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Amorphous Metal Oxide Thin Films from Aqueous Precursors: New Routes to High-κ Dielectrics, Impact of Annealing Atmosphere Humidity, and Elucidation of Non-uniform Composition ProfilesWoods, Keenan 10 April 2018 (has links)
Metal oxide thin films serve as critical components in many modern technologies, including microelectronic devices. Industrial state-of-the-art production utilizes vapor-phase techniques to make high-quality (dense, smooth, uniform) thin film materials. However, vapor-phase techniques require large energy inputs and expensive equipment and precursors. Solution-phase routes to metal oxides have attracted great interest as cost-effective alternatives to vapor-phase methods and also offer the potential of large-area coverage, facile control of metal composition, and low-temperature processing.
Solution deposition has previously been dominated by sol-gel routes, which utilize organic ligands, additives, and/or solvents. However, sol-gel films are often porous and contain residual carbon impurities, which can negatively impact device properties. All-inorganic aqueous routes produce dense, ultrasmooth films without carbon impurities, but the mechanisms involved in converting aqueous precursors to metal oxides are virtually unexplored. Understanding these mechanisms and the parameters that influence them is critical for widespread use of aqueous approaches to prepare microelectronic components. Additionally, understanding (and controlling) density and composition inhomogeneities is important for optimizing electronic properties. An overview of deposition approaches and the challenges facing aqueous routes are presented in Chapter I. A summary of thin film characterization techniques central to this work is given in Chapter II.
This dissertation contributes to the field of solution-phase deposition by focusing on three areas. First, an all-inorganic aqueous route to high-κ metal oxide dielectrics is developed for two ternary systems. Chapters III and IV detail the film formation chemistry and film properties of lanthanum zirconium oxide (LZO) and zirconium aluminum oxide (ZAO), respectively. The functionality of these dielectrics as device components is also demonstrated. Second, the impact of steam annealing on the evolution of aqueous-derived films is reported. Chapter V demonstrates that steam annealing lowers processing temperatures by effectively reducing residual counterion content, improving film stability with respect to water absorption, and enhancing dielectric properties of LZO films. Third, density and composition inhomogeneities in aqueous-derived films are investigated. Chapters VI and VII examine density inhomogeneities in single- and multi-metal component thin films, respectively, and show that these density inhomogeneities are related to inhomogeneous metal component distributions.
This dissertation includes previously published coauthored material.
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Zinc Oxide Nanotip and Nanorod on Titanium Oxide Heterojunction Gas Sensor Prepared by Aqueous Solution DepositionHong, Min-Hsuan 28 August 2011 (has links)
In this study, zinc oxide (ZnO) nanotip and nanorod were grown on glass substrate by aqueous solution deposition (ASD). Both characteristics of the two nanostructures were investigated. For fabrication of ZnO nanostructure UV photodetector, In-Zn inter-digitated metal electrode was evaporated on the top of the grown ZnO nanostructure to form the contact via. Compared with the common value (375 nm), both the peaks from the PL spectra of ZnO nanotip and nanorod are red-shifted (409 nm) due to the massive defects in nanotip and nanorod. In order to improve the photosensiblity, heterojunction of ZnO nanostructure/TiO2 film was prepared and were made into UV photodetector. Photoresponses of both nanotip and nanorod were improved after N2O annealing at 300oC. With the heterojunction of ZnO 1D nanostructure on TiO2 film, the photoresponses of both ZnO nanotip/TiO2 film can reach to 22.85, and the rise time and decay time are 40 and 82 seconds, respectively. On the other side, the photoresponses of both ZnO nanorod/TiO2 film can reach to 27.44, and the rise time and decay time are 22 and 133 seconds, respectively.
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