Orientador: Mônica Alonso Cotta / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin / Made available in DSpace on 2018-09-02T10:59:50Z (GMT). No. of bitstreams: 1 Nica_MarianaZavarize_M.pdf: 75724631 bytes, checksum: 1480ea9eb35b1740d4b908e32d13c9c4 (MD5) Previous issue date: 2017 / Resumo: Neste trabalho, estudamos o crescimento de nanofios planares de InP pelo mecanismo Vapor-Líquido-Sólido (VLS), com o objetivo de entender a dinâmica da nanopartícula metálica catalisadora durante o processo. Para isso utilizamos substratos de GaAs (111)A e o sistema de Epitaxia de Feixe Químico (CBE). O óxido nativo não foi totalmente removido termicamente antes do crescimento, com o objetivo de manter o nanofio isolado eletricamente do substrato. Como um dos objetivos do trabalho, estudamos a possibilidade de controle da direção de crescimento do nanofio planar através de diferentes tratamentos de superfície, e de modo independente da cristalografia do substrato utilizado. As amostras processadas e/ou crescidas foram caracterizadas por técnicas de microscopia eletrônica (varredura e transmissão) e microscopia de força atômica. Investigamos inicialmente como a camada de óxido influencia as direções de crescimento dos nanofios planares no substrato não tratado. Posteriormente, processamos padrões de linhas com rugosidade ligeiramente diferente da mostrada pelo substrato, utilizando técnicas como Litografia por Feixe de Elétrons (EBL), Corrosão por Feixe de Íons Focalizados (FIB) e Ataque por Íons Reativos (RIE). Os padrões gravados eram compostos por linhas perpendiculares com várias micra de comprimento e larguras de dezenas de nm. Observamos que existe uma relação direta do diâmetro do nanofio com a orientação que este assume ao chegar à região onde se encontra a linha (se segue alinhado à linha ou se a ignora; ou se muda sua orientação). Nossos resultados podem ser explicados pelas diferentes energias de superfície presentes no problema, que afetam a dinâmica da nanopartícula catalisadora. Nosso trabalho também mostra que é possível obter maior controle da orientação espacial do nanofio planar crescido, controlando o processamento da superfície e o diâmetro da nanopartícula / Abstract: In this work, we studied the growth of InP planar nanowires by the vapor-liquid-solid (VLS) mechanism, in order to understand the metallic catalyst nanoparticle dynamics during this process. In our studies, we used GaAs (111)A substrates and the Chemical Beam Epitaxy (CBE) system. The native oxide layer was not completely thermally desorbed, in order to keep the nanowire electrically isolated from the substrate. As one of the goals of this work, we study the possibility to control nanowire growth direction via different surface treatments, independently of the substrate crystallography. Our processed and/or grown samples were characterized by electron (scanning and transmission) and atomic force microscopy. We first investigated how the oxide layer influences the growth directions of planar nanowires on unprocessed substrates. Subsequently, patterns of lines with roughness slightly different from those shown by the substrate were patterned using techniques such as Electron-beam Lithography (EBL), Focused Ion-beam Corrosion (FIB) and Reactive Ion Etching (RIE). These patterns were composed of perpendicular lines with several micra in length and tens of nanometers wide. We observed that there is a direct relation between the nanowire diameter and the orientation that the nanowire assumes when it reaches the region where the line is located (if the nanowire aligns with the line or ignores it, or if its orientation changes). Our results can be explained by the different surface energies present in the problem, which affect the dynamics of the catalytic nanoparticle. Our work also shows that it is possible to obtain better control of the spatial orientation of the grown planar nanowire, by controlling the surface processing and the nanoparticle diameter / Mestrado / Física / Mestra em Física / 132655/2015-2 / CNPQ

Computer processor chips of the last generation are based on silicon, modified to achieve maximum charge mobility to enable fast switching speeds at low power. III-V semiconductors have charge mobilities that are much higher than that of silicon making them suitable candidates for boosting the performance of new electronic devices. However, III-V semiconductors oxidize rapidly in air after oxide etching and the poor quality of the resulting oxide limits device performance. Our goal is to design a liquid-phase process flow to etch the oxide and passivate the surface of III-V semiconductors and to understand the mechanism of layer formation.Self-assembled monolayers of 1-eicosanethiol (ET) dissolved in ethanol, IPA, chloroform, and toluene were deposited on clean InSb(100) surfaces. The InSb passivated surfaces were characterized after 0 to 60 min of exposure to air. Ellipsometry measurements showed a starting overlayer thickness (due to ET, oxides, or both) of about 20 Å in chloroform and from 32 to 35 Å in alcohols and toluene. Surface composition analysis of InSb with X-ray photoelectron spectroscopy after passivation with 0.1 mM ET in ethanol confirmed the presence of ET and showed that oxygen in the Auger region is below detection limits up to 3 min after the passivation. Our results show that a thiol layer on top of a non-oxidized or low-oxide semiconductor surface slows oxygen diffusion in comparison to a surface with no thiol present, making this a promising passivation method of III-V semiconductors.

This Master’s dissertation focuses on exploring optical nonlinearities in IIIV semiconductors. This work covers a range of III-V materials and a few devices. To begin with, optical characterization of Aluminium Gallium Arsenide (AlGaAs) waveguides with enhanced nonlinear optical interactions was carried out. We have experimentally demonstrated wide conversion ranges andhigh conversion efficiencies for four-wavemixing inAlGaAswaveguides with three different geometries. In addition to that, both linear and nonlinear losses in each of these geometries were explored. AlGaAs represents only one compound of the large group of III-V semiconductors. To explore the potentials of other semiconductors compounds of this group for nonlinear optics, it is imperative to have information about refractive indices of different III-V compounds. This refractive index information is only available for some binary compounds in isolated spectral windows. In this thesis, we developed a model capable of predicting the values of the refractive indices of binary, ternary and quaternary III-V semiconductor compounds from the values of their band-gap energies. We compared the value predicted by our proposed model with existing experimental data and it was found not only is the predicted values in good agreement with the known values, but also has a lower error margin when compared to previously reported models. Finally, in quest for more suitable material platform for nonlinear photonic integration at different wavelength ranges, a detailed analysis of other potential III-V compounds not previously explored for photonic integration is presented.

With looming energy crisis across the globe, achieving high efficiency and low cost solar cells have long been the key objective for photovoltaic researchers. III-V compound semiconductor based multijunction solar cells have been the dominant choice for space power due to their superior performance compared to any other existing solar cell technologies. In spite of unmatched performance of III-V solar cells, Si cells have dominated the terrestrial market due to their lower cost. Most of the current III-V solar cells are grown on Ge or GaAs substrates, which are not only smaller in diameter, but are also more expensive than Si substrate. Direct integration of high efficiency III-V solar cells on larger diameter, cheaper and readily available Si substrate is highly desirable for increased density, low-cost and lightweight photovoltaics. However, the polar-on-nonpolar epitaxy, the thermal mismatch and the 4% lattice mismatch makes the direct growth of GaAs on Si challenging, rendering the metamorphic cell sensitive to dislocations. The focus of this work is to investigate and correlate the impact of threading dislocation density on the performance of lattice-mismatched single-junction (1J) GaAs and dual-junction (2J) InGaP/GaAs solar cells on Si substrate. Utilizing our calibrated dislocation-assisted modeling process, we present the design methodology to optimize the structure of 2J InGaP/GaAs solar cell on Si substrate. Our modeling results suggest an optimistic future for integrating III-V solar cell technology on Si substrate and will be useful for future design and prediction of metamorphic III-V solar cell performance on Si substrate. / Master of Science

Os compostos semicondutores ternários, dentre eles o Ga1-xInxSb, têm sido objeto de interesse de pesquisadores e da indústria microeletrônica devido à possibilidade de ajuste da constante de rede, assim como a correspondente modificação da banda proibida de energia e do intervalo de emissão e absorção óptica, com a variação da fração molar de x. A flexibilidade destas propriedades estruturais torna este composto apropriado como substratos para epitaxias de outros compostos ternários e quaternários, na formação de mono e heterojunções. A maneira mais econômica para obtenção de substratos de materiais semicondutores é através do crescimento de cristais a partir da fase líquida. Porém, os parâmetros que regem a obtenção de lingotes de Ga1-xInxSb com qualidade comercial, a partir da fase líquida, ainda não estão bem definidos. O índio tende a segregar para o líquido, pois seu coeficiente de segregação é menor que a unidade (k < 1), resultando num perfil composicional variado ao longo do lingote. Como os binários GaSb e InSb apresentam configurações de defeitos intrínsecos que originam condutividades de tipos opostos, tipo p e tipo n, respectivamente, a mudança na composição da liga, durante o crescimento, provavelmente resulta na modificação da concentração de cada um destes defeitos. A dopagem com telúrio consiste numa alternativa para minimizar a segregação do índio e diminuir a densidade dos defeitos pontuais, melhorando a qualidade estrutural de cristais de Ga1-xInxSb obtidos através do método Bridgman convencional. Desta forma foram crescidos cristais ternários Ga1-xInxSb, com e sem agitação do líquido durante a síntese, com fração molar inicial de índio de 10% e 20%, alguns deles dopados com 1020 átomos/cm3 de telúrio, pelo método Bridgman vertical. A caracterização estrutural em termos de formação de defeitos lineares, interfaciais e volumétricos foi realizada através de imagens obtidas por microscopia óptica, eletrônica de varredura e de transmissão. A homogeneidade composicional e distribuição de fases foi avaliada através de medidas de espectroscopia por dispersão de energia. Medidas de resistividade e efeito Hall foram utilizadas para a caracterização elétrica, enquanto que a transmitância óptica e a banda proibida de energia foram avaliadas por espectrometria FTIR. Os padrões de difração obtidos através da microscopia eletrônica de transmissão foram utilizados para avaliar a cristalinidade das amostras e determinar o parâmetro de rede. Os resultados obtidos indicam que o telúrio atua de forma compensatória, minimizando a segregação de índio e contribuindo para a homogeneidade composicional e redução de defeitos, principalmente de discordâncias. Além disso, altera a condutividade do Ga1-xInxSb para tipo n, mesmo em frações molares de In inferiores a x = 0,5, diminuindo o número de cargas positivas na rede atribuídas aos defeitos tipo GaSb e VGaGaSb e, desta forma, aumenta a concentração de portadores de carga e reduz a resistividade. Na condição de alta dopagem, reduz a transmitância óptica no infravermelho e aumenta a banda proibida de energia através do efeito Burstein-Moss. A avaliação de cristais de Ga1-xInxSb, dopados e não dopados, crescidos pelo método Bridgman convencional contribuiu para o entendimento do comportamento de dopantes em compostos semicondutores ternários. / Ternary compound semiconductors, including Ga1-xInxSb, have been subject of interest of researchers and microelectronics industry because of the possibility of adjusting the lattice constant, as well as the corresponding modification in the band gap energy, and in the optical absorption and emission range, by varying the mole fraction x. The flexibility of their structural properties makes this compound suitable as substrates for epitaxy of other ternary and quaternary compounds, in the formation of mono- and heterojunctions. The most economical way to obtain semiconductor substrates is by crystal growth from the liquid phase. However, the parameters governing the outcoming of Ga1-xInxSb ingots with commercial quality, from liquid phase, are not well defined. Indium tends to segregate to the liquid, since its segregation coefficient is less than the unity (k < 1), resulting in a varied compositional profile along the ingot. As the binary GaSb and InSb have intrinsic defects configurations that originate opposite conductivities, type p and type n, respectively, the change in the alloy composition, while growing, probably results in a modification of the concentration on each of these defects. Doping with tellurium is an alternative to minimize the indium segregation and decrease the density of point defects, therefore improving the structural quality of Ga1-xInxSb crystals obtained through the conventional Bridgman method. Thus, ternary Ga1-xInxSb crystals were grown by vertical Bridgman method with and without stirring the melt during the synthesis, with 10% and 20% initial molar fraction of indium and some of them were tellurium-doped at 1020 atoms/cm3. The structural characterization regarding linear, interfacial, and volumetric defects formation was performed by using images obtained through optical, scanning and transmission electron microscopy. The compositional homogeneity and phase distribution was assessed by energy-dispersive spectroscopy measurements. Resistivity and Hall Effect measurements were used for the electrical characterization, while the optical transmittance and the band gap energy were examined by FTIR spectroscopy. Diffraction patterns obtained by transmission electron microscopy were used to evaluate the crystallinity of the samples and determine the lattice parameter. The results indicate that tellurium acts in a compensatory way, minimizing indium segregation and contributing to the compositional homogeneity and defect reduction, especially in dislocations. In addition, it changes the conductivity of Ga1-xInxSb to n-type, even in mole fraction of In lower than x = 0.5, reducing the number of positive charges on the network assigned to GaSb and VGaGaSb defects, thus increasing the concentration of charge carriers and reducing the resistivity. In high doping condition, it reduces the optical transmittance in the infrared region and increases the energy of the band gap by the Burstein-Moss Effect. The evaluation of Ga1-xInxSb crystals, doped and undoped, grown by the conventional Bridgman method contributed to the understanding of dopants behavior in ternary compound semiconductors.

No description available.

No description available.

Os compostos semicondutores ternários, dentre eles o Ga1-xInxSb, têm sido objeto de interesse de pesquisadores e da indústria microeletrônica devido à possibilidade de ajuste da constante de rede, assim como a correspondente modificação da banda proibida de energia e do intervalo de emissão e absorção óptica, com a variação da fração molar de x. A flexibilidade destas propriedades estruturais torna este composto apropriado como substratos para epitaxias de outros compostos ternários e quaternários, na formação de mono e heterojunções. A maneira mais econômica para obtenção de substratos de materiais semicondutores é através do crescimento de cristais a partir da fase líquida. Porém, os parâmetros que regem a obtenção de lingotes de Ga1-xInxSb com qualidade comercial, a partir da fase líquida, ainda não estão bem definidos. O índio tende a segregar para o líquido, pois seu coeficiente de segregação é menor que a unidade (k < 1), resultando num perfil composicional variado ao longo do lingote. Como os binários GaSb e InSb apresentam configurações de defeitos intrínsecos que originam condutividades de tipos opostos, tipo p e tipo n, respectivamente, a mudança na composição da liga, durante o crescimento, provavelmente resulta na modificação da concentração de cada um destes defeitos. A dopagem com telúrio consiste numa alternativa para minimizar a segregação do índio e diminuir a densidade dos defeitos pontuais, melhorando a qualidade estrutural de cristais de Ga1-xInxSb obtidos através do método Bridgman convencional. Desta forma foram crescidos cristais ternários Ga1-xInxSb, com e sem agitação do líquido durante a síntese, com fração molar inicial de índio de 10% e 20%, alguns deles dopados com 1020 átomos/cm3 de telúrio, pelo método Bridgman vertical. A caracterização estrutural em termos de formação de defeitos lineares, interfaciais e volumétricos foi realizada através de imagens obtidas por microscopia óptica, eletrônica de varredura e de transmissão. A homogeneidade composicional e distribuição de fases foi avaliada através de medidas de espectroscopia por dispersão de energia. Medidas de resistividade e efeito Hall foram utilizadas para a caracterização elétrica, enquanto que a transmitância óptica e a banda proibida de energia foram avaliadas por espectrometria FTIR. Os padrões de difração obtidos através da microscopia eletrônica de transmissão foram utilizados para avaliar a cristalinidade das amostras e determinar o parâmetro de rede. Os resultados obtidos indicam que o telúrio atua de forma compensatória, minimizando a segregação de índio e contribuindo para a homogeneidade composicional e redução de defeitos, principalmente de discordâncias. Além disso, altera a condutividade do Ga1-xInxSb para tipo n, mesmo em frações molares de In inferiores a x = 0,5, diminuindo o número de cargas positivas na rede atribuídas aos defeitos tipo GaSb e VGaGaSb e, desta forma, aumenta a concentração de portadores de carga e reduz a resistividade. Na condição de alta dopagem, reduz a transmitância óptica no infravermelho e aumenta a banda proibida de energia através do efeito Burstein-Moss. A avaliação de cristais de Ga1-xInxSb, dopados e não dopados, crescidos pelo método Bridgman convencional contribuiu para o entendimento do comportamento de dopantes em compostos semicondutores ternários. / Ternary compound semiconductors, including Ga1-xInxSb, have been subject of interest of researchers and microelectronics industry because of the possibility of adjusting the lattice constant, as well as the corresponding modification in the band gap energy, and in the optical absorption and emission range, by varying the mole fraction x. The flexibility of their structural properties makes this compound suitable as substrates for epitaxy of other ternary and quaternary compounds, in the formation of mono- and heterojunctions. The most economical way to obtain semiconductor substrates is by crystal growth from the liquid phase. However, the parameters governing the outcoming of Ga1-xInxSb ingots with commercial quality, from liquid phase, are not well defined. Indium tends to segregate to the liquid, since its segregation coefficient is less than the unity (k < 1), resulting in a varied compositional profile along the ingot. As the binary GaSb and InSb have intrinsic defects configurations that originate opposite conductivities, type p and type n, respectively, the change in the alloy composition, while growing, probably results in a modification of the concentration on each of these defects. Doping with tellurium is an alternative to minimize the indium segregation and decrease the density of point defects, therefore improving the structural quality of Ga1-xInxSb crystals obtained through the conventional Bridgman method. Thus, ternary Ga1-xInxSb crystals were grown by vertical Bridgman method with and without stirring the melt during the synthesis, with 10% and 20% initial molar fraction of indium and some of them were tellurium-doped at 1020 atoms/cm3. The structural characterization regarding linear, interfacial, and volumetric defects formation was performed by using images obtained through optical, scanning and transmission electron microscopy. The compositional homogeneity and phase distribution was assessed by energy-dispersive spectroscopy measurements. Resistivity and Hall Effect measurements were used for the electrical characterization, while the optical transmittance and the band gap energy were examined by FTIR spectroscopy. Diffraction patterns obtained by transmission electron microscopy were used to evaluate the crystallinity of the samples and determine the lattice parameter. The results indicate that tellurium acts in a compensatory way, minimizing indium segregation and contributing to the compositional homogeneity and defect reduction, especially in dislocations. In addition, it changes the conductivity of Ga1-xInxSb to n-type, even in mole fraction of In lower than x = 0.5, reducing the number of positive charges on the network assigned to GaSb and VGaGaSb defects, thus increasing the concentration of charge carriers and reducing the resistivity. In high doping condition, it reduces the optical transmittance in the infrared region and increases the energy of the band gap by the Burstein-Moss Effect. The evaluation of Ga1-xInxSb crystals, doped and undoped, grown by the conventional Bridgman method contributed to the understanding of dopants behavior in ternary compound semiconductors.

The development of ultraviolet semiconductor emitters (LEDs and lasers) will enable a large number of industrial and medical applications. AlGaN alloys are ideally suited for the development of such devices since their energy gap can be tuned from the near UV (365 nm) to deep UV (200 nm). However, the doping of such materials n- and p-type is difficult. Another problem is the generally poor light extraction efficiency from both UV and visible LEDs. This research addressed the first problem by developing UV emitters in the form of graded-index-separate-confinement-heterostructure (GRINSCH). In these device the active region is embedded in two compositionally graded wave guiding layers. Due to the polar nature of nitride semiconductors these compositionally graded AlGaN films are doped p- or n-type if the grading changes from high to low concentration or from low to high concentration respectively. Thus, a p-n junction is automatically formed without the incorporation of dopants. The polarization induced doping level in these structures was calculated to be 1018cm-3 for the p- and n-sides. A number of devices, whose active region is either 75 nm Al0.72Ga0.28N bulk film or multiple QWs have been grown on 6H-SiC substrates by Molecular-Beam Epitaxy (MBE) and investigated. The emission properties of these structures were investigated by cathodoluminescence (CL) and by measuring their optical gain. A maximum net modal gain in excess of 80 cm-1 was measured with an optical gain threshold of 14 µJ / cm2. Some of these structures, emitting in the near UV, were also electrically pumped. The second problem was addressed by incorporating dielectric (TiO2) photonic crystals on the phosphor plates of white LEDs in order to increase the light extraction efficiency upon illumination with blue LEDs. The two-dimensional (2D) hexagonal-lattice of TiO2 photonic crystal was formed by e-beam lithography on low-scattering (Y1-xCex)3Al5O12 (YAG:Ce) ceramic phosphor plates. Yellow light extraction enhancement by a factor of 4.4 was achieved with a 2D photonic crystal nano-cylinders having diameter 430 nm, lattice constant of 580 nm and height of 350 nm. Simulations using a three-dimensional finite difference time domain are consistent with our measured data.

abstract: ABSTRACT An Ensemble Monte Carlo (EMC) computer code has been developed to simulate, semi-classically, spin-dependent electron transport in quasi two-dimensional (2D) III-V semiconductors. The code accounts for both three-dimensional (3D) and quasi-2D transport, utilizing either 3D or 2D scattering mechanisms, as appropriate. Phonon, alloy, interface roughness, and impurity scattering mechanisms are included, accounting for the Pauli Exclusion Principle via a rejection algorithm. The 2D carrier states are calculated via a self-consistent 1D Schrödinger-3D-Poisson solution in which the charge distribution of the 2D carriers in the quantization direction is taken as the spatial distribution of the squared envelope functions within the Hartree approximation. The wavefunctions, subband energies, and 2D scattering rates are updated periodically by solving a series of 1D Schrödinger wave equations (SWE) over the real-space domain of the device at fixed time intervals. The electrostatic potential is updated by periodically solving the 3D Poisson equation. Spin-polarized transport is modeled via a spin density-matrix formalism that accounts for D'yakanov-Perel (DP) scattering. Also, the code allows for the easy inclusion of additional scattering mechanisms and structural modifications to devices. As an application of the simulator, the current voltage characteristics of an InGaAs/InAlAs HEMT are simulated, corresponding to nanoscale III-V HEMTs currently being fabricated by Intel Corporation. The comparative effects of various scattering parameters, material properties and structural attributes are investigated and compared with experiments where reasonable agreement is obtained. The spatial evolution of spin-polarized carriers in prototypical Spin Field Effect Transistor (SpinFET) devices is then simulated. Studies of the spin coherence times in quasi-2D structures is first investigated and compared to experimental results. It is found that the simulated spin coherence times for GaAs structures are in reasonable agreement with experiment. The SpinFET structure studied is a scaled-down version of the InGaAs/InAlAs HEMT discussed in this work, in which spin-polarized carriers are injected at the source, and the coherence length is studied as a function of gate voltage via the Rashba effect. / Dissertation/Thesis / Ph.D. Electrical Engineering 2011