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Multicomponent catalysts for methanol electro-oxidation processes synthesized using organometallic chemical vapourde position techniqueNaidoo, Qiling Ying January 2011 (has links)
In this study, the OMCVD method is demonstrated as a powerful, fast, economic and environmental friendly method to produce a set of PGMelectrocatalysts with different supports, metal content and metal alloys in one step and without the multiple processing stages of impregnation, washing, drying, calcinationsand activation.
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Multicomponent catalysts for methanol electro-oxidation processes synthesized using organometallic chemical vapourde position techniqueNaidoo, Qiling Ying January 2011 (has links)
<p>In this study, the OMCVD method is demonstrated as a powerful, fast, economic and environmental friendly method to produce a set of PGMelectrocatalysts with different supports, metal content and metal alloys in one step and without the multiple processing stages of impregnation, washing, drying, calcinationsand activation.</p>
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Theoretical Investigations of Boron Related Materials Using DFTArvidsson, Igor January 2007 (has links)
In the history of Chemistry, materials chemists have developed their ideas mainly by doing experiments in laboratories. The underlying motivation for this laboratory work has generally been pure curiosity or the ambition to find a solution to a specific problem. Minor changes in the composition or structure of a material can cause major changes in its properties. The development of powerful computers has now opened up the possibility to calculate properties of new materials using quantum mechanical methods. The Chemistry of different boron-related materials has been evaluated in this thesis by Density Functional Theory (DFT). Cubic boron nitride (c-BN) is a most interesting material for the microelectronics and tool industry. During thin film deposition of c-BN, several problems arise which most often result in unwanted BN isomorphs. Chemical processes at the (110) and (111) surface of c-BN have been investigated in order to shed light upon some of these complex processes. Typically adsorption energies and surface reconstruction were found to differ significantly between the two surfaces. Other materials investigated are layered transition-metal diborides (MeB2). Incorporation of transition-metal atoms into elemental boron in its most fundamental structure, ά-boron, has also been investigated. The calculations on MeB2 focused on the stability of the planar compared to the puckered structure of MeB2. Stability was investigated by calculating Density of States (DOS) and bond populations. Deviations in the cell parameters from their ideal values were also considered. A separate project concerned reactivity of the TiB2(001) surface. Molecular and dissociated adsorption energies and adsorption geometries were calculated for H2, H2O and O2. It was concluded that the titanium surface was more reactive than the boron surface and that the adsorption energies were comparable to or stronger than other well known surface-active compounds like TiO2.
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Characterization of carbon nanotubes grown by chemical vapour depositionAhmed, Muhammad Shafiq 01 August 2009 (has links)
Carbon nanotubes (CNTs), discovered by Ijima in 1991, are one of the allotropes of carbon, and can be described as cylinders of graphene sheet capped by hemifullerenes.
CNTs have excellent electrical, mechanical, thermal and optical properties and
very small size. Due to their unique properties and small size, CNTs have a great
potential for use in electronics, medical applications, field emission devices (displays,scanning and electronprobes/microscopes) and reinforced composites. CNTs can be grown by different methods from a number of carbon sources such as graphite, CO,C2H4, CH4 and camphor. Under certain conditions, a metallic catalyst is used to initiate the growth. The three main methods used to grow CNTs are: Arc-discharge, laser ablation (LA) and chemical vapour deposition (CVD). In the present work CNTs were grown from a mixture of camphor (C10H16O) and ferrocene (C10H10Fe) using Chemical Vapour Deposition (CVD) and argon was used as a carrier gas. The iron particles from ferrocene acted as catalysts for growth. The substrates used for the growth of CNTs were crystalline Si and SiO2 (Quartz) placed in a quartz tube in a horizontal furnace. Several parameters have been found to affect the CNT growth process. The effects of three parameters: growth temperature, carrier gas (Ar) flow rate and catalyst concentration were investigated in the present work in order to optimize the growth conditions with a simple and economical CVD setup. The samples were characterized using electron microscopy (EM), thermogravimetirc analysis (TGA), Raman and FTIR spectroscopy
techniques. It was found that the quality and yield of the CNTs were best at 800°C
growth temperature, 80sccm flow rate and 4% catalyst concentration.
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Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3Dagur, Pritesh 02 1900 (has links)
Thin films and coatings of oxides are used in various fields of science and technology, such as semiconductor and optoelectronic devices, gas sensors, protective and wear resistant coatings etc. Of late, there has been a tremendous interest in pure and doped vanadium dioxide as thermoelectric switch material. VO2 has been doped with hetero-atoms such as W, Mo, Nb, Ti etc. and effects of doping have been correlated with feasibility of being used as a smart window material. The oxide Al2O3 has been studied as an alternative gate dielectric. Ga2O3 is also a contender for replacing SiO2 as a dielectric material.
Atomic layer deposition (ALD) is a technique for the deposition of thin films of various materials and is found to be of considerable scientific and technological importance. In particular, using β-diketonate complexes as precursors is very useful in preparing thin films of oxides, as these precursors already contain a metal-oxygen bond. In this thesis, β-diketonate complexes have been used as precursors for deposition of thin films. The thesis has been divided into two parts: First part deals with deposition and characterization of thin films of VO2 on glass and fused quartz. The second part deals with synthesis and chemical and thermal characterization of bimetallic Al-Ga acetylacetonates along with thin film deposition using the same.
Chapter 1 presents a brief introduction to application of thin films of oxides in various fields of science and technology. A brief introduction to the ALD reactor used for the current work is also presented. The importance of thermal analysis of precursors for CVD is briefly reviewed. Chapter 2 deals with the instruments and methods used for the work done for this thesis. In Chapters 3 and 4 of the thesis, a detailed study of deposition of VO2 films on glass and fused quartz has been presented. The films deposited have been analyzed using a host of techniques, for their texture, microstructure and electrical properties. In spite of chemical similarities, considerable differences in structure and properties have been observed between the films deposited on the two substrates. These differences have been explained on the basis of the small chemical differences between the two substrates. Chapters 5, 6 and 7 deal with synthesis, thermal characterization and use of bimetallic Al-Ga precursors, respectively. The bimetallic acetylacetonates have been synthesized using ‘homogenization in solution’ approach. Chemical characterization of the precursors revealed that nominal percentages of Al and Ga are retained in the solid precursors. Single crystal structure confirmed the observation. Thermal analysis of the precursors showed that the precursors, which are solid solutions of Al and Ga acetylacetonates, show negative deviation from the Raoult’s Law. Films were deposited using these precursors and were found to near completely retain the composition of the precursors. Chapter 8 of the thesis presents the conclusions of the current work and proposes future directions.
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Phosphane and Phosphite Silver(I) Complexes: Synthesis, Reaction Chemistry and their Use as CVD PrecursorsDjiele Ngameni, Patrice 03 February 2005 (has links) (PDF)
Silver(I) complexes of type LnAgX (X = organic ligand, such as carboxylates, dicarboxylates, Schiff-base; L = Lewis-bases, e. g. PnBu3, P(OMe)3, P(OEt)3; n = 1, 2, 3) have been synthesized and characterized with respect to their suitability for the Chemical Vapour Deposition (CVD) of silver thin films. For some of these compounds single crystal could be obtained. Their solid-state structure was determined by single crystal X-ray diffraction. The volatility, thermal stability, and gas phase decomposition mechanism of selected compounds were studied using temperature-programmed and in-situ mass spectrometry. CVD experiments were performed according to the results of the gas phase analysis. Silver films could be grown by using a cold-wall CVD reactor. The morphology of the latter films was determined. / Silber(I) Komplexe LnAgX (X = organische Ligand, Z. B. Carboxylate, Dicarboxylate, Schiff Base; L = Lewis-Base, Z. B. PnBu3, P(OMe)3, P(OEt)3; n = 1, 2, 3) wurden Bezug auf ihre Eignung für die chemische Gasphasenabscheidung von Silberfilmen synthetisiert und charakterisiert. Von einigen dieser Verbindung konnten Einkristalle erhalten werden. Der Bau dieser Verbindungen wurde mittels Röntgeneinkristallographie ermittelt. Ausgewählten Verbindungen wurden mit Temperatur-programmierter und in-situ Massenspektrometrie analysiert. Gasphasenabscheidungs- mechanismen für einige Prekursoren sind vorgestellt. CVD-Abscheidungsexperimente wurden entsprechend den Ergebnissen der Gasphaseanalyse durchgeführt. Silber Schichten konnten mit einen Kaltwand CVD-Reaktor erzeugt werden, deren Oberflächenmorphologie wurde untersucht.
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High dynamic stiffness nano-structured composites for vibration control : A Study of applications in joint interfaces and machining systemsFu, Qilin January 2015 (has links)
Vibration control requires high dynamic stiffness in mechanical structures for a reliable performance under extreme conditions. Dynamic stiffness composes the parameters of stiffness (K) and damping (η) that are usually in a trade-off relationship. This thesis study aims to break the trade-off relationship. After identifying the underlying mechanism of damping in composite materials and joint interfaces, this thesis studies the deposition technique and physical characteristics of nano-structured HDS (high dynamic stiffness) composite thick-layer coatings. The HDS composite were created by enlarging the internal grain boundary surface area through reduced grain size in nano scale (≤ 40 nm). The deposition process utilizes a PECVD (Plasma Enhanced Chemical Vapour Deposition) method combined with the HiPIMS (High Power Impulse Magnetron Sputtering) technology. The HDS composite exhibited significantly higher surface hardness and higher elastic modulus compared to Poly(methyl methacrylate) (PMMA), yet similar damping property. The HDS composites successfully realized vibration control of cutting tools while applied in their clamping interfaces. Compression preload at essential joint interfaces was found to play a major role in stability of cutting processes and a method was provided for characterizing joint interface properties directly on assembled structures. The detailed analysis of a build-up structure showed that the vibrational mode energy is shifted by varying the joint interface’s compression preload. In a build-up structure, the location shift of vibration mode’s strain energy affects the dynamic responses together with the stiffness and damping properties of joint interfaces. The thesis demonstrates that it is possible to achieve high stiffness and high damping simultaneously in materials and structures. Analysis of the vibrational strain energy distribution was found essential for the success of vibration control.
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Multicomponent catalysts for methanol electro-oxidation processes synthesized using organometallic chemical vapourde position techniqueNaidoo, Qiling Ying January 2011 (has links)
<p>In this study, the OMCVD method is demonstrated as a powerful, fast, economic and environmental friendly method to produce a set of PGMelectrocatalysts with different supports, metal content and metal alloys in one step and without the multiple processing stages of impregnation, washing, drying, calcinationsand activation.</p>
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Multicomponent catalysts for methanol electro-oxidation processes synthesized using organometallic chemical vapourde position techniqueNaidoo, Qiling Ying January 2011 (has links)
In this study, the OMCVD method is demonstrated as a powerful, fast, economic and environmental friendly method to produce a set of PGMelectrocatalysts with different supports, metal content and metal alloys in one step and without the multiple processing stages of impregnation, washing, drying, calcinationsand activation.
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Cu-catalyzed chemical vapour deposition of graphene : synthesis, characterization and growth kineticsWu, Xingyi January 2017 (has links)
Graphene is a two dimensional carbon material whose outstanding properties have been envisaged for a variety of applications. Cu-catalyzed chemical vapour deposition (Cu-CVD) is promising for large scale production of high quality monolayer graphene. But the existing Cu-CVD technology is not ready for industry-level production. It still needs to be improved on some aspects, three of which include synthesizing industrially useable graphene films under safe conditions, visualizing the domain boundaries of the continuous graphene, and understanding the kinetic features of the Cu-CVD process. This thesis presents the research aiming at these three objectives. By optimizing the Cu pre-treatments and the CVD process parameters, continuous graphene monolayers with the millimetre-scale domain sizes have been synthesized. The process safety has been ensured by delicately diluting the flammable gases. Through a novel optical microscope set up, the spatial distributions of the domains in the continuous Cu-CVD graphene films have been directly imaged and the domain boundaries visualised. This technique is non-destructive to the graphene and hence could help manage the domain boundaries of the large area graphene. By establishing the novel rate equations for graphene nucleation and growth, this study has revealed the essential kinetic characteristics of general Cu-CVD processes. For both the edge-attachment-controlled and the surface-diffusion-controlled growth, the rate equations for the time-evolutions of the domain size, the nucleation density, and the coverage are solved, interpreted, and used to explain various Cu-CVD experimental results. The continuous nucleation and inter-domain competitions prove to have non-trivial influences over the growth process. This work further examines the temperature-dependence of the graphene formation kinetics leading to a discovery of the internal correlations of the associated energy barriers. The complicated effects of temperature on the nucleation density are explored. The criteria for identifying the rate-limiting step is proposed. The model also elucidates the kinetics-dependent formation of the characteristic domain outlines. By accomplishing these three objectives, this research has brought the current Cu-CVD technology a large step forward towards practical implementation in the industry level and hence made high quality graphene closer to being commercially viable.
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