Thesis (Ph. D.)--University of Texas at Austin, 2007. / Vita. Includes bibliographical references.

Made available in DSpace on 2014-06-11T19:23:29Z (GMT). No. of bitstreams: 0 Previous issue date: 2009-07-06Bitstream added on 2014-06-13T19:50:18Z : No. of bitstreams: 1 pineiz_tf_me_bauru.pdf: 2151623 bytes, checksum: a3aa74574b72ca684cf6ef1a0dc34297 (MD5) / Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) / Dióxido de estanho (Sn'X IND. 2') é um semicondutor de bandgap largo com condutividade do tipo-n na forma não dopada, sendo aplicado em dispositivos diversos. Neste trabalho, filmes finos e géis secos de Sn'X IND. 2' dopados com os íons terras-raras 'Ce POT. 3+' e Eu POT 3+' foram sintetizados através do processo sol-gel. Por outro lado, filmes finos de GaAs têm também sido amplamente utilizados, devido a alta mobilidade eletrônica e transição direta. Neste trabalho, também foram produzidos filmes finos de GaAs através da técnica de evaporação resistiva. Serão mostrados e discutidos aqui resultados referentes a filmes finos de Sn'X IND. 2' dopado com íons terras-raras, filmes finos de GaAs e resultados referentes ao crescimento de filmes finos de GaAs sobre filmes finos de SnO2 dopados com terras-raras. Medidas de absorção óptica permitiram avaliar a qualidade óptica dos filmes e estimar a energia do bandgap. Dados de difração de raios-X mostraram estrutura do tipo rutilo e fase cassiterita dos filmes de Sn'X IND. 2' e também as direções principais dos filmes de GaAs. A microscopia eletrônica de varredura permitiu a espessura e a qualidade morfológica da heterojunção, tanto com relação à interface Sn'X IND. 2'/GaAs como da superfície. A investigação das propriedades elétricas em Sn'X IND. 2' mostra a alta resistividade do material devido ao caráter aceitador de íons terras-raras na matriz. Foi investigada também a captura de elétrons fotoexcitados por centros de 'Ce POT 3+' termicamente ativados. Do modelo proposto, foram obtidos parâmetros importantes, como a barreira de captura devido aos defeitos dominantes. Resistividade em função da temperatura na heterojunção Sn'X IND. 2'/GaAs mostrou a diminuição da resistência do conjunto. / Tin dioxide (Sn'X IND. 2') is a wide bandgap semiconductor material whith n-type conductivity the undoped form. This compound has been applied for several kinds of devices. In this work, thin films and xeogels of Sn'X IND. 2' doped with the rare-earth ions 'Ce POT. 3+' and Eu POT 3+' have been produced by the sol-gel process. On the other band, GaAs thin films have also been widely used, due to high electronic mobility and direct bandgap transition. In this work, GaAs thin films have been deposited by the resistive evaporation technique. It is shown and discussed here results concerning rare-earth doped Sn'X IND. 2' thin films. GaAs thin films and the growing of GaAs on the top of rare-earth doped Sn'X IND. 2'. Through the optical absorption spectra it has been possible to evaluate the films optical quality and to estimate the optical bandgap. X-ray diffraction data show the rutile like structure and cassiterie phase of Sn'X IND. 2' thin films and also show the main directions of GaAs films. Scanning electron microscopy allowed evaluating the thickness and morphological quality of the heterojunction, concerning the infarce as well as the surface. Investigation of electrical properties of Sn'X IND. 2' shows high resistivity of this material due to the acceptor-lide character of rare-earth ions in the matrix. It has also been investigated the trapping of photo-induced electrons by the thermally activated Ce centers. From a proposed model, it has been obtained some relevant parameters, such as the capture barrier due to the dominant defects. Data of resistivity as function of temperature for the Sn'X IND. 2'/GaAs heterojunction show the decrease of overall resistance.

Made available in DSpace on 2014-06-11T19:23:30Z (GMT). No. of bitstreams: 0 Previous issue date: 2008-08-19Bitstream added on 2014-06-13T20:30:16Z : No. of bitstreams: 1 correa_p_me_bauru.pdf: 1146240 bytes, checksum: a8f40673e6edfa69035f9c03a71c97da (MD5) / Neste trabalho é feita a deposição de filmes finos pela técnica de Evaporação Resistiva a partir de pós de Arseneto de Gálio (GaAs) e compostos de GaAs com Óxidos e Cloretos de Érbio (Er) ou Itérbio (Yb). Trata-se de um método relativamente simples de deposição, no qual os compostos são evaporados conjuntamente. O objetivo é observar a eficiência desse método para a produção desses filmes finos, a partir de compostos que possuam diferentes características, tais como consideráveis diferenças de temperaturas de evaporação. Depositamos filmes em diferentes condições e estequiometrias e analisamos as propriedades estruturais pela técnica de difração de raios-X. A composição qualitativa das amostras foi obtida por energia dispersiva de raios-X. As propriedades ópticas foram analisadas através de medidas de transmitância óptica dentro da faixa do visível ao infravermelho médio. Realizamos também a caracterização elétrica através de medidas de resistência em função da temperatura em filmes de GaAs e composto de GaAs com 'ErCl IND 3'. Apresentamos no apêndice uma proposta de investigação das propriedades de transporte elétrico de uma dessas amostras, envolvendo um modelo para cálculo da condutividade. De imediato, a contribuição deste trabalho é para a compreensão dos fenômenos físicos que acontecem durante o processo de crescimento, e a investigação parâmetros de deposição que viabilizem o emprego da técnica para os diferentes materiais evaporados. / In this work, thin film deposition is carried out, using the resistive evaporation technique, from powders of gallium arsenide (GaAs) and erbium (Er) or ytterbium (Yb) oxides and chlorides. It is a relatively simple deposition technique, where the compounds are simultaneously evaporated. The goal is to observe the efficiency of this growth method for the production of thin films, from compounds with distinct characteristics, such as high difference between evaporation temperatures. Films have been deposited under different conditions and stoichiometry, and their structural properties were analyzed by X-ray diffraction technique. Sample composition was obtained by X-ray dispersive energy. Optical properties were analyzed through optical transmittance from visible to medium infrared. Electrical characterization was also carried out, using measurements of resistance as function of temperature for GaAs and GaAs with 'ErCl IND 3' compounds. An appendix is also presented, containing a proposal of electrical transport investigation, involving conductivity calculation. The contribution of this work is towards the understanding of physical phenomena that takes place during the growth process, and the investigation of deposition parameters with make reliable the utilization of this technique for the different evaporated materials.

Orientador: Luis Vicente de Andrade Scalvi / Banca: Valmor Roberto Mastelaro / Banca: Paulo Noronha Lisboa Filho / O Programa de Pós-Graduação em Ciência e Tecnologia de Materiais, PosMat, tem caráter institucional e integra as atividades de pesquisa em materiais de diversos campi da Unesp / Resumo: Dióxido de estanho (Sn'X IND. 2') é um semicondutor de bandgap largo com condutividade do tipo-n na forma não dopada, sendo aplicado em dispositivos diversos. Neste trabalho, filmes finos e géis secos de Sn'X IND. 2' dopados com os íons terras-raras 'Ce POT. 3+' e "Eu POT 3+' foram sintetizados através do processo sol-gel. Por outro lado, filmes finos de GaAs têm também sido amplamente utilizados, devido a alta mobilidade eletrônica e transição direta. Neste trabalho, também foram produzidos filmes finos de GaAs através da técnica de evaporação resistiva. Serão mostrados e discutidos aqui resultados referentes a filmes finos de Sn'X IND. 2' dopado com íons terras-raras, filmes finos de GaAs e resultados referentes ao crescimento de filmes finos de GaAs sobre filmes finos de SnO2 dopados com terras-raras. Medidas de absorção óptica permitiram avaliar a qualidade óptica dos filmes e estimar a energia do bandgap. Dados de difração de raios-X mostraram estrutura do tipo rutilo e fase cassiterita dos filmes de Sn'X IND. 2' e também as direções principais dos filmes de GaAs. A microscopia eletrônica de varredura permitiu a espessura e a qualidade morfológica da heterojunção, tanto com relação à interface Sn'X IND. 2'/GaAs como da superfície. A investigação das propriedades elétricas em Sn'X IND. 2' mostra a alta resistividade do material devido ao caráter aceitador de íons terras-raras na matriz. Foi investigada também a captura de elétrons fotoexcitados por centros de 'Ce POT 3+' termicamente ativados. Do modelo proposto, foram obtidos parâmetros importantes, como a barreira de captura devido aos defeitos dominantes. Resistividade em função da temperatura na heterojunção Sn'X IND. 2'/GaAs mostrou a diminuição da resistência do conjunto. / Abstract: Tin dioxide (Sn'X IND. 2') is a wide bandgap semiconductor material whith n-type conductivity the undoped form. This compound has been applied for several kinds of devices. In this work, thin films and xeogels of Sn'X IND. 2' doped with the rare-earth ions 'Ce POT. 3+' and "Eu POT 3+' have been produced by the sol-gel process. On the other band, GaAs thin films have also been widely used, due to high electronic mobility and direct bandgap transition. In this work, GaAs thin films have been deposited by the resistive evaporation technique. It is shown and discussed here results concerning rare-earth doped Sn'X IND. 2' thin films. GaAs thin films and the growing of GaAs on the top of rare-earth doped Sn'X IND. 2'. Through the optical absorption spectra it has been possible to evaluate the films optical quality and to estimate the optical bandgap. X-ray diffraction data show the rutile like structure and cassiterie phase of Sn'X IND. 2' thin films and also show the main directions of GaAs films. Scanning electron microscopy allowed evaluating the thickness and morphological quality of the heterojunction, concerning the infarce as well as the surface. Investigation of electrical properties of Sn'X IND. 2' shows high resistivity of this material due to the acceptor-lide character of rare-earth ions in the matrix. It has also been investigated the trapping of photo-induced electrons by the thermally activated Ce centers. From a proposed model, it has been obtained some relevant parameters, such as the capture barrier due to the dominant defects. Data of resistivity as function of temperature for the Sn'X IND. 2'/GaAs heterojunction show the decrease of overall resistance. / Mestre

Submitted by DIEGO HENRIQUE DE OLIVEIRA MACHADO null (diegomachado@fc.unesp.br) on 2016-03-05T16:15:24Z No. of bitstreams: 1 Dissertação Diego versão Final.pdf: 4313685 bytes, checksum: 2ca802e4be1ac3d595efb5b0ea06251e (MD5) / Approved for entry into archive by Ana Paula Grisoto (grisotoana@reitoria.unesp.br) on 2016-03-07T13:58:23Z (GMT) No. of bitstreams: 1 machado_dho_me_bauru.pdf: 4313685 bytes, checksum: 2ca802e4be1ac3d595efb5b0ea06251e (MD5) / Made available in DSpace on 2016-03-07T13:58:23Z (GMT). No. of bitstreams: 1 machado_dho_me_bauru.pdf: 4313685 bytes, checksum: 2ca802e4be1ac3d595efb5b0ea06251e (MD5) Previous issue date: 2016-03-03 / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) / Este trabalho apresenta o desenvolvimento e algumas conclusões do estudo da heterojunção de filmes finos de SnO2 e GaAs. Os filmes de SnO2, dopados com Ce3+, foram depositados a partir do método sol-gel usando as técnicas de dip e spin coating; os filmes de GaAs foram depositados por evaporação resistiva e por sputtering. As heterojunçõesforam constituídas de filmes de SnO2 sobre filmes de GaAs, e filmes de GaAs sobre filmes de SnO2. Foram investigadas as propriedades ópticas, estruturais, morfológicas e elétricas de filmes finos constituintes das heterojunções e também a influência do dopante Ce3+. Entre os experimentos realizados estão: transmitância óptica, difração de raios X, microscopia eletrônica de varredura (MEV), microscopia óptica, microscopia de força atômica (AFM), fotoluminescência e medidas elétricas na presença de excitações com diferentes fontes de luz monocromáticas (quarto harmônico do laser Nd:YAG (266nm), laser He-Ne (628nm), LED InGaN (450nm)). Entre as principais conclusões, verificou-se: 1) em algumas situações, condutividade independente da temperatura, sugerindo a participação de um gás de elétrons bidimensional (2DEG) na interface SnO2/GaAs; 2) o tamanho dos cristalitos, calculado a partir das análises de difração de raios X, fornece valores da ordem de 10nm tanto para filmes de SnO2 como para filmes de GaAs; 3) a energia de bandgap, avaliada com base em dados de medidas de absorbância, fornece um valor máximo de 3,6 eV para filmes de dióxido de estanho e 1,6eV para filmes de GaAs; 4) MEV e microscopia óptica de para filmes de GaAs (depositado por evaporação resistiva e sputtering) apresentam sua superfície heterogênea, com partículas de variados tamanhos. Além disso, a aderência de filmes de SnO2 sobre filmes de GaAs está relacionada com a técnica utilizada para depositar os filmes da camada de base, o melhor resultado foi obtido quando a camada é a de GaAs depositado por evaporação resistiva. Isto foi verificado utilizando microscopia de força atômica, onde ficou evidente que filmes de GaAs depositado por evaporação resistiva possuem grandes aglomerados enquanto filmes depositados por sputtering possuem uma superfície com material distribuído de maneira uniforme. Também foram realizadas medidas de fotoluminescência com excitação de um laser de Kr+ sintonizado na linha de 350nm e também utilizando um laser de He-Cd na linha de 325nm, tanto em filmes como em pastilhas de SnO2 dopado com 1at% Ce3+e também em filmes da heterojunção SnO2:Ce3+/GaAs, sendo observadas pequenas bandas características do Ce3+. / The aim of this work is to present the development and the main conclusions, related the investigation of thin film SnO2/GaAs heterojunction. Ce3+- doped SnO2 thin films were deposited by the sol-gel-dip and -spin coating techniques, whereas GaAs films were deposited by resistive evaporation and sputtering. Heterojunctions were deposited by SnO2 layer growth on top of GaAs film, and in the opposite order: GaAs on top of SnO2. Optical, structural, morphologic and electrical properties of heterojunction films were investigated, as well as the influence of Ce-doping in these measurements. Experiments carried out include: optical transmission, X-ray diffraction, scanning electron microscopy (SEM), optical microscopy, atomic force microscopy (AFM), photoluminescence and electrical measurements under optical excitation. In this last case the excitation sources are monochromatic light from the fourth harmonic of a Nd:YAG laser (266nm), a He-Ne laser (628nm) and a InGaN LED (450nm). Among the main conclusions, it was verified that: 1) in some situations, a temperature independent electrical resistivity was observed and attributed to the possible formation of a two-dimensional electron gas (2DEG) at SnO2/GaAs interface; 2) crystallite size was calculated from X-ray diffraction data, being about 10 nm either for SnO2 films as GaAs films; 3) bandgap energy, evaluated from absorbance data yield a maximum value of about 3.6eV for tin dioxide and 1.6eV for GaAs films; 4) SEM images, obtained for GaAs thin films deposited by resistive evaporation and for the heterojunction SnO2/GaAs, and optical microscopy, for sputtering deposited GaAs films and heterojunction samples, show that GaAs films present an heterogeneous surface, with particles of several distinct sizes. Besides, the adherence of SnO2 films on the GaAs layer is related to the used technique for depositing the base layer, being better in the case of resistive evaporation deposited GaAs. This was verified by atomic force microscopy, where it was evidenced that resistive evaporation deposited GaAs films present large agglomerates whereas sputtering deposited films present a surface with more uniformly distributed material. Photoluminescence data was also obtained with excitation by a Kr+ laser tuned at 350nm as well as a He-Cd laser at 325nm, either in Ce 1at% doped SnO2 pellets as SnO2:Ce3+/GaAs heterojunction, being observed small bands, characteristic of Ce3+.

Orientador: Luiz Vicente de Andrade Scalvi / Banca: Valmor Roberto Mastelaro / Banca: Elisabete Aparecida Andrello Rubo / O Programa de Pós-Graduação em Ciência e Tecnologia de Materiais, PosMat, tem caráter institucional e integra as atividades de pesquisa em materiais de diversos campi da Unesp / Resumo: Neste trabalho é feita a deposição de filmes finos pela técnica de Evaporação Resistiva a partir de pós de Arseneto de Gálio (GaAs) e compostos de GaAs com Óxidos e Cloretos de Érbio (Er) ou Itérbio (Yb). Trata-se de um método relativamente simples de deposição, no qual os compostos são evaporados conjuntamente. O objetivo é observar a eficiência desse método para a produção desses filmes finos, a partir de compostos que possuam diferentes características, tais como consideráveis diferenças de temperaturas de evaporação. Depositamos filmes em diferentes condições e estequiometrias e analisamos as propriedades estruturais pela técnica de difração de raios-X. A composição qualitativa das amostras foi obtida por energia dispersiva de raios-X. As propriedades ópticas foram analisadas através de medidas de transmitância óptica dentro da faixa do visível ao infravermelho médio. Realizamos também a caracterização elétrica através de medidas de resistência em função da temperatura em filmes de GaAs e composto de GaAs com 'ErCl IND 3'. Apresentamos no apêndice uma proposta de investigação das propriedades de transporte elétrico de uma dessas amostras, envolvendo um modelo para cálculo da condutividade. De imediato, a contribuição deste trabalho é para a compreensão dos fenômenos físicos que acontecem durante o processo de crescimento, e a investigação parâmetros de deposição que viabilizem o emprego da técnica para os diferentes materiais evaporados. / Abstract: In this work, thin film deposition is carried out, using the resistive evaporation technique, from powders of gallium arsenide (GaAs) and erbium (Er) or ytterbium (Yb) oxides and chlorides. It is a relatively simple deposition technique, where the compounds are simultaneously evaporated. The goal is to observe the efficiency of this growth method for the production of thin films, from compounds with distinct characteristics, such as high difference between evaporation temperatures. Films have been deposited under different conditions and stoichiometry, and their structural properties were analyzed by X-ray diffraction technique. Sample composition was obtained by X-ray dispersive energy. Optical properties were analyzed through optical transmittance from visible to medium infrared. Electrical characterization was also carried out, using measurements of resistance as function of temperature for GaAs and GaAs with 'ErCl IND 3' compounds. An appendix is also presented, containing a proposal of electrical transport investigation, involving conductivity calculation. The contribution of this work is towards the understanding of physical phenomena that takes place during the growth process, and the investigation of deposition parameters with make reliable the utilization of this technique for the different evaporated materials. / Mestre

Orientador: Jacobus Willibrordus Swart / Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Eletrica e de Computação / Made available in DSpace on 2018-08-05T07:19:34Z (GMT). No. of bitstreams: 1 Goes_MarcosAugustode_M.pdf: 31444750 bytes, checksum: e7c5cce48b9c9ec73f1804fee26b6062 (MD5) Previous issue date: 2005 / Resumo: Esta dissertação de mestrado descreve o estudo, projeto e implementação de um receptor optoeletrônico integrado (OEIC) utilizando a tecnologia de transistores bipolares de heterojunção (HBT), fabricados a partir do material semicondutor arseneto de gálio. A grande vantagem deste transistor é o seu alto ganho e baixa resistência de base, o qual possibilita operações na faixa de gigahertz. A integração do estágio de fotodetecção, feita por um fotodiodo do tipo PIN, com o circuito de amplificação em um mesmo circuito integrado é possível, pois o fotodetector é construído com as camadas de base, coletor e subcoletor do transistor HBT. Com isso, as resistências, capacitâncias e indutâncias parasitas presentes na conexão entre estes dois estágios são minimizadas. Isto permite aos receptores monolíticos trabalharem em freqüências mais altas em relação aos receptores híbridos. O circuito fabricado opera com fontes de luz no comprimento de onda de 850 nm e pode ser utilizado em redes locais de curta distância (LAN) / Abstract: This master degree dissertation describes the study, project and implementation of an optoelectronic integrated circuit (OEIC) using the heterojunction bipolar transistors (HBT) technology over a gallium arsenide substrate. The major advantage of this transistor is its high gain and low base resistance, allowing operation at frequencies in the range of gigahertz. The integration of the photodetection stage, performed by a PIN photodetector, with the amplifier circuit in a single chip is possible because the photodetector is built from the base, collector and subcollector layers of the HBT transistor. Thus, the parasitic resistances, capacitances and inductances between the connection of these two stages are minimized. In this way, monolithic receivers can operate at higher frequencies than hybrid receivers. The fabricated circuit is intended to work with 850 nm light sources and can be used in local area networks (LAN) / Mestrado / Eletrônica, Microeletrônica e Optoeletrônica / Mestre em Engenharia Elétrica

This study focuses on the development of InAs/GaInSb strained-layer superlattice structures by metal organic chemical vapour deposition (MOCVD), and deals with two aspects of the development of InAs/GaInSb SLS’s by MOCVD viz. the deposition of nano-scale (~100 Å) GaInSb layers, and the electrical characterization of unstrained InAs. The first part of this work aims to study the MOCVD growth of GaInSb layers in terms of deposition rate and indium incorporation on the nano-scale. This task is approached by first optimizing the growth of relatively thick (~2 μm) epitaxial films, and then assuming similar growth parameters during nano-scale deposition. The GaInSb layers were grown as part of GaInSb/GaSb quantum well (QW) structures. By using this approach, the GaInSb QW’s (~100 Å) could be characterized with the use of photoluminescence spectroscopy, which, when used in conjunction with transmission electron microscopy and/or X-ray diffractomery, proves useful in the analysis of such small scale deposition. It is shown that the growth rate of GaInSb on the nano-scale approaches the nominal growth rates determined from thick (~2 μm) GaInSb calibration layers. The In incorporation efficiency in nano-layers, however, was markedly lower than what was predicted by the GaInSb calibration layers. This reduction in indium incorporation could be the result of the effects of strain on In incorporation. The choice of substrate orientation for QW deposition was also studied. QW structures were grown simultaneously on both (100) and 2°off (100) GaSb(Te) substrates, and it is shown that growth on non-vicinal substrates is more conducive to the deposition of high quality QW structures. The second part of this study focuses on the electrical characterization of unstrained InAs. It is long known that conventional Hall measurements cannot be used to accurately characterize InAs epitaxial layers, as a result of parallel conduction resulting from surface and/or interface effects. This study looks at extracting the surface and bulk electrical properties of n-type InAs thin films directly from variable magnetic field Hall measurements. For p-type InAs, the situation is complicated by the relatively large electron to hole mobility ratio of InAs which tends to conceal the p-type nature of InAs thin films from Hall measurements. Here, this effect is illustrated by way of theoretical simulation of Hall data.

The importance of infrared (IR) technology (for detection in the 3-5 μm and 8-14 μm atmospheric windows) has spread from military applications to civilian applications since World War II. The commercial IR detector market in these wavelength ranges is dominated by mercury cadmium telluride (MCT) alloys. The use of these alloys has, however, been faced with technological difficulties. One of the materials that have been tipped to be suitable to replace MCT is InAs/InxGa1-xSb strained layer superlattices (SLS’s). Atmospheric pressure metal-organic vapour phase epitaxy (MOVPE) has been used to grow InAs/GaSb strained layer superlattices (SLS’s) at 510 °C in this study. This is a starting point towards the development of MOVPE InAs/InxGa1-xSb SLS’s using the same system. Before the SLS’s could be attempted, the growth parameters for GaSb were optimised. Growth parameters for InAs were taken from reports on previous studies conducted using the same reactor. Initially, trimethylgallium, a source that has been used extensively in the same growth system for the growth of GaSb and InxGa1-xSb was intended to be used for gallium species. The high growth rates yielded by this source were too large for the growth of SLS structures, however. Thus, triethylgallium (rarely used for atmospheric pressure MOVPE) was utilized. GaSb layers (between 1 and 2 μm thick) were grown at two different temperatures (550 °C and 510 °C) with a varying V/III ratio. A V/III ratio of 1.5 was found to be optimal at 550 °C. However, the low incorporation efficiency of indium into GaSb at this temperature was inadequate to obtain InxGa1-xSb with an indium mole fraction (x) of around 0.3, which had previously been reported to be optimal for the performance of InAs/InxGa1-xSb SLS’s, due to the maximum splitting of the valence mini bands for this composition. The growth temperature was thus lowered to 510 °C. This resulted in an increase in the optimum V/III ratio to 1.75 for GaSb and yielded much higher incorporation efficiencies of indium in InxGa1-xSb. However, this lower growth temperature also produced poorer surface morphologies for both the binary and ternary layers, due to the reduced surface diffusion of the adsorbed species. An interface control study during the growth of InAs/GaSb SLS’s was subsequently conducted, by investigating the influence of different gas switching sequences on the interface type and quality. It was noted that the growth of SLS’s without any growth interruptions at the interfaces leads to tensile strained SLS’s (GaAs-like interfaces) with a rather large lattice mismatch. A 5 second flow of TMSb over the InAs surface and a flow of H2 over GaSb surface yielded compressively strained SLS’s. Flowing TMIn for 1 second and following by a flow of TMSb for 4 seconds over the GaSb surface, while flowing H2 for 5 seconds over the InAs surface, resulted in SLS’s with GaAs-like interfacial layers and a reduced lattice mismatch. Temperature gradients across the surface of the susceptor led to SLS’s with different structural quality. High resolution x-ray diffraction (HRXRD) was used to determine the thicknesses as well as the type of interfacial layers. The physical parameters of the SLS’s obtained from simulating the HRXRD spectra were comparable to the parameters obtained from cross sectional transmission electron microscopy (XTEM) images. The thicknesses of the layers and the interface type played a major role in determining the cut-off wavelength of the SLS’s.

No description available.