Global ETD Search

11	The effect of target temperature on the erosion ratio of ionically bombarded fused silica Sanger, Gregory M. January 1970 (has links) No description available. Glass grinding and polishing.
12	Properties and applications of generalized ray tracing Parker, Steven Craig, 1944- January 1971 (has links) No description available. Lenses. Grinding and polishing.
13	Comparative grinding rates of optical glasses Weinswig, Shepard Arnold, 1936- January 1974 (has links) No description available. Glass grinding and polishing.
14	High Frequency Electrochemical Nanopolishing of Alpha Titanium Kanchwala, Abbas M 16 December 2013 (has links) Product miniaturization is an ever increasing customer demand in aerospace, bio-medical, defense and electronics industries. These microparts play a vital role and are required to abide by stringent norms set forth by various quality control agencies. To maintain their functionality over a period of time, they are made of special engineering materials rather than silicon as commonly used in microelectronics. Lithography, etching, embossing, electroplating, laser machining and other micro manufacturing techniques have been employed traditionally to manufacture microcomponents; however, these techniques would be expensive, cause surface damage, or produce a very rough surface. Electrochemical polishing is capable of machining/polishing any conducting material while holding close dimensional tolerances. This research develops a high frequency electrochemical nanopolishing technique for commercially pure alpha titanium. An alcohol and salt based electrolyte was used with direct current as well as alternating current on alpha titanium plate. For both current types, optimal surface roughness R_(a) ~ 300 nm was obtained on poly grained surface using interferometry and ~ 2 nm within a single grain by atomic force microscopy. Comparable results were obtained by other researchers with 30-120 nm R_(a) for titanium and titanium alloys. Linear regression models were developed to predict the surface roughness. The surface roughness predicted by the models was found to be within 26% of the measured values. Electrochemical polishing medical implants
15	Degradation of polymers in chemical mechanical polishing Agarwal, Reena 08 1900 (has links) No description available. Microelectronics Materials Grinding and polishing
16	Interface mechanics of chemical mechanical polishing for integrated circuit planarization Levert, Joseph Albert 12 1900 (has links) No description available. Microelectronics Materials Grinding and polishing
17	Wear model for chemo-mechanical polishing of single crystal silicon Mess, Francis McCarthy 05 1900 (has links) No description available. Silicon Grinding and polishing
18	Subsurface damage in the abrasive machining of titanium aluminide (gamma) Nelson, Luis Manuel 12 1900 (has links) No description available. Grinding and polishing Metals Surfaces
19	A finite element simulation of thermal profiles in grinding of titanium aluminide Rayner, Joshua Lee 08 1900 (has links) No description available. Grinding and polishing Alloys Metals
20	Experimental validation of an atomization model for fluids used in the grinding process Pena-Diaz, Hernan R. 12 1900 (has links) No description available. Grinding and polishing Grinding machines

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