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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
21

In-situ and post-growth investigation of low temperature Group III-nitride thin films deposited via MOCVD /

Johnson, Michael Christopher. January 2001 (has links)
Thesis (Ph. D.)--University of Washington, 2001. / Vita. Includes bibliographical references (leaves 168-180).
22

Characterisation of step coverage by pulsed-pressure metalorganic chemical vapour deposition : titanium dioxide thin films on 3-D micro- and nano-scale structures : a thesis submitted in partial fulfilment of the requirements for the degree of Doctor of Philosophy in Mechanical Engineering at the University of Canterbury, Christchurch, New Zealand /

Siriwongrungson, Vilailuck. January 2010 (has links)
Thesis (Ph. D.)--University of Canterbury, 2010. / Typescript (photocopy). Includes bibliographical references (p. 196-206). Also available via the World Wide Web.
23

Microstructural investigation of defects in epitaxial GaAs grown on mismatched Ge and SiGe/Si substrates

Boeckl John J., January 2005 (has links)
Thesis (Ph. D.)--Ohio State University, 2005. / Title from first page of PDF file. Document formatted into pages; contains xxii, 212 p.; also includes graphics. Includes bibliographical references (p. 203-212). Available online via OhioLINK's ETD Center
24

Study of the early stages of growth and epitaxy of GaN thin films on sapphire

Trifan, Eugen Mihai. January 2003 (has links)
Thesis (Ph.D.)--Ohio University, August, 2003. / Title from PDF t.p. Includes bibliographical references (leaves 188-194)
25

MOCVD growth and characterization of al-rich ALN/ALGAN epilayers and quantum wells

Al Tahtamouni, Talal Mohammed Ahmad January 1900 (has links)
Doctor of Philosophy / Department of Physics / Hongxing Jiang / The correlation between polarity and material quality of un-doped Al[0.81subscript]Ga[0.19subscript]N was studied. The overall material quality is significantly influenced by the growth polarity. The epilayers with aluminum-polarity have a much higher crystalline quality and better surface morphology than those of nitrogen-polarity. Nitrogen-polar growth more readily incorporates unintentional impurities. A-plane AlN epilayers have been grown on r-plane sapphire substrates. The orientation and high crystalline quality were confirmed by x-ray diffraction (XRD) [Theta]-2[Theta] scan exhibiting a reflection peak at 2[Theta] = 59.4[0superscript] and rocking curve of the (110) reflection having a line width of 940 arcsec. Room temperature photoluminescence (PL) spectroscopy showed that the surface emission intensity of a-plane AlN epilayers is comparable to that of c-plane AlN. PL spectra of Mg-doped a- and c-plane AlN revealed that the Mg level in both a- and c-plane AlN is identical and is about ~ 0.5 eV. Identically designed a-plane and c-plane AlN/A1[0.65subscript]Ga[0.35subscript]N QWs have been grown on a-and c-plane AlN/Al[2subscript]O[3subscript] templates respectively, and their PL emission properties were studied. Low temperature PL characteristics of a-plane QWs are primarily governed by the quantum size effect, whereas those of c-plane QWs are significantly affected by the polarization fields. The growth of AlN epilayers on SiC substrates was investigated. A smooth, crack free AlN epilayer with high optical and crystalline quality was achieved. Because of its high quality, AlN was used as active layer in a hybrid Schottky photodetector. Highly conductive Si-doped Al[subscript0.75]Ga[0.25subscript]N alloys were grown on AlN/SiC templates. The effects of using Indium as a surfactant during the growth of Si-doped Al[0.75subscript]Ga[0.25subscript]N epilayers at relatively high temperature 1050 [degrees]C were studied. Indium significantly increases the doping efficiency as shown by RT Hall measurements. RT PL measurements show a clear correlation between emission intensity of the defect related transition and indium flow rate. P-type conductivity has been obtained in beryllium doped GaN by MOCVD. The activation energy of the beryllium acceptor was estimated to be 118 [plus or minus] 4 meV, which is about 40 meV less than the activation energy of the Mg acceptor in GaN.
26

Atmospheric pressure metal-organic vapour phase epitaxial growth of InAs/GaSb strained layer superlattices

Miya, Senzo Simo January 2013 (has links)
The importance of infrared (IR) technology (for detection in the 3-5 μm and 8-14 μm atmospheric windows) has spread from military applications to civilian applications since World War II. The commercial IR detector market in these wavelength ranges is dominated by mercury cadmium telluride (MCT) alloys. The use of these alloys has, however, been faced with technological difficulties. One of the materials that have been tipped to be suitable to replace MCT is InAs/InxGa1-xSb strained layer superlattices (SLS’s). Atmospheric pressure metal-organic vapour phase epitaxy (MOVPE) has been used to grow InAs/GaSb strained layer superlattices (SLS’s) at 510 °C in this study. This is a starting point towards the development of MOVPE InAs/InxGa1-xSb SLS’s using the same system. Before the SLS’s could be attempted, the growth parameters for GaSb were optimised. Growth parameters for InAs were taken from reports on previous studies conducted using the same reactor. Initially, trimethylgallium, a source that has been used extensively in the same growth system for the growth of GaSb and InxGa1-xSb was intended to be used for gallium species. The high growth rates yielded by this source were too large for the growth of SLS structures, however. Thus, triethylgallium (rarely used for atmospheric pressure MOVPE) was utilized. GaSb layers (between 1 and 2 μm thick) were grown at two different temperatures (550 °C and 510 °C) with a varying V/III ratio. A V/III ratio of 1.5 was found to be optimal at 550 °C. However, the low incorporation efficiency of indium into GaSb at this temperature was inadequate to obtain InxGa1-xSb with an indium mole fraction (x) of around 0.3, which had previously been reported to be optimal for the performance of InAs/InxGa1-xSb SLS’s, due to the maximum splitting of the valence mini bands for this composition. The growth temperature was thus lowered to 510 °C. This resulted in an increase in the optimum V/III ratio to 1.75 for GaSb and yielded much higher incorporation efficiencies of indium in InxGa1-xSb. However, this lower growth temperature also produced poorer surface morphologies for both the binary and ternary layers, due to the reduced surface diffusion of the adsorbed species. An interface control study during the growth of InAs/GaSb SLS’s was subsequently conducted, by investigating the influence of different gas switching sequences on the interface type and quality. It was noted that the growth of SLS’s without any growth interruptions at the interfaces leads to tensile strained SLS’s (GaAs-like interfaces) with a rather large lattice mismatch. A 5 second flow of TMSb over the InAs surface and a flow of H2 over GaSb surface yielded compressively strained SLS’s. Flowing TMIn for 1 second and following by a flow of TMSb for 4 seconds over the GaSb surface, while flowing H2 for 5 seconds over the InAs surface, resulted in SLS’s with GaAs-like interfacial layers and a reduced lattice mismatch. Temperature gradients across the surface of the susceptor led to SLS’s with different structural quality. High resolution x-ray diffraction (HRXRD) was used to determine the thicknesses as well as the type of interfacial layers. The physical parameters of the SLS’s obtained from simulating the HRXRD spectra were comparable to the parameters obtained from cross sectional transmission electron microscopy (XTEM) images. The thicknesses of the layers and the interface type played a major role in determining the cut-off wavelength of the SLS’s.
27

Optoelectronic Properties of Wide Band Gap Semiconductors

Saadatkia, Pooneh 06 August 2019 (has links)
No description available.
28

The Growth and Characterization of Gallium Arsenide Nanowire Structures by Metal Organic Chemical Vapor Deposition

Minutillo, Nicholas G. January 2014 (has links)
No description available.
29

Photoluminescence and kinetic of MOCVD grown P-type GaAs:Nd and Nd-implanted semi-insulating GaAs

Saha, Uttam Kumar January 1996 (has links)
No description available.
30

Technology development and study of rapid thermal CVD high-K gate dielectrics and CVD metal gate electrode for future ULSI MOSFET device integration zirconium oxide, and hafnium oxide /

Lee, Choong-ho. January 2003 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.

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