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Fabrication and characterization of nanowire devices. / 纳米线器件的制备和表征 / Fabrication and characterization of nanowire devices. / Na mi xian qi jian de zhi bei he biao zhengJanuary 2011 (has links)
Liang, Hui = 纳米线器件的制备和表征 / 梁慧. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2011. / Includes bibliographical references (leaves 45-48). / Abstracts in English and Chinese. / Liang, Hui = Na mi xian qi jian de zhi bei he biao zheng / Liang Hui. / Chapter Chapter 1 --- Nanowire-based devices --- p.1 / Chapter 1.1 --- Introduction --- p.1 / Chapter 1.1.1 --- Properties of various nanowires --- p.2 / Chapter 1.1.2 --- Nanowire growth methods --- p.3 / Chapter 1.1.3 --- Introduction to EBL --- p.4 / Chapter 1.1.4 --- Properties of nanowire and the arrays and related devices --- p.6 / Chapter Chapter 2 --- Experimental --- p.9 / Chapter 2.1 --- Nanowire preparation --- p.9 / Chapter 2.1.1 --- ZnS nanowire growth --- p.9 / Chapter 2.1.2 --- Sb2S3 nanowire growth --- p.10 / Chapter 2.2 --- Device fabrication --- p.10 / Chapter 2.2.1 --- Single-nanowire device --- p.10 / Chapter 2.2.2 --- Multiple-nanowire device --- p.17 / Chapter 2.2.3 --- Silicon device --- p.17 / Chapter 2.3 --- Characterizations --- p.18 / Chapter 2.3.1 --- Morphological and structural characterizations of the nanowires --- p.18 / Chapter 2.3.2 --- Two-probe measurements --- p.18 / Chapter 2.3.3 --- Four-probe measurements --- p.19 / Chapter Chapter 3 --- Results and Discussion --- p.21 / Chapter 3.1 --- Optimal factors for sample preparation --- p.21 / Chapter 3.1.1 --- Trial of spin coating --- p.21 / Chapter 3.1.2 --- Trial of Coating thickness --- p.21 / Chapter 3.1.3 --- Trial of e-beam lithography --- p.22 / Chapter 3.1.4 --- Trial of dosage --- p.23 / Chapter 3.1.5 --- Trial of development time --- p.26 / Chapter 3.2 --- Electrical Properties of devices made --- p.28 / Chapter 3.2.1 --- UV-visible response of single ZnS nanowire devices --- p.28 / Chapter 3.2.2 --- The optoelectronic characteristics of single Sb2S3 nanowire devices --- p.32 / Chapter 3.2.3 --- The optoelectronic characteristics of multiple-nanowire devices --- p.35 / Chapter 3.2.4 --- Temperature dependent resistance and magnetoresistance of the silicon device --- p.41 / Chapter Chapter 4 --- Conclusions --- p.44 / Chapter Chapter 5 --- References --- p.45
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Analysis and correction of three-dimensional proximity effect in binary E-beam nanolithographyAnbumony, Kasi Lakshman Karthi, Lee, Soo-Young. January 2007 (has links) (PDF)
Thesis(M.S.)--Auburn University, 2007. / Abstract. Vita. Includes bibliographic references.
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Direct patterning of solution deposited metal oxides /Stowers, Jason K. January 1900 (has links)
Thesis (Ph. D.)--Oregon State University, 2009. / Printout. Includes bibliographical references. Also available on the World Wide Web.
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Functionalization dependance of calix[6]arene contrast and sensitivity to electron beam exposure /Ralls, Daniel M. January 1900 (has links)
Thesis (M.S.)--Texas State University--San Marcos, 2008. / Vita. Includes bibliographical references (leaves 50-51). Also available on microfilm.
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Investigation of fabrication process development for integrated optical grating structuresPisharoty, Divya. January 1900 (has links)
Thesis (M.S.)--West Virginia University, 2005. / Title from document title page. Document formatted into pages; contains x, 114 p. : ill. (some col.). Includes abstract. Includes bibliographical references (p. 112-114).
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Laser-cluster interaction and its applications in semiconductor processing /Chen, Xiaoming, January 1999 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 169-171). Available also in a digital version from Dissertation Abstracts.
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Some optical and catalytic properties of metal nanoparticlesTabor, Christopher Eugene. January 2009 (has links)
Thesis (Ph.D)--Chemistry and Biochemistry, Georgia Institute of Technology, 2010. / Committee Chair: El-Sayed, Mostafa; Committee Member: Perry, Joseph; Committee Member: Wang, Zhong; Committee Member: Whetten, Robert; Committee Member: Zhang, John. Part of the SMARTech Electronic Thesis and Dissertation Collection.
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Distortion in conformable masks for evanescent near field optical lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand /Wright, A. J. January 1900 (has links)
Thesis (M.E.)--University of Canterbury, 2007. / Typescript (photocopy). "March 2007." Includes bibliographical references (p. 123-127). Also available via the World Wide Web.
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Development and characterization of advanced electron beam resistsAgrawal, Ankur 05 1900 (has links)
No description available.
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On the throughput optimization of electron beam lithography systems /Mulder, Elvira Hendrika, January 1991 (has links)
Thesis (doctoral)--Technische Universiteit Delft, 1991. / Summary in Dutch. "Stellingen" ([1] folded leaf) inserted. Vita. Includes bibliographical references (p. BR-1-BR-15).
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