Le travail de thèse implique l'étude de matériaux conducteurs transparents sans indium (TCM), composants essentiels de nombreux dispositifs optoélectroniques, utilisant le dépôt spatial de couches atomiques sous pression atmosphérique (AP-SALD). Cette nouvelle technique partage les avantages principaux de l'ALD classique, mais en plus permet le dépôt de couches minces de haute qualité sur de grandes surfaces avec un contrôle précis à l’échelle nanométrique. Ce travail est focalisé sur l'optimisation des propriétés électriques des films d'oxyde de zinc dopé à l'aluminium (ZnO: Al), l'un des oxydes conducteurs les plus étudiés (TCOs). L'influence de plusieurs paramètres expérimentaux sur les propriétés physiques des films a été étudié. Le mécanisme de transport des porteurs de charge au niveau des joints de grains a été identifié comme étant l'émission tunnel plutôt que l’émission thermoïonique dans le ZnO fortement dopé, grâce à un nouveau modèle que nous avons développé en utilisant la méthode de la matrice de transfert à fonction Airy (AFTMM). En résumé, la densité du piège à électrons aux joints de grains pour les échantillons de ZnO:Al (2,2 × 10^20 cm-3) préparés par AP-SALD a été estimée à environ 7,6 ×10^13 cm-2. Notre modèle montre que la diffusion par les joints de grains est le mécanisme de diffusion dominant dans nos films fabriqués par AP-SALD. Nous avons trouvé que le recuit assisté par UV (~ 200 ° C) sous vide était une méthode efficace pour réduire les pièges aux joints de grains, entraînant une amélioration de la mobilité de 1 cm2V-1s-1 à 24 cm2V-1s-1 pour ZnO et à 6 cm2V -1s-1 pour ZnO:Al. Nous avons également utilisé AP-SALD pour fabriquer des TCM performants, stables et flexibles basés sur un réseau de nanofils métalliques. Pour cela, nous avons développé des électrodes composites en revêtant des nanofils argent ou cuivre (AgNWs ou CuNWs) avec ZnO, Al2O3, ou ZnO: Al. Un revêtement très conforme d’une épaisseur de quelques dizaines de nanomètres déposé par la technique AP-SALD améliore considérablement les stabilités thermique et électrique du réseau AgNWs ou CuNWs. Les propriétés optoélectroniques élevées (résistance de surface 10 ohms/carré, transmittance ~ 90%) du composite AgNW / ZnO: Al les rendent très appropriés pour une application en tant que TCM, en particulier pour les dispositifs flexibles.Enfin, en tant que technique de dépôt versatile, AP-SALD est bien compatible avec la technologie des cellules solaires à hétérojonction de silicium (Si-HET) en termes de passivation d'interface. L'intégration de TCM ZnO: Al et AgNWs à la cellule Si-HET a également été explorée. / The thesis work involves the study of Indium-free Transparent Conductive Materials (TCMs), key components of many optoelectronic devices, using Atmospheric Pressure Spatial Atomic Layer Deposition (AP-SALD). This new approach shares the main advantages of conventional ALD but allows open-air, very fast deposition of high-quality nanometer-thick materials over large surfaces. We focused on the optimization of the electrical properties of Aluminum doped Zinc Oxide (ZnO:Al) films, one of the most studied Transparent Conductive Oxides (TCOs). The effect of several experimental parameters on the physical properties of the deposited films has been evaluated. The carrier transport mechanism at grain boundaries was identified to be tunneling rather than thermionic emission in highly doped ZnO, thanks to a new model we have developed using the Airy Function Transfer Matrix Method. Accordingly, the electron trap density at grain boundaries for ZnO:Al samples (2.2×1020 cm-3) prepared by AP-SALD was estimated to be about 7.6×1013 cm-2. Our model shows that grain boundary scattering is the dominant scattering mechanism in our films. We found that UV assisted annealing (~ 200 °C) under vacuum was an efficient method to reduce grain boundary traps, resulting in an improvement of mobility from 1 cm2V-1s-1 to 24 cm2V-1s-1 for ZnO and to 6 cm2V-1s-1 for ZnO:Al. We have also used AP-SALD to fabricate high-performance, stable and flexible TCMs based on metallic nanowire network. For that, we developed composite electrodes by coating silver/copper nanowires (AgNWs/CuNWs) with ZnO, Al2O3, or ZnO:Al. A thin conformal coating deposited by AP-SALD technique enhanced drastically the thermal/electrical stability of the AgNWs/CuNWs network. High optoelectronic properties (resistivity ~ 10-4 Ωcm, transmittance ~ 90 %) of the AgNW/ZnO:Al composite make them very appropriate for application as TCM, especially for flexible devices.Finally, as a soft deposition technique, AP-SALD is completely compatible to the Silicon heterojunction (Si-HET) solar cell technology in terms of interface passivation. The integration of ZnO:Al and AgNWs based TCMs to Si-HET cell has also been explored.

Single-Walled Carbon Nanotube (SWCNT) based Very Large Scale Integrated circuit (VLSI) interconnect is one of the emerging technologies, and has the potential to overcome the thermal issues persisting even with the advanced copper based interconnect. This is because of it’s promising electrical and thermal transport properties. It can be stated that thermal energy transport in SWCNTs is highly anisotropic due to the quasi one dimensionality, and like in other allotropes of carbon, phonons are the dominant energy carriers of heat conduction. In case of conventional interconnect materials, copper and aluminium, although their thermal conductivity varies over orders of magnitude at temperatures below100 K, near room temperature and above they have almost constant value. On the other hand, the reported experimental studies on suspended metallic SWCNTs illustrate a wide variation of the longitudinal lattice thermal conductivity (κl) with respect to the temperature(T)and the tube length(L)at low, room and high temperatures. Physics based analytical formulation of κl of metallic SWCNT as a function of L and T is essential to efficiently quantify this emerging technology’s impact on the rising thermal management issues of Integrated Circuits. In this work, a physics based diameter independent analytical model for κl of metallic SWCNT is addressed as a function of Lover a wide range of T. Heat conduction in metallic SWCNTs is governed by three resistive phonon scattering processes; second order three phonon Umklapp scattering, mass difference scattering and boundary scattering. For this study, all the above processes are considered, and the effective mode dependent relaxation time is determined by the Matthiessen’s rule. Phonon Boltzmann transport equation under the single mode relaxation time approximation is employed to derive the non-equilibrium distribution function. The heat flux as a function of temperature gradient is obtained from this non-equilibrium distribution function. Based on the Fourier’s definition of thermal conductivity, κl of metallic SWCNT is formulated and the Debye approximations are used to arrive at analytical model. The model developed is validated against both the low and high temperature experimental investigations. At low temperatures, thermal resistance of metallic SWCNT is due to phonon-boundary scattering process, while at high temperatures it is governed by three phonon Umklapp scattering process. It is understood that apart from form factor due to mass difference scattering, boundary scattering also plays the key role in determining the peak value. At room temperature, κl of metallic SWCNT is found to be an order of magnitude higher than that of most of metals. The reason can be attributed to the fact that both sound velocity and Debye temperature which have direct effect on the phonon transport in a solid, are reasonably higher in SWCNTs. Though Umk lapp processes reduce the κl steeper than 1/T beyond room-temperature, it’s magnitude is round1000 W/m/K upto 800 K for various tube lengths, which confirms that this novel material is indeed an efficient conductor of heat also, at room-temperature and above.