Thesis (Ph. D.)--University of Missouri-Columbia, 1999. / Typescript. Vita. Includes bibliographical references (leaves 147-152). Also available on the Internet.

Monte Carlo modelling is a common technique in numerous fields, and is widely used in semiconductor device simulation. This thesis describes the application of Monte Carlo modelling to the simulation of Gunn diode devices, focusing on devices composed of Gallium Arsenide (GaAs) and Gallium Nitride (GaN). Gunn diodes are simple structures that take advantage of negative differential resistance to act as a source of high frequency radiation, from 10 GHz to over 100 GHz in GaAs devices. It has been theorised that GaN should exhibit negative differential resistance and a GaN Gunn diode could produce radiation of even higher frequency, within the terahertz band. Gunn diodes have the advantage of being cheap and portable, and so are worth exploring as such a source. Unfortunately, GaN devices have a high electron density and so they tend to generate heat quickly. It therefore becomes important to include modelling of heat generation and flow in simulations of these devices. This is uncommon in Monte Carlo models of Gunn diodes, as in less highly doped devices thermal effects can usually be assumed to result in the device reaching an equilibrium temperature of about 100 K above the ambient. This thesis describes the creation of a model to track the generation and distribution of heat during operation of a GaN device. Simulations found that thermal effects within the device were significant. Heat generation occurred to the extent that the device could only be operated in pulsed mode, with on pulses of 2 ns requiring 50 ns of cooling for sustainable operation. The increased temperature within the device also lead to deleterious changes in the Gunn diode's operating frequency. In the simulated device, a 150 K change in temperature lead to a decrease in operating frequency of 40 GHz, from an initial frequency of 280 GHz. At the end of 2 ns of operation, the mean temperature within the device had increased by 120 K. The high accidental doping level in GaN also means the use of a doping notch to act as a nucleation point for dipoles within a Gunn diode, a common technique in other materials, becomes less feasible. As an alternative to a notch, a device was simulated incorporating a doping spike to nucleate the dipole. The use of a doping spike is not novel, however its use in GaN has not been previously explored. Simulations found that a fully-depleted p-type doping notch of length 2.1 nm, doped at 1x1024 m-3 would act as a nucleation point for dipole operation. The device was compared to a simulated device incorporating a doping notch of width 0.25 µm doped at 0.5x1023 m-3 and found to operate at a similar frequency and RF efficiency, making it a viable substitute. One limitation of Gunn diodes is that when operated in transit-time mode, the operating frequency is determined by the length of the diode's transit region and so is well-defined and fixed. This means that traditional Gunn diodes are not as useful a source of radiation for spectroscopic applications as might be desirable. Recent experimental results for planar devices have shown a broadening in operation frequency and even multiple frequencies. This thesis explores the hypothesis that such a broadening might be achieved in a vertical structure via the incorporation of an additional notch into the Gunn diode's transit region, effectively incorporating two transit regions into the device. Results showed that this novel device structure did show multiple modes of operation. Under a DC applied voltage, the device showed spontaneous switching behaviour, oscillating between dipole and accumulation layer operation from the second notch. Changes in the frequency of an applied RF voltage would shift the device from operating from the first or second notch, in dipole and accumulation layer mode respectively.

Thesis (Ph. D.)--University of Missouri-Columbia, 1999. / Typescript. Vita. Includes bibliographical references (leaves 147-152). Also available on the Internet.

Thesis (Ph.D.)--McMaster University (Canada), 1989. / Source: Dissertation Abstracts International, Volume: 62-13, Section: A, page: 0000.

Anomalous Hall behavior of HgCdTe refers to a "double cross-over" feature of the Hall coefficient in p-type material, or a peak in the Hall mobility or Hall coefficient in n-type material. A magnetoconductivity tensor approach was utilized to identify presence of two electrons contributing to the conduction as well as transport properties of each electron in the material. The two electron model for the mobility shows that the anomalous Hall behavior results from the competition of two electrons, one in the energy gap graded region near the CdZnTe/HgCdTe interface with large band gap and the other in the bulk of the LPE film with narrow band gap. Hg0.78Cd0.22Te samples grown by LPE on CdZnTe(111B)-oriented substrates were exposed to various doses of thermal neutrons (~1.7 x 1016 - 1.25 x 1017 /cm2) and subsequently annealed at ~220oC for ~24h in Hg saturated vapor to recover damage and reduce the presence of Hg vacancies. Extensive Magnetotransport measurements were performed on these samples. SIMS profile for impurities produced by neutron irradiation was also obtained. The purpose for this study is to investigate the influence of neutron irradiation on this material as a basis for further study on HgCdTe74Se. The result shows that total mobility is observed to decrease with increased neutron dose and can be fitted by including a mobility inverse proportional to neutron dose. Electron introduction rate of thermal neutron is much smaller than that of fission neutrons. Total recovering of the material is suggested to have longer time annealing. Using Kane's model, we also fitted carrier concentration change at low temperature by introducing a donor level with activation energy changing with temperature. Results on Se diffusion in liquid phase epitaxy (LPE) grown HgCdTe epilayers is reported. The LPE Hg0.78Cd0.22Te samples were implanted with Se of 2.0×1014/cm2 at 100keV and annealed at 350-450oC in mercury saturated vapor. Secondary ions mass spectrometry (SIMS) profiles were obtained for each sample. From a Gaussian fit we find that the Se diffusion coefficient DSe is about one to two orders of magnitude smaller than that of arsenic. The as-implanted Se distribution is taken into account in case of small diffusion length in Gaussian fitting. Assuming a Te vacancy based mechanism, the Arrhenius relationship yields an activation energy 1.84eV. Dislocations introduced in HgCdTe materials result in two energy levels, where one is a donor and one is an acceptor. Hydrogenation treatment can effectively neutralize these dislocation defect levels. Both experimental results and theoretical calculation show that the mobility due to dislocation scattering remains constant in the low temperature range (<77K), and increases with temperature between 77K and 150K. Dislocation scattering has little effect on electrical transport properties of HgCdTe with an EPD lower than 107/cm2. Dislocations may have little effect on carrier concentration for semiconductor material with zinc blende structure due to self compensation.