This thesis describes the incorporation within a semiconductor laser of a multiple quantum well InGaAsP/InP Electron Bragg Reflector (EBR). The EBR is intended to improve laser performance by inhibiting the escape of hot electrons from the laser active region by quantum mechanical Bragg reflection. To the author's knowledge, this investigation represents the first attempt to realize an EBR in the InGaAsP/InP material system. Computer models based on a transfer matrix method for the solution of Schrodinger's equation were written to obtain the EBR design. The transfer matrix method is described. Extensions to the transfer matrix method for optics are presented and are demonstrated to provide more than an order of magnitude improvement in computational efficiency for the calculation of the complex TE-mode propagation constant for planar graded-index waveguides with absorption or gain. The EBR designed for this work incorporates several new features. Deleterious band bending in the vicinity of the EBR is minimized by exploiting material strain to reduce the density of hole states in the EBR quantum wells. To maximize reflection bandwidth and relax fabrication tolerances, the EBR design used well widths that decreased with increasing depth into the p-type InP cladding. By the placement of the EBR adjacent to the separate confinement region, a return path was provided for electrons that scattered inelastically within the EBR. Moreover, the EBR structure was designed to support no bound electron states, so that the recombination of electrons with holes in the EBR would be minimal. To the author's knowledge, the EBR-equipped laser fabricated for this work represents the first attempt to exploit electron state exclusion. To explore the effectiveness of EBRs in the InGaAsP/InP material system, two nearly identical ridge waveguide lasers (one with an EBR, and one without) were designed, fabricated, and tested. The EBR-equipped lasers exhibited an anomalous threshold current temperature dependence which featured a "negative-To" regime (in which the threshold current decreases with increasing temperature), attaining a minimum in threshold current between T=150 K and T=200 K. These lasers had a threshold current temperature stability superior to that of standard lasers within a ~70 K window around the minimum threshold temperature. Experimental evidence suggests that the improved stability is not due to quantum mechanical Bragg reflection provided by the EBR, but is attributable to the temperature-dependent rate of hole escape from the EBR quantum wells into the separate confinement region. The proposed mechanism is described in detail and is supported by theoretical and experimental evidence. The results have implications for device design, because the mechanism by which the superior temperature stability is achieved does not rely on the electron coherence effects; the mathematical model suggests that the mechanism can be exploited to provide superior temperature stability in semiconductor lasers at 300 K or above. / Thesis / Master of Engineering (ME)