In past years, legislative pressures (particularly in Japan and Europe) had forced the electronics industry to eliminate Pb from their end products and manufacturing processes. With respect to factors such as ease of converting existing tin-lead plating systems, ease of manufacture and compatibility with existing assembly methods, pure tin plating is seen by many in the industry as a potentially simple and cost effective alternative to SnPb-based systems. The problem of spontaneous tin whisker formation, a characteristic of pure tin, still needs to be addressed, as it can lead to device failure by shorting two terminals on electronic devices. This possibility gives rise to major reliability concerns. The study relates to an electronic component with pure tin deposit layer on the part for electric connection, wherein pure tin deposit layer is a fine grained tin deposit layer composed of grains with smaller size in the direction perpendicular to the deposit surface than in the direction parallel to the deposit surface. It is called irregular tin grain structure. It applies a process for plating an electronic component, so as to form a pure tin deposit layer on the part for electric connection, comprising the steps of: adjusting the composition of tin plating solution in which starter additive and brighter additive are included; moving the electronic component through the tin plating solution, so as to form a fine grained tin deposit layer on the part for electric connection. We performed a DoE by depositing different tin grain structures with variant thickness. After whisker test in high temperature/high humidity and room condition, we confirmed corrosion mechanism, intermetallic morphology, and different behaviour of tin atoms. To summarize the studies, as compared with the prior arts, irregular grain structure can validly inhibit the whisker growth.