Metal oxide thin films are dynamic materials that have revolutionised the nature of semiconductor and electronic thin film devices. Recently, progress has stagnated in some aspects due to the increasingly complex deposition apparatus required, and the dearth of suitable precursor complexes of certain ???difficult??? metals. This thesis seeks to address both of these issues. The application of a precursor complex, Mg6(O2CNEt2)12 to the SSCVD of MgO thin films delivered the highest quality films ever reported with this technique. The resultant films were found to be of purely (111) orientation. Due to the nature of the precursor, the chemical reactions occurring at the surface during SSCVD growth result in a high growth rate, low flux environment and films of (111) orientation have been achieved without the amorphous underlayer. This finding has important implications for buffer layers in perovskite thin film devices. The unprecedented precursor chemistry has been used as a basis for the extremely high quality material produced, along with the unusual, yet beneficial structural morphology it possesses. A new range of barium complexes with single encapsulating ligands have been prepared for use in chemical vapour deposition (CVD) of BaTiO3 thin films. A novel pathway to an unprecedented class of barium carbamates is reported, and also new dianionic bis ??-ketoesterates and their barium, strontium, and calcium analogues were synthesised. High resolution mass spectrometry showed the barium bis ??-ketoesterate derivatives to be monomeric, and preliminary testing indicated some volatility in these species. Insights were gained into the likely successful pathways to building a volatile heterobimetallic precursor complex containing an alkaline earth metal. The knowledge of intimate mixing in heterobimetallic precursor complexes was extended by some novel chemistry to develop the first mixed Zn/Mg carbamato cluster complexes. These complexes were found to be excellent SSCVD precursors for ZnxMg1-xO thin films. Thin films were deposited with these precursors and exhibited a single preferred orientation, with a constant amount of magnesium throughout the bulk of the films. Investigation of the light emission properties of the films revealed significant improvements in the structural order commensurate with the incorporation of magnesium, and the formation of the ZnxMg1-xO alloy.

Metal oxide thin films are dynamic materials that have revolutionised the nature of semiconductor and electronic thin film devices. Recently, progress has stagnated in some aspects due to the increasingly complex deposition apparatus required, and the dearth of suitable precursor complexes of certain ???difficult??? metals. This thesis seeks to address both of these issues. The application of a precursor complex, Mg6(O2CNEt2)12 to the SSCVD of MgO thin films delivered the highest quality films ever reported with this technique. The resultant films were found to be of purely (111) orientation. Due to the nature of the precursor, the chemical reactions occurring at the surface during SSCVD growth result in a high growth rate, low flux environment and films of (111) orientation have been achieved without the amorphous underlayer. This finding has important implications for buffer layers in perovskite thin film devices. The unprecedented precursor chemistry has been used as a basis for the extremely high quality material produced, along with the unusual, yet beneficial structural morphology it possesses. A new range of barium complexes with single encapsulating ligands have been prepared for use in chemical vapour deposition (CVD) of BaTiO3 thin films. A novel pathway to an unprecedented class of barium carbamates is reported, and also new dianionic bis ??-ketoesterates and their barium, strontium, and calcium analogues were synthesised. High resolution mass spectrometry showed the barium bis ??-ketoesterate derivatives to be monomeric, and preliminary testing indicated some volatility in these species. Insights were gained into the likely successful pathways to building a volatile heterobimetallic precursor complex containing an alkaline earth metal. The knowledge of intimate mixing in heterobimetallic precursor complexes was extended by some novel chemistry to develop the first mixed Zn/Mg carbamato cluster complexes. These complexes were found to be excellent SSCVD precursors for ZnxMg1-xO thin films. Thin films were deposited with these precursors and exhibited a single preferred orientation, with a constant amount of magnesium throughout the bulk of the films. Investigation of the light emission properties of the films revealed significant improvements in the structural order commensurate with the incorporation of magnesium, and the formation of the ZnxMg1-xO alloy.

Metal oxide thin films are dynamic materials that have revolutionised the nature of semiconductor and electronic thin film devices. Recently, progress has stagnated in some aspects due to the increasingly complex deposition apparatus required, and the dearth of suitable precursor complexes of certain ???difficult??? metals. This thesis seeks to address both of these issues. The application of a precursor complex, Mg6(O2CNEt2)12 to the SSCVD of MgO thin films delivered the highest quality films ever reported with this technique. The resultant films were found to be of purely (111) orientation. Due to the nature of the precursor, the chemical reactions occurring at the surface during SSCVD growth result in a high growth rate, low flux environment and films of (111) orientation have been achieved without the amorphous underlayer. This finding has important implications for buffer layers in perovskite thin film devices. The unprecedented precursor chemistry has been used as a basis for the extremely high quality material produced, along with the unusual, yet beneficial structural morphology it possesses. A new range of barium complexes with single encapsulating ligands have been prepared for use in chemical vapour deposition (CVD) of BaTiO3 thin films. A novel pathway to an unprecedented class of barium carbamates is reported, and also new dianionic bis ??-ketoesterates and their barium, strontium, and calcium analogues were synthesised. High resolution mass spectrometry showed the barium bis ??-ketoesterate derivatives to be monomeric, and preliminary testing indicated some volatility in these species. Insights were gained into the likely successful pathways to building a volatile heterobimetallic precursor complex containing an alkaline earth metal. The knowledge of intimate mixing in heterobimetallic precursor complexes was extended by some novel chemistry to develop the first mixed Zn/Mg carbamato cluster complexes. These complexes were found to be excellent SSCVD precursors for ZnxMg1-xO thin films. Thin films were deposited with these precursors and exhibited a single preferred orientation, with a constant amount of magnesium throughout the bulk of the films. Investigation of the light emission properties of the films revealed significant improvements in the structural order commensurate with the incorporation of magnesium, and the formation of the ZnxMg1-xO alloy.

Present day data processing technology requires very high speed signal processing and data conversion rates. Traditionally, these circuits have been implemented in silicon MOS technology, whose high speed performance is limited, due to inherent material properties. Though relatively immature compared to silicon technology, GaAs integrated circuit technology appears to be a potential vehicle for realizing high-speed circuits because of its high electron mobility and low parasitic capacitance. One major drawback of GaAs technology has been the lack of complementary technology in contrast to silicon where CMOS technology has greatly facilitated the development of analog ICs. This thesis investigates the suitability of complementary GaAs Heterojunction FET integrated circuit technology for the realization of high sample-rate switched-capacitor circuits. In order to yield an accurate device model for the design work, model parameters of both n and p GaAs Heterojunction FET devices are extracted from measurement results. Based on the extraction results, a set of analog building blocks are presented. These circuits include a high bandwidth operational amplifier and a fast settling switch which are essential for high sample-rate circuits. A second order switched-capacitor low pass filter sampling at a clock rate of 100MHz is designed using the above building blocks. The designs studied predict better high frequency performance for C-HFETs compared to Si CMOS technology. / Graduation date: 1994

The creation of large-scale simulation models is a difficult and time-consuming task. Yet simulation is one of the techniques most frequently used by practitioners in Operations Research and Industrial Engineering, as it is less limited by modeling assumptions than many analytical methods. The effective generation of simulation models is an important challenge. Due to the rapid increase in computing power, it is possible to simulate significantly larger systems than in the past. However, the verification and validation of these large-scale simulations is typically a very challenging task. This thesis introduces a simulation framework that can generate a large variety of manufacturing simulation models. These models have to be described with a simulation data specification. This specification is then used to generate a simulation model which is described as a Petri net. This approach reduces the effort of model verification. The proposed Petri net data structure has extensions for time and token priorities. Since it builds on existing theory for classical Petri nets, it is possible to make certain assertions about the behavior of the generated simulation model. The elements of the proposed framework and the simulation execution mechanism are described in detail. Measures of complexity for simulation models that are built with the framework are also developed. The applicability of the framework to real-world systems is demonstrated by means of a semiconductor manufacturing system simulation model.

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The semiconductor industry is highly competitive environment where modest improvements in the manufacturing process can translate to significant cost savings. An area where improvements can be realized is reducing the number of wafers that fail to meet their electrical specifications. Wafers that fail to meet electrical specifications are scrapped, which negatively impacts yield and increases manufacturing costs. Most of the existing semiconductor process control research has focused on controlling individual steps during the manufacturing process via run-to-run control, but almost no work has looked at directly controlling device electrical characteristics. Since meeting electrical specifications is so critical to reducing scrap a fab-wide electrical parameter control scheme is proposed to directly control electrical parameter values. The goal of the controller is reducing the variation in the electrical parameters. The control algorithm uses a model to predict electrical parameter values after each processing step. Based on this prediction the decision to make a control move is made. If a control move is necessary, optimal adjustments for the subsequent processing steps are determined. The process model is continually updated so that it reflects the current process. A simple implementation using a least squares model is first proposed. Simulations and an industrial case study demonstrate the potential improvements that can be achieved with the algorithm and the limitations of the simple implementation are discussed. A partial least squares modeling and control algorithm combined with missing data algorithms are proposed as enhancements to the electrical parameter control algorithm to address many of the issues faced when implementing such a control strategy in real manufacturing environments. The enhancements take the input variable correlations into account when making control moves and utilize the correlation structure to make better model predictions. Simulations are performed to determine the effectiveness of the enhancements. A cost function formulation and a Bayesian based alternative are also presented and evaluated. The cost function implementation uses a different method to determine the optimal set points for the subsequent processing steps than the other implementations use. Simulations are used to compare the cost function formulation with the other methods presented. The Bayesian implementation addresses the stochastic nature of the manufacturing process by dealing with the probabilities of events occurring. A simulation of the Bayesian algorithm is preformed and the algorithms limitations are discussed.

published_or_final_version / abstract / toc / Electrical and Electronic Engineering / Master / Master of Philosophy

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