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A Study on Optical Properties of High Color-Rendering Index for Nitride Phosphor Mixture in White-Light LEDsLin, Ying-Jyun 02 July 2009 (has links)
This paper tries to explore the phosphor optical characteristics through reliability tests using white light emitting diodes (WLEDs) with a high color rendering index
(CRI ,Ra¡Ö90). Based on light mixing principles and considering the high CRI, three color-coded powders were mixed separately with silicone into a phosphor, and then
bottomed with blue chips into WLEDs. The three powders were oxide nitride (red), YAG (yellow), and silicate (green).
Two kinds of samples were fabricated ¡V phosphor and emitters similar to commercial products. Both cool-white (CCT=5650~7000K, lumen efficiency¡Ö60 lum/w.) and
warm-white (CCT=2850~3250K, lumen efficiency¡Ö50 lum/w.) samples passed the Bin Code distribution process and brightness measurement. The results indicate better
lumen efficiency than previously published research.
After the three kinds of mono-colored phosphors were created, .we implemented the reliability test in which three CREE standards were chosen. These standards were (1)
high temperature with high humidity test (60¢J , 90% humidity) in operating and non-operating condition; (2) thermal shock test (-40¢J ~125¢J ); (3) life time test.
The thermal shock test showed the decaying power of intensity for red, yellow, and green phosphors were 11.7%, 17.5%, and 19.3% respectively. These results demonstrate that the red phosphor has the best thermal resistance. However, after the high temperature with high humidity tests, the decaying power of intensity for red,yellow, and green phosphor were 15.7%, 10.1% and 6.4% correspondingly. These results show that the green phosphor has best aqua resistance. In the life time test of
emitters, the decaying power of intensity for the cool-white emitter was 3.2%, while the warm-white emitter showed 4.2%. As such, cool-white emitters were concluded to
have better reliability than warm-white emitters.
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The Effects of Heat Treatments on Zinc Nitride Thin Films and the PN Junction CharacterizationLi, Cheng-Hua 07 September 2009 (has links)
There are many intensive researches for zinc compounds due to their wide band gaps and potential applications in visible and UV optoelectronic technologies. Zinc nitride is a n-type semiconductor material having a direct band gap, and is not widely studied. Previous papers reported that zinc nitride is a n-type semiconductor having low resistivity and high electron mobility. Its band gap varies from 1.23 eV to 3.2 eV depending on the process condition. In this work, we successfully fabricated zinc nitride p-n junction by heat treatment on zinc nitride films. The threshold voltage of p-n junction is about 1 V. The Zinc nitride films were prepared by reactive RF magnetron sputtering. The as-grown zinc nitride thin film is a n-type material. It is found that the film treated at 300¢J for 3 hours can be changed to a p-type material. The zinc nitride has a very low resistance (2.2¡Ñ10-2 £[-cm) and high carrier concentration (3.88¡Ñ1019 cm-3) after the heat treatment. The optical band gap of zinc nitride was determined as a direct band gap varying from 1.1 eV to 1.6 eV according to the temperature of heat treatment. The zinc nitride was successfully prepared with various electrical characteristics and band gaps by controlling the temperature of heat treatment.
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Growth kinetics of GaN during molecular beam epitaxyZheng, Lianxi. January 2001 (has links)
Thesis (Ph. D.)--University of Hong Kong, 2001. / Includes bibliographical references (leaves 95-100).
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Two-dimensional modeling of aluminum gallium nitride/gallium nitride high electron mobility transistor /Holmes, Kenneth L. January 2002 (has links) (PDF)
Thesis (M.S.)--Naval Postgraduate School, 2002. / Thesis advisor(s): Todd Weatherford, Ronald Pieper. Includes bibliographical references (p. 39-40). Also available online.
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Growth and characterization of group III-nitride power transistors, power rectifiers and solar-blind detectors by metalorganic chemical vapor deposition /Lambert, Damien Jean Henri, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 158-170). Available also in a digital version from Dissertation Abstracts.
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Development of thin film photodetectors and their applications multispectral detection and high speed optical interconnections /Seo, Sang-Woo, January 2003 (has links) (PDF)
Thesis (Ph. D.)--School of Electrical and Computer Engineering, Georgia Institute of Technology, 2004. Directed by Nan M. Jokerst. / Vita. Includes bibliographical references (leaves 156-167).
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Advanced oxynitride and silicon nitride gate dielectrics for ULSI CMOS technology /Song, Seung-chul, January 1999 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 207-219). Available also in a digital version from Dissertation Abstracts.
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Exciton spectroscopy using non-resonant x-ray Raman scattering /Feng, Yejun, January 2003 (has links)
Thesis (Ph. D.)--University of Washington, 2003. / Vita. Includes bibliographical references (leaves 107-119).
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Theory, design, and fabrication of diffractive grating coupler for slab waveguide /Harper, Kevin Randolph, January 2003 (has links) (PDF)
Thesis (M.S.)--Brigham Young University. Dept. of Electrical and Computer Engineering, 2003. / Includes bibliographical references (p. 183-193).
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A study of Mg doping in GaN during molecular beam epitaxy /Pang, Chak-hau. January 2001 (has links)
Thesis (M. Phil.)--University of Hong Kong, 2002. / Includes bibliographical references (leaves 75-77).
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