Thesis (Ph. D.)--School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 2005. Directed by Clifford L. Henderson. / Brent Carter, Committee Member ; Clifford L. Henderson, Committee Chair ; Dennis Hess, Committee Member ; Peter Ludovice, Committee Member ; Kevin Martin, Committee Member. Vita. Includes bibliographical references.

Thesis (Ph.D)--Electrical and Computer Engineering, Georgia Institute of Technology, 2010. / Committee Chair: Thomas K. Gaylord; Committee Member: Donald D. Davis; Committee Member: Gee-Kung Chang; Committee Member: Muhannad S. Bakir; Committee Member: Phillip N. First. Part of the SMARTech Electronic Thesis and Dissertation Collection.

Thesis (Ph. D.)--University of Texas at Austin, 2008. / Vita. Includes bibliographical references.

Nanopore-based single-molecule analysis of biomolecules such as DNA and proteins is a subject of strong scientific and technological interest. In recent years, solid state nanopores have been demonstrated to possess a number of advantages over biological (e.g., ion channel protein) pores due to the relative ease of tuning the pore dimensions, pore geometry, and surface chemistry. However, solid state fabrication methods have been limited in their scalability, automation, and reproducibility. In this work, a wafer-scale fabrication method is first demonstrated for reproducibly fabricating large arrays of solid-state nanopores. The method couples the high-resolution processes of electron beam lithography (EBL) and atomic layer deposition (ALD). Arrays of nanopores (825 per wafer) are successfully fabricated across a series of 4' wafers, with tunable pore sizes from 50 nm to sub-20 nm. The nanopores are fabricated in silicon nitride films with thicknesses varying from 10 nm to 50 nm. ALD of aluminum oxide is used to tune the nanopore size in the above range. By careful optimization of all the processing steps, a device survival rate of 96% is achieved on a wafer with 50 nm silicon nitride films on 60- 80 micron windows. Furthermore, a significant device survival rate of 88% was obtained for 20 nm silicon nitride films on order 100 micron windows. In order to develop a deeper understanding of nanopore fabrication-structure relationships, a modeling study was conducted to examine the physics of EBL, in particular: to investigate the effects of beam blur, dose, shot pattern, and secondary electrons on internal pore structure. Under the operating conditions used in pore production, the pores were expected to taper to a substantially smaller size than their apparent size in SEM. This finding was supported by preliminary conductance readings from nanopores.

This thesis reports the characterization and development of nanolithography using Electron Beam Lithography system and nanoscale plasma etching. The standard Bosch process and a modified three-pulse Bosch process were developed in STS ICP and Plasma ICP system separately. The limit of the Bosch process at the nanoscale regime was investigated and documented. Furthermore, the effect of different control parameters on the process were studied and summarized in this report. 28nm-wide trench with aspect-ratio of 25 (smallest trench), and 50nm-wide trench with aspect ratio of 37 (highest aspect-ratio) have been demonstrated using the modified three-pulse process. Capacitive resonators, SiBAR and IBAR devices have been fabricated using the process developed in this work. IBARs (15MHz) with ultra-high Q (210,000) have been reported.

A variety of techniques are available to enable the fabrication of photonic crystal structures. Multi-beam-interference lithography (MBIL) is a relatively new technique which offers many advantages over more traditional means of fabrication. Unlike the more common fabrication methods such as optical and electron-beam lithography, MBIL is a method that can produce both two- and three-dimensional large-area photonic crystal structures for use in the infrared and visible light regimes. While multi-beam-interference lithography represents a promising methodology for the fabrication of PC structures, there has been an incomplete understanding of MBIL itself. The research in this thesis focuses on providing a more complete, systematic description of MBIL in order to demonstrate its full capabilities. Analysis of both three- and four-beam interference is investigated and described in terms of contrast and crystallography. The concept of a condition for primitive-lattice-vector-direction equal contrasts} is introduced in this thesis. These conditions are developed as nonlinear constraints when optimizing absolute contrast for producing lithographically useful interference patterns (meaning high contrast and localized intensity extrema). By understanding the richness of possibilities within MBIL, a number of useful interference patterns are found that can be created in a straightforward manner. These patterns can be both lithographically useful and structurally useful (providing interference contours that can define wide-bandgap photonic crystals). Included within this investigation are theoretical calculations of band structures for photonic crystals that are fabricatable through MBIL. The resulting calculations show that not only do most MBIL-defined structures exhibit similar performance characteristics compared to conventionally designed photonic crystal structures, but in some cases MBIL-defined structures show a significant increase in bandgap size. Using the results from this analysis, a number of hexagonal photonic crystals are fabricated using a variety of process conditions. It is shown that both rod- and hole-type photonic crystal structures can be fabricated using processes based on both positive and negative photoresist. The "light-field" and "dark-field" interference patterns used to define the hexagonal photonic crystal structures are quickly interchanged by the proper adjustment of each beam's intensity and polarization. The resulting structures, including a large area (~1 cm², 1 x 10⁹ lattice points) photonic crystal are imaged using a scanning electron microscope. Multi-beam-interference lithography provides an enabling initial step for the wafer-scale, cost-effective integration of the impressive PC-based devices into manufacturable DIPCS. While multi-beam-interference lithography represents a promising methodology for the fabrication of PC structures, it lacks in the ability to produce PC-based integrated photonic circuits. Future research will target the lack of a large-scale, cost-effective fabrication methodology for photonic crystal devices. By utilizing diffractive elements, a photo-mask will be able to combine both MBIL and conventional lithography techniques into a single fabrication technology while taking advantage of the inherent positive attributes of both.

The strong electromagnetic field that is induced at the surface of a plasmonic nanoparticle can be utilized for many important applications, including spectroscopic enhancement and electromagnetic waveguides. The focus of this thesis is to study some of the properties of induced plasmonic fields around metal nanoparticles. Current methodologies for fabricating nanoparticles are discussed, including lithography and colloidal synthesis. This dissertation includes studies on plasmonic driven nanoparticle motion of surface supported gold nanoprisms from a substrate into solution via a femtosecond pulse. The mechanism of particle motion is discussed and the stability of the unprotected nanoprisms in solution is studied. Fundamental plasmonic near-field coupling between two plasmonic nanoparticles is also examined. Experimental results using electron beam lithography fabricated samples are used to explicitly describe the plasmonic coupling between dimers as a function of the nanoparticle size, shape, and orientation. These variables are systematically studied and the dependence is compared to mathematically derived functional dependencies in order to model and predict the effects of plasmonic coupling. As an extension, the coupling between plasmonic nanoparticles is shown in a common application, surface enhanced Raman scattering. The final chapter is devoted to an investigation of the nature of nanocatalysis, homogeneous and heterogeneous, for several reactions using metal nanoparticles.

The work presented in this thesis shows how tunneling spectroscopy techniques can be applied to metallic nanoparticles to obtain useful information about fundamental physical processes in nanoscopic length scales. At low temperatures, the discrete character of the energy spectrum of these particles, allows the study of spin-polarized current via resolved "electron-in-a-box" energy levels. In samples consisting of two ferromagnetic electrodes tunnel coupled to single aluminum nanoparticles, spin accumulation mechanisms are responsible for the observed spin-polarized current. The observed effect of an applied perpendicular magnetic field, relative to the magnetization orientation of the electrodes, indicates the suppression of spin precession in such small particles. More generally, in the presence of an external non-collinear magnetic field, it is the local field "felt" by the particle that determines the character of the tunnel current. This effect is also observed in the case where only one of the electrodes is ferromagnetic. In contrast to the non-magnetic case, ferromagnetic nanoparticles exhibit a much more complex energy spectrum, which cannot be accounted for, using the simple free-electron picture. It will be shown that interactions between quasi-particle excitations due to sequential electron tunneling and spin excitations in the particle are likely to play an important role in the observed temperature/voltage dependence of magnetic hysteresis loops.

We report the design and fabrication of a micro-mechanical oscillator for use in extremely small force detection experiments such as transverse force measurements of a moving vortex and Nuclear Magnetic Resonance Force Microscopy (NMRFM). We study the basic physics of the double torsional mechanical oscillator, and pursue double torsional oscillators with small spring constants, high resonance frequencies, and high quality factors. Using a series of semiconductor manufacturing techniques, especially using the electron-beam lithography technique, we successfully micro-fabricate double torsional mechanical oscillators from silicon-on-insulator wafers. We conduct characterization experiments to extract important parameters of a mechanical oscillator, including the resonance frequencies, spring constants, and quality factors. We focus on the four typical resonance modes of these oscillators, and then compare the force detection sensitivity of each mode. Eventually we apply these force sensitive oscillators to gold micro-mass measurements, and achieve very small mass detection. In the future we are going to continue to micro-fabricate thinner oscillators to reduce the spring constants, and improve the quality factors by designing more suitable geometric shapes and by pursuing annealing studies. Thus, we might be able to achieve single nuclear spin measurements using NMRFM. / text

Thesis (Ph. D.)--University of California, San Diego, 2000. / Vita. Includes bibliographical references.