Silicon Carbide has been a semiconductor material of interest as a high power and temperature replacement for Silicon (Si) in harsh environments due to the higher thermal conductivity and chemical stability of SiC. The cost, however, to produce this material is quite high. There are also defects in the substrate material (SiC) that penetrate into the active devices layers which are known device killers. Silicon is a material that provides a low cost substrate material for epitaxial growth and does not contain the defects that SiC substrates have. However, the large (~22%) lattice mismatch between Si and SiC creates dislocations at the SiC/Si interface and defects in the SiC epitaxial layer. These defects result in high leakage currents in 3C-SiC/Si devices. The main focus of the this research was to reduce or eliminate these defects using novel Si substrates. First a 3C-SiC on Si baseline process was developed under atmospheric pressure conditions consisting of 3 steps - an in-situ hydrogen etch to remove the native oxide, a carbonization step to convert the Si surface to SiC, and finally a growth step to thicken the SiC layer to the desired value. This process was then modified to establish a high-quality, low-pressure 3C-SiC CVD growth process. This LPCVD process was then used to grow 3C-SiC on numerous novel Si substrates, including porous Si, porous 3C-SiC "free-standing" substrates and SOI substrates which consisted on thin Si films bonded to poly-crystalline SiC plates. The results of these experiments are presented along with suggestions for future work so that device-grade films of 3C-SiC can be developed for various applications.

The hydrogen (H2) gas sensing mechanism driving 3C-SiC resistive gas sensors is investigated in this work in which two hypotheses are proposed. One hypothesis involves the surface adsorption of H2 on the sensor surface with the adsorbed molecules influencing the flow of current in a resistive gas sensor, termed the surface adsorption detection mechanism. The second hypothesis includes the transfer of heat from the sensor to the gas, producing a change in the temperature of the device when the heat transfer characteristics of the gas change, termed the thermal detection mechanism. The heat transfer characteristics of the gas are dependent on the thermal conductivity of the gas, a property which is a strong function of gas composition. Thus, the thermal detection mechanism mainly detects changes in the thermal conductivity of a gas or gas mixture.Initial experiments suggested the surface adsorption mechanism as the detection mechanism of resistive 3C-SiC gas sensors. However, these experiments were performed in the absence of device temperature measurements. Recent experiments in which the device temperature was measured with a resistance temperature detector (RTD) in thermal contact with the device strongly support the thermal detection mechanism as being responsible for hydrogen gas detection. Experimental observations show the temperature of the resistive 3C-SiC hydrogen gas sensors changes greatly with changing hydrogen gas composition. For example, a 3C-SiC/SOI resistive sensor biased at 10 Vdc displayed a change in temperature from ~400°C to ~216°C, correlating to a change in current from ~41 mA to ~6mA, upon the introduction of 100% H2. The this 3C-SiC/SOI resistive sensor, this large decrease in temperature caused a large increase in resistance which is detected as a decrease in current. Several different experiments have also been performed to confirm the thermal detection mechanism hypothesis.

The growth of bulk cubic silicon carbide has for a long time seemed to be something for the future. However, in this thesis the initial steps towards bulk cubic silicon carbide have been taken. The achievement of producing bulk cubic silicon carbide will have a great impact in various fields of science and industry such as for example the fields of semiconductor technology within electronic- and optoelectronic devices and bio-medical applications. The process that has been used to grow the bulk cubic silicon carbide is a modification of the seeded sublimation growth, and the seeds have been grown by sublimation epitaxy. Selected samples have been characterized with a variety of different methods. The surface morphology of the samples has been examined using optical microscope, atomic force microscope and scanning electron microscope. The crystal structure has been investigated by the methods X-ray diffraction and transmission electron microscopy. The electrical resistance of the grown seeds was evaluated by four probe measurements. High crystal quality seeds have been grown with semiconductor properties and bulk silicon carbide was demonstrated using the seeds.

Silicon carbide, SiC, is a semiconductor material which has many diverse uses in many of today's leading technologies. The wide band-gap aspect of the material has been utilized to create power and high frequency electronics, its physical hardness enables its use for MEMS devices, and the biological compatibility make perfect for utilization in medical applications. SiC is not a chemical compound normally found in nature and must be artificially generated. One of the methods used for the creation of single crystal, high quality SiC material is provided through the use of a chemical vapor deposition reactor. The University of South Florida currently has a horizontal hot-wallLPCVD reactor used by Dr. S. E. Saddow and his group to grow epitaxial SiC material for research grants by ONR and ARL.These agencies have commissioned the construction of a second LPCVD reactor for the primary purpose of growing 3C-SiC, a specific SiC crystal polytype, and this work describes the fabrication of the new reactor, MF2. This reactor was designed using the first reactor, MF1, as a template, but the design was modified to better facilitate single crystalline growth. The environment of the reactor is a very important consideration for crystal growth, and slight variations can cause critical defect incorporation into the crystal lattice. Many conditioning runs were required to facilitate the epitaxial growth of the different polytypes of SiC, and constant switching of the primary hot-zone required for the growth of hexagonal 4H-SiC and 6H-SiC to the hot zone required for 3C-SiC consumed precious resources and time. The new reactor uses a single primary control to monitor the three most important environmental concerns; hot-zone temperature, gaseous flow, and chamber pressure. The new reactor has been designed to use 100 mm Si substrates instead of the 50mm Si substrate size currently in use by MF1. The construction, testing, and 3C-SiC epitaxial growth on Si substrate capability of a 200 mm 3C-SiC hot-wall LPCVD reactor are demonstrated through this work.

Damage to the central nervous system (CNS) leads to the generation of an immune response which culminates with the encapsulation of the damaged area. The encapsulation, known as a glial scar, essentially breaks neural signal pathways and blocks signal transmissions to and from the CNS. The effect is the loss of motor and sensory control for the damaged individual. One method that has been used successfully to treat this problem is the use of a brain-machine interface (BMI) which can intercept signals from the brain and use these signals to control a machine. Although there are many types of BMI devices, implantable devices show the greatest promise with the ability to target specific areas of the CNS, with reduced noise levels and faster signal interception, and the fact that they can also be used to send signals to neurons. The largest problem that has plagued this type of BMI device is that the materials that have been used for their construction are not chemically resilient, elicit a negative biological response, or have difficulty functioning for extended periods of time in the harsh body environment. Many of these implantable devices experience catastrophic failure within weeks to months because of these negative factors. New materials must be examined to advance the future utilization of BMI devices to assist people with CNS damage or disease. We have proposed that two semiconductor materials, cubic silicon carbide (3C-SiC) and nanocrystalline diamond (NCD), which should provide solutions to the material biocompatibility problems experienced by implantable BMI devices. We have shown in this study that these two materials show chemical resilience to neuronal cellular processes, and we show evidence which indicates that these materials possess good biocompatibility with neural cell lines that, in the worst case, is comparable to celltreated polystyrene and, in most cases, even surpasses polystyrene. We have utilized 3C-SiC within an electrode device and activated the action potential of differentiated PC12 cells. This work details our initial efforts to modify the surfaces of these materials in order to improve cellular interaction and biocompatibility, and we examine our current and future work on improving our implantable BMI devices.

Le polytype cubique du carbure de silicium (3C-SiC) est un matériau très prometteur pour les applications MEMS. En plus de sa tenue mécanique et chimique, il peut être épitaxié sur des substrats Si de faible coût. De plus, l'hétéroépitaxie multiple, c’est-à-dire quand on empile plusieurs couches Si et 3C-SiC peut ouvrir des pistes pour de nouveaux dispositifs à base de 3C-SiC. Vue la complexité de développer de telles hétérostructures, nous avons procédé à l'amélioration de la qualité de chaque couche séparément. De plus, nous avons mené une étude approfondie sur la nature des défauts dans chaque couche. Après le développement de l'hétérostructure complète, nous avons procédé à la fabrication de microstructures à base de cet empilement. Nous présentons une méthode inédite pour former des membranes de 3C-SiC auto-supportées. Cette technique simplifie considérablement le procédé de fabrication de membranes tout en réduisant le temps de fabrication et le coût. En outre, elle aide à surmonter plusieurs problèmes techniques. / Due to its outstanding physico-chemical properties, the cubic polytype of silicon carbide (3C-SiC) gained significant interest in several fields. In particular, this material emerged as a potential candidate to replace Si in MEMS devices operating in harsh environment. The development of 3C-SiC/Si/3C-SiC heterostructures on top of Si substrate can pave the road towards original and novel MEMS devices profiting from the properties of the 3C-SiC. However, such epitaxial system suffers from wide range of defects characterizing each layer. Thus, we first tried to improve the quality of each layer in this heterostructure. This was achieved relying on two levers; (i) the optimization of the growth parameters of each layer and (ii) the understanding of the nature of defects present in each layer. These two key points combined together allowed an in-depth understanding of the limit of improvement of the overall quality of this heterostructure. After the development of the complete heterostructure, the fabrication of 3C-SiC microstructures was performed. Furthermore, we presented an unprecedented method to form free-standing 3C-SiC membranes in-situ during its growth stage. This novel technique is expected to markedly simplify the fabrication process of suspended membranes by reducing the fabrication time and cost.

Le carbure de silicium est pressenti comme un matériau prometteur dans plusieurs domaines de l’électroniquetels que la nano-électronique, l’électronique de puissance ou les capteurs travaillant en milieuxhostiles (hautes températures, milieux corrosifs, milieux biologiques) du fait de ses propriétés physicochimiquessupérieures à celles du silicium, notamment. Cependant, parmi les différentes méthodesd’élaboration par voie descendante ou ascendante permettant de fabriquer des nano-objets à 1D enSiC, aucune n’a pour l’instant permis d’obtenir du SiC d’excellente qualité cristalline.Le travail de cette thèse a porté sur la démonstration de l’élaboration de nanostructures 1D àbase de SiC, à savoir nanofils coeur-coquille Si-SiC, nanofils de SiC et nanotubes de SiC, par unprocédé original de carburation de nanofils de silicium, eux-mêmes élaborés par gravure plasma. Cettedémonstration a été possible grâce au contrôle de la pression de carburation, ce qui permet la maîtrisede l’exodiffusion des atomes de silicium à travers le carbure de silicium.À pression atmosphérique l’exodiffusion des atomes de silicium est restreinte ce qui permet d’élaborerdes nanofils coeur-coquille Si-SiC avec une coquille de SiC monocristalline et entièrement recouvrante.En se servant de la biocompatibilité du SiC et du bon contrôle électronique dans le silicium, ilest possible d’envisager l’utilisation de ces nanofils coeur-coquille Si-SiC pour des bio-nano-capteurs.En diminuant la pression au cours de la carburation, il est possible d’augmenter l’exodiffusion etainsi d’obtenir des nanotubes de SiC cubique de très bonne qualité cristalline avec des parois denses.Ces nanotubes de SiC sont largement modulables en termes de dimensions, et la faisabilité de leurouverture a été démontrée, permettant ainsi l’utilisation du fort rapport surface sur volume de telsnano-objets pour des capteurs électroniques notamment.Un premier pas a été franchi vers les applications des nanofils coeur-coquille Si-SiC et des nanotubesde SiC, puisque les mesures électriques réalisées sur des nano-transistors à effet de champ utilisant cesdeux types de nano-objets comme canal sont prometteurs. / Due to their superior physical and chemical properties —such as high breakdown field, high thermalconductivity and biocompatibility— compared to other semiconductors, silicon carbide is forseento be a promising materials for power electronics, bio-nano-sensors and nano-electronics in harsh environments.However, among the numerous top-down or bottom-up methods used to synthesise siliconcarbide 1D nano-objects, none has been able yet to produce SiC with a high cristalline quality.The aim of this project is to demonstrate the synthesis of silicon carbide- based 1D nanostructures—e.g. core-shell Si-SiC nanowires, SiC nanowires and SiC nanotubes— through an original processbased on the carburization of plasma-etched silicon nanowires. This demonstration is based on thecontrol of the pressure during the carburization process, which leads to the monitoring of the outdiffusionof silicon atoms through silicon carbide.Thus if the pressure is kept at the atmospheric pressure, the out-diffusion of silicon is limited andSi-SiC core-shell nanowires can be synthesized with a single-crystalline cubic SiC shell. Thanks to thebiocompatibility of the SiC shell and the good electronic transport into the Si core, bio-nano-sensorscan be considered.If the pressure is decreased during the carburization process, the outdiffusion of silicon atomsthrough SiC is enhanced, and leads to SiC nanotubes synthesis. SiC nanotubes sidewalls are dense,with an excellent crystalline quality. These original SiC nanotubes have a high surface to volume ratioand thus can be used for sensors or storage devices.The first step for direct applications has also been demonstrated since first results on electricalperformances of nano-field effect transistors, with these nano-objects as channel, are promising.