Die vorliegende Dissertation befasst sich mit der Bewertung eines Mehrfachschichtmodells für Permeationsbarrieren auf Basis einer detaillierten Charakterisierung der zugrunde liegenden Einzelschichten. Diese sind reaktiv gesputterte Oxidschichten als Barriereschicht und mittels Magnetron-PECVD abgeschiedene siliziumhaltige Plasmapolymerschichten zur Verwendung als Zwischenschicht. Zunächst werden die verschiedenen gesputterten Oxidschichten charakterisiert und verglichen. Die untersuchten Materialien sind Zinkoxid, Siliziumoxid, Zink-Zinn-Oxid, Aluminiumoxid und Titanoxid. Die wirkenden Permeationsmechanismen und die Ursachen für teils deutliche Unterschiede zwischen verschiedenen Materialien werden diskutiert. Während die Sauerstoffpermeation immer durch Punktdefekte in den Schichten bestimmt wird, muss bei der Wasserdampfpermeation von weiteren Permeationsmechanismen ausgegangen werden. Am Beispiel des Zink-Zinn-Oxids und des Aluminiumoxids wird anschließend die Abhängigkeit der Permeationseigenschaften von wesentlichen Prozessparametern wie Sputterleistung, Prozessdruck oder reaktiver Arbeitspunkt untersucht. Im zweiten Teil der Arbeit werden die Plasmapolymerschichten hinsichtlich ihrer Struktur- und Permeationseigenschaften charakterisiert und mit gesputtertem Siliziumoxid verglichen. Die Abhängigkeit der Permeationseigenschaften vom Kohlenstoffgehalt in den Schichten wird untersucht. Anhand der gewonnenen Ergebnisse werden abschließend sowohl die Sputterschichten als auch die mittels Magnetron-PECVD abgeschiedenen Schichten hinsichtlich ihrer Eignung für ein Barrieremehrfachschichtsystem bewertet. / The aim of this PhD-thesis is to evaluate a concept for a multilayer permeation barrier by a detailed characterization of the different constituent of the layer stack. The multilayer concept is based on reactively sputtered permeation barrier layers and an interlayer that is deposited by using a magnetron based plasma enhanced chemical vapor deposition (Magnetron-PECVD) process. In the first part of this thesis, different sputtered oxide layers are characterized and compared regarding their structural and surface properties as well as their water vapor and oxygen permeability. These oxide layers include the materials zinc oxide, silicon oxide, zinc-tin oxide, aluminum oxide and titanium oxide. The permeation mechanisms and reasons for significant differences in the water vapor and oxygen transmission rates in the different materials are evaluated and discussed. Oxygen permeation thereby is always dominated by defects in the layers. In contrast to that, additional permeation mechanisms can be assumed for water vapor permeation. The dependence of the gas permeation on sputter process parameters like plasma power, process pressure and reactive sputtering mode is evaluated for zinc-tin oxide and aluminum oxide layers. In the second part of this thesis, plasma polymer layers that are deposited using the Magnetron-PECVD process are characterized regarding their structure and surface roughness. Their water vapor and oxygen permeability is compared to the permeation through reactively sputtered silicon oxide layers. The dependence of the gas permeation on the atomic composition, in particular on the carbon concentration, is evaluated. Finally, both the sputtered oxide layers and the Magnetron-PECVD plasma polymer layers are evaluated regarding their usability in a multilayer stack for high permeation barrier applications.

Gegenstand der wissenschaftlichen Arbeit ist der technologische Nachweis für die Erzeugbarkeit haftfester metallischer und keramischer Schichten auf textilen Flächengebilden mit den PVD-Technologien reaktives Magnetron-Sputtern und reaktives Vakuumbogen-Verdampfen. Basis für die Realisierung der experimentellen Untersuchungen sind sowohl vorhandene industrielle PVD-Beschichtungsanlagen, die im Batchbetrieb arbeiten, als auch Rollcoater als Bindeglied zwischen einer Labor- und einer Industrieanlage. Kern des Vorhabens sind umfangreiche Batchbeschichtungen auf Basis einer breit angelegten Experimentalmatrix bezüglich Substrat- und Schichtauswahl. Gängige Targetmaterialien sind Kupfer, Aluminium und Silber. Um zu zeigen, dass über das thermische Bedampfen hinaus neue Schichten und Schichtsysteme auf textilen Faserstoffen abgeschieden werden können, wurden zusätzlich die Targetmaterialien Titan und Zirkonium in die Untersuchungen einbezogen. Zur Herstellung sowohl metallischer als auch keramischer Schichten wird neben den technologischen Parametern Beschichtungszeit und Schichtmaterial der Reaktivgasfluss variiert. Als Substrate kamen zwei leichtgewichtige PA 6.6-Gewebe mit unterschiedlicher Bindung, ein kalanderverfestigter Vliesstoff aus PES und ein Spinnvliesstoff aus Kern-Mantel-Fasern mit einem PA 6 Mantel zum Einsatz. Zur Verbesserung der Schichthaftungen wurden Versuche zur Vorbehandlung mittels Plasmabehandlung in Argon und Sauerstoff, mit Gasphasenfluorierung sowie HMDSO-Behandlung mit einem PA 6.6-Gewebe durchgeführt. Im Anschluss an die Vorbehandlung wurden die Proben mit Titan und Titannitrid metallisiert. Die Charakterisierung der Substrat-Schicht-Verbunde erfolgt hinsichtlich - der chemischen Zusammensetzungen der Schichten mittels ESCA (Electron Spectroscopy for Chemical Analysis), - der Schichtstrukturen und Fasermorphologien mittels Rasterelektronenmikroskopie, - der E-Moduln an Referenzprobekörpern aus Edelstahl mittels Härtemessung, - der Schichthaftungen durch Waschversuche, Martindale-Scheuertest, Peel-Test und - der funktionellen Schichteigenschaften wie Oberflächenwiderstände, elektromagnetische Schirmdämpfung, Wärmedämmeigenschaften Im Ergebnis der experimentellen Untersuchungen werden grundlegende Erkenntnisse zum Einfluss der PVD-Technologien und der Prozessparameter auf genannte Schicht- und Fasereigenschaften aufgezeigt. Des Weiteren werden die Zusammenhänge zwischen Schichtstruktur, Fasermorphologie und Schichthaftung dargelegt. Aus den Ergebnissen werden Schlussfolgerungen für eine gezielte industrielle Anwendung und Vorschläge für weiterführende wissenschaftliche Arbeiten abgeleitet. Die PVD-Verfahren werden bezüglich ihrer Eignung für die Textilbeschichtung bewertet. / Subject of the scientific study is the technological proof for the possibility to generate well adherent metallic and ceramic layers on textile fabrics with the PVD technologies reactive magnetron sputtering and reactive arc evaporation. Basis for the experimental investigations were both an industrial PVD coating device of the batch-type and a roll-coater which is a connective link between a laboratory and an industrial coating device. Extensive batch coatings on basis of a broadly applied experimental matrix in terms of the choice of the substrate and layer material are basis of the project. Usual target materials were copper, aluminium and silver. Additionally, the target materials titanium and zirconium were included in the investigations in order to show that new layers and layer systems can be deposited on textile fabrics by means of the investigated PVD technologies in comparison with thermal evaporation. Apart from the technological parameters coating time and layer material, the reactive gas flow were varied to deposit both metallic and ceramic layers. Substrates used in this study were lightweight Pa 6.6 fabrics with different weaves of the fabric, a calender bonded nonwoven of PES and a spunbonded nonwoven consisting of sheath-core fibers of PES (sheath) and Pa 6 (core). In order to improve the adhesion of layers, different pretreatments of the PA 66 fabric were carried out by means of plasma treatment with argon and oxygen, gas phase fluorination and treatment with HMDSO respectively. Subsequently, the pretreated samples were metallized with titanium and titanium nitride. The characterisation of the substrate layer combinations were carried out regarding - the chemical compositions of the layers by means of ESCA (Electron Spectroscopy for Chemical Analysis), - the layer structures and fiber morphologies by means of raster electron microscopy, - the modulus of elasticity on reference specimens consisting of stainless steel by means of hardness measurement, - the layer adhesion by wash tests, Martindale abrasion test, peel tests and - the functional layer characteristics such as surface resistances, electromagnetic shielding, heat insulating characteristics In the result of the experimental investigations, extensive knowledge to the influence of the PVD technologies and process parameters on layer and fiber characteristics are presented. Furthermore, the correlation of layer structure, fiber morphology and layer adhesion are explained. Conclusions for a selective industrial application and suggestions for further scientific investigations are derived from the results. The PVD procedures are evaluated concerning their suitability for the coating of textiles.

<p>Ferroelectrics are a group of advanced electronic materialswith a wide variety of properties useful in applications suchas memory devices, resonators and filters, infrared sensors,microelectromechanical systems, and optical waveguides andmodulators. Among the oxide perovskite-structured ferroelectricthin film materials sodium potassium niobate or Na0.5K0.5NbO3(NKN) has recently emerged as one of the most promisingmaterials in microwave applications due to high dielectrictunability and low dielectric loss. This licentiate thesispresents results on growth and structural, optical, andelectrical characterization of Na0.5K0.5NbO3 thin films. Thefilms were deposited by rf-magnetron sputtering of astoichiometric, high density, ceramic Na0.5K0.5NbO3 target ontosingle crystal LaAlO3 and Al2O3, and polycrystalline Pt80Ir20substrates. By x-ray diffractometry, NKN films on c-axisoriented LaAlO3 substrates were found to grow epitaxially,whereas films on hexagonal sapphire and polycrystallinePt80Ir20 substrates were found to be preferentially (00l)oriented. Optical and waveguiding properties of theNa0.5K0.5NbO3/Al2O3 heterostructure were characterized using aprism-coupling technique. Sharp and distinguishable transversemagnetic (TM) and electric (TE) propagation modes wereobserved. The extraordinary and ordinary refractive indiceswere calculated to ne = 2.216±0.003 and no =2.247±0.002 for a 2.0 μm thick film at λ = 632.8nm. This implies a birefringence Δn = ne - no =-0.031±0.003 in the film. The ferroelectric state inNKN/Pt80Ir20 films at room temperature was indicated by apolarization loop with polarization as high as 33.4 μC/cm2at 700 kV/cm, remnant polarization of 9.9 μC/cm2 andcoercive field of 91 kV/cm. Current-voltage characteristics ofvertical Au/NKN/Pt80Ir20 capacitive cells and planar Au/NKN/LaAlO3 interdigital capacitors (IDCs) showed very goodinsulating properties, with the leakage current density for anNKN IDC on the order of 30 nA/cm2 at 400 kV/cm. Rf dielectricspectroscopy demonstrated low loss, low frequency dispersion,and high voltage tunability. At 1 MHz NKN/LaAlO3 showed adissipation factor tan δ of 0.010 and a tunability of 16.5% at 200 kV/cm. For the same structure the frequencydispersion, Δεr, between 1 kHz and 1 MHz was 8.5%.</p><p><b>Key words:</b>ferroelectrics, sodium potassium niobates,thin films, rf-magnetron sputtering, waveguiding, refractiveindex, prism coupling, dielectric tunability</p>

The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). Characteristic for this technique are high energy pulses (a few Joules) of length 50-100 µs that are applied to the target (cathode) with a duty time of less than 1 % of the total pulse time. This results in a high electron density in the discharge (&gt;1x1019 m-3) and leads to an increase of the ionization fraction of the sputtered material reaching up to 70 % for Cu. In this work the spatial and temporal evolution of the plasma parameters, including the electron energy distribution function (EEDF), the electron density and the electron temperature are determined using electrostatic Langmuir probes. Electron temperature measurements reveal a low effective temperature of 2-3 eV. The degree of ionization in the HPPMS discharge is explained in light of the self-sputtering yield of the target material. A simple model is therefore provided in order to compare the sputtering yield in HPPMS and that in dc magnetron sputtering (dcMS) for the same average power. Thin Ta films are grown using HPPMS and dcMS and their properties are studied. It is shown that enhanced microstructure and morphology of the deposited films is achieved by HPPMS. The Ta films are also deposited at a number of substrate inclination angles ranging from 0o (i.e., facing the target surface) up to 180 o (i.e., facing away from the target). Deposition rate measurements performed at all inclination angles for both techniques, reveal that growth made using HPPMS resulted in an improved film thickness at higher inclination. Furthermore, the high ionization of the Ta atoms in HPPMS discharge is found to allow for phase tailoring of the deposited films at all inclination angles by applying a bias voltage to the substrate. Finally, highly ionized magnetron sputtering of a compound MAX-phase material (Ti3SiC2) is performed, demonstrating that the HPPMS discharge could also be used to tailor the composition of the growing Ti-Si-C films. / On the day of the public defence of the doctoral thesis, the status of articles III and IV was Submitted. The titles of papers VI and VII changed between their manuscript forms and when they were published.

In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. Thin films grown by ionized physical vapor deposition (I-PVD) have lately shown promising results regarding film structure and adhesion. High power impulse magnetron sputtering (HIPIMS) is a relatively newly developed technique, which relies on the creation of a dense plasma in front of the sputtering target to produce a large fraction of ions of the sputtered material. In HIPIMS, high power pulses with a length of ~100 μs are applied to a conventional planar magnetron. The highly energetic nature of the discharge, which involves power densities of several kW/cm2, creates a dense plasma in front of the target, which allows for a large fraction of the sputtered material to be ionized. The work presented in this thesis involves plasma analysis using electrostatic probes, optical emission spectroscopy (OES), magnetic probes, energy resolved mass spectrometry, and other fundamental observation techniques. These techniques used together are powerful plasma analysis tools, and used together give a good overview of the plasma properties is achieved. from the erosion zone of the magnetron. The peak plasma density during the active cycle of the discharge exceeds 1019 electrons/m3. The expanding plasma is reflected by the chamber wall back into the center part of the chamber, resulting in a second density peak several hundreds of μs after the pulse is turned off. Optical emission spectroscopy (OES) measurements of the plasma indicate that the degree of ionization of sputtered Ti is very high, over 90 % in the peak of the pulse. Even at relatively low applied target power (~200 W/cm2 peak power) the recorded spectrum is totally dominated by radiation from ions. The recorded HIPIMS spectra were compared to a spectrum taken from a DC magnetron discharge, showing a completely different appearance. Magnetic field measurements performed with a coil type probe show significant deformation in the magnetic field of the magnetrons during the pulse. Spatially resolved measurements show evidence of a dense azimuthally E×B drifting current. Circulating currents mainly flow within 2 away cm from the target surface in an early part of the pulse, to later diffuse axially into the chamber and decrease in intensity. We record peak current densities of the E×B drift to be of the order of 105 A/m2. A mass spectrometry (MS) study of the plasma reveals that the HIPIMS discharge contains a larger fraction of highly energetic ions as compared to the continuous DC discharge. Especially ions of the target material are more energetic. Time resolved studies show broad distributions of ion energies in the early stage of the discharge, which quickly narrows down after pulse switch-off. Ti ions with energies up to 100 eV are detected. The time average plasma contains mainly low energy Ar ions, but during the active phase of the discharge, the plasma is highly metallic. Shortly after pulse switch-on, the peak value of the Ti1+/Ar1+ ratio is over 2. The HIPIMS discharge also contains a significant amount of doubly charged ions.

The theoretical part deals with basic characteristics of low-temperature, low-pressure plasma. It also describes the principles of preparation of polymer and nanocomposite films using this type of plasma. It further explains the basic principles of methods used to characterize our samples. The experimental section shows a technology to produce hard polymeric coatings with metal (Cu) nanoparticles (NPs) fabricated by gas aggregation source (GAS). This approach has an important advantage that Cu concentration and matrix properties can be controlled independently. Characterization of the films in terms of chemical composition, morphology, optical and mechanical properties is described here alongside with description of Cu NPs production using GAS with variable aggregation length. The a- C:H matrix was deposited in a mixture of Ar and n-hexane on the substrates placed on a RF electrode. The beam of the NPs was normal to the substrate plane. In this arrangement it was possible to control hardness of the films and by operational parameters of the GAS also the amount of the NPs in the film. In the last section fabrication of nanocomposite films of titanium and nylon NPs is shown. Powered by TCPDF (www.tcpdf.org)

L'excitation et la propagation des ondes de cisaillement dans les dispositifs à ondes acoustiques de surface SAW à base de nitrure d'aluminium, en milieux liquides, nécessitent l'inclinaison de l'axe c dans la structure hexagonale. Le but de cette étude était de déposer des couches minces d'AlN à axe c incliné par la technique de pulvérisation magnétron sans aucune modification du dispositif de pulvérisation, le substrat et la cible n'ayant subi ni inclinaison ni décalage. Il a été possible, par une approche basée seulement sur la variation des paramètres de croissance, de déposer des couches minces piézoélectriques avec un angle d'inclinaison de 13°±2° dans des conditions de haute pression (0.8 Pa) et basse température (300°C). Une couche de SiO2 a été également déposée afin de favoriser la croissance inclinée des grains et par conséquent de celle des colonnes. Les couches déposées présentent une grande homogénéité de l'épaisseur sur 75% d'un substrat de silicium de 3 pouces. Après la détermination des paramètres optimaux de « croissance inclinée », nous avons réalisé un dispositif à onde acoustique de surface fonctionnant en mode de cisaillement avec lequel nous avons démontré la possibilité d'exciter les ondes de cisaillement dans un dispositif de type AlN/Si02/Si à 486.2 MHz avec une vitesse de propagation d'environ 5835m/s et un facteur de couplage électromécanique de 0.014%. La réponse électrique est fort intéressante si on tient compte du faible couplage électromécanique dû au substrat utilisé. / The excitation and propagation, in liquid media, of shear waves in surface acoustic wave (SAW) devices based aluminum nitride (AlN) require the inclination of the c axis in the hexagonal structure. The purpose of this study was to deposit tilted c-axis AlN thin films by magnetron sputtering technique without any modification of the deposition system. The search approach was based only on the optimisation of deposition parameters. Substrate and the target were not inclined or shifted. It has been possible through an approach based solely on changes in growth parameters, to deposit thin piezoelectric layers with an inclination angle of 13 ° ± 2 ° under conditions of high pressure (0.8 Pa) and low temperature ( 300 ° C). A thin layer of SiO2 was also introduced to enhance the growth of tilted grains and therefore the columns. The deposited layers have a homogeneous thickness of 75% of a silicon substrate of 3 inches. After determining the optimal parameters leading to growth AlN film with tilted c-axis, we achieved a SAW device and hence demonstrate the ability to excite shear waves in AlN/Si02 /Si SAW structure. The performed device operate at 486.2 MHz corresponding to an acoustic velocity of about 5835m/s and an electromechanical coupling coefficient of 0.014%. The obtained electrical response is very interesting if we take into account the low electromechanical coupling of the structure due to the used substrate.

L'objectif de cette thèse est d'étudier le dépôt de couches minces par pulvérisation plasma à l'aide de simulations de dynamique moléculaire, en mettant l'accent sur les mécanismes de la formation de la microstructure dans diverses conditions de dépôt pertinentes pour les expériences. Des dépôts de films minces de ZrxCu100-x et AlCoCrCuFeNi sur Si (100) par procédé magnétron de co-pulvérisation ont été étudiés par simulations de dynamique moléculaire utilisant des conditions initiales similaires à celles des expériences. Les résultats montrent que la phase de films minces ZrxCu100-x est déterminée par la composition de l'alliage binaire et par l'énergie cinétique moyenne des atomes incidents. Les alliages AlCoCrCuFeNi simulés possèdent la structure fcc / bcc modulée par la composition, en conformité avec l'expérience. Ils ont une tendance à évoluer vers une solution solide de verres métalliques massifs a été trouvée. Le dépôt par pulvérisation plasma d'atomes de platine sur deux substrats carbonés nanostructurés (carbone poreux et nanotubes de carbone) a également été étudié à température ambiante (300K) et pour deux ensembles de paramètres de potentiels Lennard-Jones et à trois distributions d’énergie cinétique différentes d'atomes Pt incidents sur le substrat. Les résultats des simulations sont en bon accord avec les résultats expérimentaux. Enfin, la simulation numérique des décharges magnétron a été introduite en vue de déterminer les paramètres d'entrée pour les simulations de MD. Les particules chargées sont décrites par le modèle hydrodynamique, en utilisant des expressions classiques des flux. Les caractéristiques du réacteur sont reproduites par les premières simulations. / The objective of this thesis is to study the deposition of thin films by plasma sputtering using moleculardynamics simulations, focusing on the mechanisms of formation of the microstructure in various deposition conditions relevant to experiments. Deposition of thin films AlCoCrCuFeNi and ZrxCu100-x on Si (100) by magnetron sputtering process of co-sputtering have been studied by molecular dynamics simulations using similar experiments to those initial conditions. The results show that the phase ZrxCu100-x thin films is determined by the composition of the binary alloy and the average kinetic energy of the incident atoms. The simulated AlCoCrCuFeNi alloys have fcc / bcc structure modulated by the composition in accordance with experience. They have a tendency to evolve into a solid solution of bulk metallic glasses found. Plasma deposition of platinum atoms spray on two nanostructured carbon substrates (porous carbon and carbon nanotubes) has also been studied at room temperature (300K) and two sets of parameters of Lennard-Jones potential and three distributions of different kinetic energy Pt atoms incident on the substrate. The simulation results are in good agreement with the experimental results. Finally, the numerical simulation of magnetron discharges was introduced to determine the input parameters for the MD simulations. The charged particles are described by the hydrodynamic model, expressions using conventional flow. The characteristics of the reactor are reproduced by the first simulations.

Le but de ce travail est de développer et de caractériser une nouvelle génération de revêtements multicouches anti-usure et anticorrosif à base de nitrure de chrome. A cause des conditions de sollicitations sévères auxquelles les outils de coupe sont soumis en plus des enjeux environnementaux liés à l’utilisation des fluides de coupe lors de l’usinage du bois, les monocouches qui constituent notre système multicouches doivent présenter des caractéristiques spécifiques. De ce fait, des couches minces de Cr, CrN et CrAlN ont été déposées sur un acier à outils de coupe du bois et sur des substrats de siliciums par pulvérisation magnétron réactive DC. Nous nous sommes intéressés dans un premier temps à optimiser les monocouches. Ensuite, ces revêtements ont été associés pour élaborer des multicouches Cr/CrN/CrAlN qui ont alors été caractérisées. Nous avons étudié les propriétés physico-chimiques, mécaniques, tribologiques et le comportement à la corrosion de différents revêtements multicouches. Les résultats obtenus indiquent que l’application d’un revêtement multicouches pouvait apporter des améliorations considérables à la résistance à l’usure et à la corrosion des outils de coupe du bois. / The aim of this study was to develop and characterize a new generation of wear and corrosion resistant multilayers Cr-N based coatings. Due to the severe conditions that wood cutting tools are subjected in addition to the environmental issue associated with the use of cutting fluids during wood machining, the monolayers that constitute our multilayers system must have specific characteristics. As a result, thin layers of Cr, CrN and CrAlN have been deposited on wood cutting tools steel and silicon substrates by DC reactive magnetron sputtering to be optimized. Then, the optimal monolayerscoatings were combined to develop the Cr/CrN/CrAlN multilayers. that were characterized to determine their physicochemical, mechanical, tribological properties and their corrosion behavior. The results obtained indicated that the application of a multilayer coating can greatly improve the wear and corrosion resistance of a wood cutting tools steel.

De nombreuses applications industrielles nécessitent le dépôt de films métalliques à la surface de polymères afin de conférer une fonction de conduction électrique à ces matériaux isolants. Cette étude a été motivée par la volonté de la société Radiall, dont une partie de l’activité concerne la réalisation de connecteurs à haute performance, de remplacer le procédé de métallisation par voie humide par un procédé de dépôt par voie sèche plasma. Le travail présenté ici porte ainsi sur l’étude du procédé de pulvérisation cathodique magnétron avec ionisation de la vapeur par plasma radiofréquence (RF-IPVD) pour le dépôt de couches minces de cuivre sur substrats de formes complexes en poly-sulfure de phénylène. Cette thèse regroupe d’une part les résultats concernant la métallisation des connecteurs et d’autre part l’analyse de la phase plasma. La validation du procédé RF-IPVD a comporté plusieurs étapes : i) le développement du traitement du polymère par plasma ICP avant dépôt du film de cuivre afin que l’adhérence satisfasse la norme ISO 2409. ii) la détermination des paramètres d’élaboration permettant d’optimiser la conductivité des films et leur conformité sur les substrats 3D. Ces travaux se sont concrétisés par la définition d’un réacteur pilote dans l’optique de réaliser la transposition à l’échelle industrielle du procédé RF-IPVD. Plusieurs études à caractère fondamental ont également été menées afin, d’une part, de comprendre les mécanismes régissant l’adhérence (analyses XPS) et ceux régissant la résistivité (analyses DRX). D’autre part, l’utilisation de divers diagnostics de la phase plasma ont été employés afin de comprendre les mécanismes de transfert d’énergie prenant place dans le milieu gazeux et responsables des propriétés des dépôts. / Many industrial applications require the deposition of metal thin films on polymer surfaces in order to confer electrical conductive function to these insulating materials. This study was motivated by the will of Radiall company, which is a high performance connectors maker, to substitute the chemical bath metallization process by a plasma deposition process. The present work focuses on the study of a magnetron sputtering process with ionization of the mettalic vapor plasma (RF-IPVD) for depositing thin copper films on complex shapes poly-phenylene sulfide substrates. This thesis shows the results for the connectors metallization and also the analysis of the plasma. RF-IPVD process validation involves several steps: i) the development of polymer treatment by ICP plasma before depositing copper films in order to meet ISO 2409 adhesion standard. ii) determining the processing parameters to optimize the conductivity of the films and their compliance on the 3D substrates. The industrial part has been concluded by the definition of a prototype reactor with a view to achieve the implementation of the RF-IPVD process on an industrial scale. Several fundamental studies have been performed to understand the mechanisms governing the adhesion (XPS analysis) and those governing the resistivity (XRD analysis). Moreover, the use of various plasma diagnostics were used to understand the energy transfer mechanisms taking place in the gaseous medium and responsible of the films properties.