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The Global ETD Search service is a free service for researchers
to find electronic theses and dissertations. This service is
provided by the
Networked Digital Library of Theses and Dissertations.
Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
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Showing 21 to 30 of 70 (0.034 seconds)Spelling suggestions: "subject:"photoresists"" "subject:"photorésists""
| 21 |
Determining spectral sensitivity of Kodak micro positive resist 820 /Huck, Matthew L. January 1983 (has links)
Thesis (B.S.)--Rochester Institute of Technology, 1983. / Typescript. Includes bibliographical references (leaves 40-42).
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| 22 |
The ability of surfactants to assist in the removal of image scum in positive resist development /Belden, Michael P. January 1982 (has links)
Thesis (B.S.)--Rochester Institute of Technology, 1982. / Typescript. Includes bibliographical references (leaf 19).
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| 23 |
Direct diffusion resist for gravure /Hurst, Wilson. January 1982 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1982. / Typescript. Includes bibliographical references (leaf 58).
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| 24 |
Determination of the existence or non-existence of low-intensity reciprocity law failure in Kodak micro positive resist 809 /Middel, Jutta C. January 1984 (has links)
Thesis (B.S.)--Rochester Institute of Technology, 1984. / Typescript. Includes bibliographical references (leaves 29-30).
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| 25 |
Exploration of non-chemically amplified resists based on dissolution inhibitors for 193 nm lithography /Baylav, Burak. January 2010 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 2010. / Typescript. Includes bibliographical references (leaves 45-47).
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| 26 |
Polymers and photoactive compounds for non-chemically amplified deep-UV photoresists /McAdams, Christopher Lee, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 173-177). Available also in a digital version from Dissertation Abstracts.
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| 27 |
Design and study of advanced photoresist materials : positive tone photoresists with reduced environmental impact and materials for 157 nm lithography /Yamada, Shintaro, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 266-276). Available also in a digital version from Dissertation Abstracts.
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| 28 |
Advances in photoresist characterization and lithography simulation /Henderson, Clifford Lee, January 1998 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1998. / Vita. Includes bibliographical references (leaves 306-313). Available also in a digital version from Dissertation Abstracts.
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| 29 |
Vacuum ultraviolet photochemistry and fourier transform infrared spectroscopy of soft x-ray photoresistsBohn, Paul William. January 1981 (has links)
Thesis (Ph. D.)--University of Wisconsin--Madison, 1981. / Typescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 206-222).
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| 30 |
Advanced lithographic patterning technologies materials and processes /Taylor, James Christopher, January 1900 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2007. / Vita. Includes bibliographical references.
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