extensive ion bombardment of PTFE can lead to the simultaneous sputtering and plasma polymerization of ejected species onto an adjacent substrate. The chemical nature of the resultant fluorocarbon deposits for various gases was found to correlate to the earlier surface treatment studies. Another way of carrying out plasma polymerization is to use pulsed plasmas; these offer the advantage of greater retention of monomer structure within the plasma polymer matrix. In the case of maleic anhydride less fragmentation of the precursor, reduced beam damage of the polymer, and radically initiated polymerization was observed by increasing the off-period of the pulse. Similarly the structural characteristics of 2- iodothiophene plasma polymers were found to be influenced by the electrical discharge power and pulsing parameters leading to a gradual destruction of the aromatic ring structure.
87

Low temperature growth of Amorphous Silicon thin film.

Malape, Maibi Aaron. January 2007 (has links)
<p>The growth of amorphous hydrogenated silicon (a-Si:H) thin films deposided by hot wire chemical vapor deposition (HWCVD) has been studied. The films have been characterised for optical and structural properties by means of UV/VIS,FITR,ERDA, XRD.XTEM and Raman spectroscopy. Low subtrate heater temperatures in the range form 130 to 200 degrees celcius were used in this thesis because it is believed to allow for the deposition of device quality a-Si:H which can be used for electronic photovoltaic devices. Furthermore, low temperatures allows the deposition of a-Si:H on any subtrate and thus offers the possibility of making large area devices on flexible organic substances. We showed that the optical and structural properties of grown a-Si:H films depended critically upon whether the films were produced with silane gas or silane diluted with hydrogen gas. We also showed that it is possible to to deposit crystalline materials at low temperature under high hydrogen dilution ratio of silane gas.</p>
88

Optical properties of thin films of some semiconductors / by Eshan Ellahi Khawaja.

Khawaja, Eshan Ellahi January 1975 (has links)
147 leaves : ill., photos ; 26 cm. / Title page, contents and abstract only. The complete thesis in print form is available from the University Library. / Thesis (Ph.D.)--University of Adelaide, Dept. of Physics, 1976
89

Use of accurate asymptotic analyses of local transport rates in the design of alkaline scrubber-stripper systems for acid gas separation /

Al Hashimi, Saleh. January 2000 (has links)
Thesis (Ph.D.)--Tufts University, 2000. / Adviser: Jerry Meldon. Submitted to the Dept. of Chemical Engineering. Includes bibliographical references (leaves 221-225). Access restricted to members of the Tufts University community. Also available via the World Wide Web;
90

Synthesis, fractionation, and thin filmp rocessing of nanoparticles using the tunable solvent properties of carbon dioxide gas expanded liquids

Anand, Madhu, January 2007 (has links) (PDF)
Thesis (Ph.D.)--Auburn University, 2007. / List of publication generated from this dissertation research (ℓ. ix) Abstract. Vita. Includes bibliographic references (ℓ. 231-259)

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