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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Analýza produktů elektrického výboje ve směsích vody a etanolu / Product analysis of electrical discharge in mixtures of water and ethanol

Lokajová, Aneta January 2019 (has links)
The thesis is focused on electrical discharge in liquid solutions, in particular in ethanol solutions. In the theoretical section, the plasma is defined along with its important parameters, types of plasma generation and usage of plasma technologies. Main part is focused on the discharges in water solutions. Electric discharges in liquid solutions enable physical processes (shock waves, UV radiaton, electric current) as well as chemical ones (generation of radicals and ions). Both types of the processes are used in many fields – medicine (tool sterilization, destruction of pathogens), consumer technologies (surface adjustemen, processing of the textiles, surface clearing) of environmental protection (clearing water, decomposition of organic compounds). Goal of the thesis was to analyze discharge products on ethanol solution. Multiple samples were measured and concentration od selected products was monitored during the measurement – ethanol, acetone and acetaldehyde. PTR-TOF-MS method was used to collect and analyze the data. This method is well used thanks to quick response and immediate measurement. It produce the reset accurate enough for our purpose. It would be more efficient to use this method in combination with another analytical metohod in the future research, e.g. gas chromatography.
2

Contamination des wafers et de l'atmosphère des salles blanches de la micro-électronique : développement analytique et étude in-situ / Contamination of wafers and the atmosphere of microelectronic clean rooms : analytical development and field study

Hayeck, Nathalie 10 September 2015 (has links)
La miniaturisation et la complexification croissante des composants microélectroniques induit une sensibilisation et une fragilisation accrue des composants vis-à-vis des contaminations présentes dans les zones de productions appelées “salles blanches”. Dans ces espaces, le contrôle actuel de la contamination organique n’est pas suffisant puisqu’il ne permet pas d’éviter la contamination de surface des plaquettes de silicium et des optiques des robots de production utilisés pour la photolithographie. Un contrôle accru des concentrations des contaminants organiques dans les atmosphères des salles blanches devient donc nécessaire et de nouvelles méthodes analytiques doivent être développées et validées. Dans le cadre de ce travail, des méthodes d’analyse ont été développées et validées afin de disposer d’une gamme d’outils permettant un suivi rigoureux des contaminations. Ces outils permettent d’identifier et de quantifier les contaminations surfaciques des plaquettes de silicium par des composés organiques semi-volatils (phtalates et organophosphorés) mais aussi de déterminer les concentrations de composés organiques volatils présents dans l’atmosphère des salles blanches. Ces méthodes font appel aux technologies du WOS/ATD-GC-MS « Wafer Outgassing System/Automated Thermal Desorber–Gas Chromatography–Mass Spectrometry » et de la DART-ToF-MS « Direct Analysis in Real Time-Time of Flight–Mass Spectrometry » pour les analyses de surfaces et au PTR-ToF-MS « Proton Transfer Reaction – Time of Flight - Mass Spectrometry » pour l’analyse de l’atmosphère. / The recent advances in the miniaturization and complexification of microelectronic components induce an increase in the sensitivity of these components regarding the organic contamination present in the production zone called “clean room”. Although, the control of organic contamination in the clean room is very rigorous it does not avoid the contamination of silicon wafer surfaces and robot lenses used in the photolithography process. The later implies that new analytical methodologies should be developed and validated. In this work, analytical methods were developed and validated in order to have a panel of tools which allows careful monitoring of organic contaminants. These tools allow the identification and quantitation of the contamination of silicon wafer surface by semi-volatiles organic compounds (phthalates and organophosphates) and the determination of volatile organic compounds concentrations in the clean room atmosphere. These methods uses the WOS/ATD-GC-MS « Wafer Outgassing System/Automated Thermal Desorber–Gas Chromatography–Mass Spectrometry » technology and the DART-ToF-MS « Direct Analysis in Real Time-Time of Flight–Mass Spectrometry » technology for wafer surface analysis and the PTR-ToF-MS « Proton Transfer Reaction – Time of Flight - Mass Spectrometry » technology for gas-phase analysis.

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