Global ETD Search

11	Charge trapping effects on mobility and threshold voltage instability in high-k gate stacks Sim, Jang Hoan 28 August 2008 (has links) Not available / text Dielectrics Hafnium oxide Gate array circuits
12	High-permittivity dielectrics and high mobility semiconductors for future scaled technology: Hf-based High-K gate dielectrics and interface engineering for HfO₂/Ge CMOS device Lu, Nan 28 August 2008 (has links) Not available / text Hafnium oxide Dielectrics Gate array circuits
13	Interfacial properties of thin film hetero-structure copper-oxides of hafnium-silicon / Park, Hyun Jung. January 2002 (has links) (PDF) Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
14	Technology development and process integration of alternative gate dielectric material : hafnium oxide / Lee, Byoung Hun, January 2000 (has links) Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 123-134). Available also in a digital version from Dissertation Abstracts.
15	Characterization and reliability of HFO₂ and hfsion gate dielectrics with tin metal gate Krishnan, Siddarth A., January 1900 (has links) (PDF) Thesis (Ph. D.)--University of Texas at Austin, 2005. / Vita. Includes bibliographical references.
16	Charge trapping effects on mobility and threshold voltage instability in high-k gate stacks Sim, Jang Hoan. January 1900 (has links) (PDF) Thesis (Ph. D.)--University of Texas at Austin, 2005. / Vita. Includes bibliographical references.
17	High-permittivity dielectrics and high mobility semiconductors for future scaled technology Hf-based High-K gate dielectrics and interface engineering for HfO₂/Ge CMOS device / Lu, Nan, January 1900 (has links) (PDF) Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
18	Fabrication and characterization of hafnium oxide films prepared by direct sputtering / Zhan, Nian. January 2003 (has links) Thesis (M. Phil.)--Hong Kong University of Science and Technology, 2003. / Includes bibliographical references. Also available in electronic version. Access restricted to campus users.
19	Interfacial properties of thin film hetero-structure: copper-oxides of hafnium-silicon Park, Hyun Jung 28 August 2008 (has links) Not available / text Thin films--Electric properties Hafnium oxide Silicon oxide films
20	Hafnium dioxide gate dielectrics, metal gate electrodes, and phenomena occurring at their interfaces Schaeffer, James Kenyon 28 August 2008 (has links) Not available / text Hafnium oxide Dielectrics Electrodes

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