In this thesis, the structural, optical and electrical properties of crystalline silicon quantum dots (SiQDs) are examined for application to silicon based tandem cells. The approach has been to concentrate on all silicon devices by taking advantage of quantum confinement in low-dimensional Si. RF magnetron co-sputtering provided the capability of creating superlattice structures in conjunction with high temperature annealing, to form Si nanocrystals in an oxide matrix. Structural techniques, including Fourier transform infrared spectroscopy (FTIR), micro-Raman spectroscopy, transmission electron microscopy (TEM), X-ray diffraction (XRD), and Secondary ion mass spectroscopy (SIM) were employed to gather structural information about the SiQD/SiO2 SLs. The result combine presents that the packing density of Si QDs, correlated to the oxygen content of the silicon rich oxide layer can be control independently. The effect of Si nanocrystallite density on Raman scattering is investigated. The preliminary results present that a decrease in the oxygen content (x) results in an increased sharpness of the Strokes-mode peak of nanocrystalline Si, attributed to an increase in the proportion of crystalline Si because of the increased number of SiQDs. However the influence of the surface region on the crystallite core intensity scattering becomes dominant, when SiQD size diameter is very small (less than 3 nm). The present work shows that a decrease in x-content leading to an increase of the SiQD concentration, initially results in the enhancement of the lateral conductivity in the SiQD superlattice material. In this work, the Al contacting scheme, using a prolonged heat treatment technique at elevated temperature less than the eutectic point of Al and Si (577C) has been successfully applied to making Ohmic contacts on both SiQD SLs in oxide and nitride matrices. Activation energy (Ea) of SiQDs, extracted from a linear Arrhenius plot is investigated in the present work in order to expand the understanding of engineering electrical injection in laterally active paths. It is found that a lower barrier height of dielectric matrix influences to the lateral electron transport of the SiQDs in such dielectric matrix. PL results confirm that the band gap of surface oxidized SiQDs widens due to quantum confinement. The present results reveal that the strong peak (Q-peak) due to quantum confinement is more effective in the emission with increasing SiQD concentration. The surface oxide is believed to play an important role in the reduction of SiQD luminescence due to a trapped exiciton. It is concluded that SiQDs surface oxide accompanied by a SiO2 matrix may not provide a good passivation in very small SiQD size. However the energy band gap and conductivity of the SiQDs are tunablity, in the optimum range of SiQD size and concentration. This observation may be important for future nanoelectronics applications.

Titanium dioxide (TiO2) thin films have a long history in silicon photovoltaics (PV) as antireflection (AR) coatings due to their excellent optical properties and low deposition cost. This work explores several novel areas where TiO2 thin films could be use to enhance silicon (Si) solar cell performance while reducing device fabrication costs. Amorphous, anatase and rutile TiO2 thin films are deposited using ultrasonic spraydeposition (USD) and chemical vapour deposition (CVD) systems, both designed and constructed by the author. Initial experiments confirmed that no degradation in the bulk minority carrier lifetime (????bulk) occurred during high-temperature processing, although the stability of the USD-deposited TiO2 films was dependent on the furnace ambient. A major disadvantage of TiO2 AR coatings is that they afford little surface passivation. In this work, a novel method of achieving excellent surface passivation on TiO2-coated silicon wafers is presented. This involved growing a 6 nm-thick SiO2 layer at the TiO2:Si interface by oxidising the wafer after TiO2 film deposition. The increase in surface passivation afforded by the interfacial SiO2 layer results in a decrease in the emitter dark saturation current density (J0e) by nearly two orders of magnitude to 4.7 ??? 7.7 ??~ 10???14 A/cm2. This demonstrates the compatibility of the TiO2/SiO2 stack with high-efficiency solar cells designs. By varying the film deposition and annealing conditions, TiO2 refractive indices in the range of 1.726 ??? 2.633 (at ???? = 600 nm) could be achieved. Subsequently, a double-layer antireflection (DLAR) coating was designed comprised of low and high TiO2 refractive index material. The best experimental weighted average reflectance (Rw) achieved was 6.5% on a planar silicon wafer in air. TiO2 DLAR coatings are ideally suited to multicrystalline silicon (mc-Si) wafers, which do not respond well to chemical texturing. Modelling performed for a glass and ethyl vinyl acetate (EVA) encapsulated buried-contact solar cell indicated that a TiO2 DLAR coating afforded a 7% increase in the short circuit current density, when compared to a standard, commercially-deposited TiO2 single-layer AR coating. Finally, it is demonstrated that chemical reactions with phosphorus prevent TiO2 from acting as a successful phosphorus diffusion barrier or dopant source. The applicability of TiO2 thin films to various silicon solar cell structures is discussed.

This thesis undertakes the development, characterization and optimization of boron diffusion for silicon solar cells. Heavy diffusions (sheet resistance < 40 Ohm/square) to form a back surface field, and light diffusions (sheet resistance > 100 Ohm/square) to form oxide-passivated emitters were developed. Test structures and solar cells were fabricated to assess uniformity, lifetime and recombination effects due to the light and heavy boron diffusions. It was found that the growth of a thin ~200 ??, thermal oxide, during stabilization ??? immediately prior to the boron diffusion - was required to maintain high lifetime and reduce surface recombination (reducing the emitter saturation current density) for all boron diffusions. The heavy boron diffusion process was incorporated into the single side buried contact solar cell processing sequence. The solar cells fabricated had both boron diffused and Al/Si alloyed P+ regions for comparison. This research conclusively showed that boron diffused solar cells had significantly higher open circuit voltage compared to Al/Si alloyed devices. Fabrication of n-type solar cells, and their subsequent characterization by overlayed secondary electron image and the electron beam induced current map showed that the Al/Si alloy varied in depth from 5 to 25 micrometers deep. Methodology and characterization for light, oxide-passivated boron diffusions are also presented. This study yielded boron diffused emitters (sheet resistance > 100 Ohm/square) with low emitter saturation current. It was observed that this was possible only when the thermal oxidation after the boron diffusion was minimal, less than 1,000 ??. This was due to the segregation effect of boron with oxide, decreasing the surface concentration that in turn decreased the electric field repulsion of electrons from the surface. Device modelling of n-type solar cells is presented where the parameters of the modelling include the results of the light, oxide-passivated boron diffusions. This modelling shows n-type-base material with light oxide-passivated boron diffusion has higher potential conversion efficiency than forming a solar cell from phosphorous diffused p-type material.

Thesis (M.S.)--Oregon State University, 2008. / Printout. Includes bibliographical references (leaves 124-133). Also available on the World Wide Web.

Thesis (Ph. D.)--Ohio University, June, 1997. / Title from PDF t.p.

Thesis (M.S.)--University of Texas at El Paso, 2008. / Title from title screen. Vita. CD-ROM. Includes bibliographical references. Also available online.

Thesis (M.S.)--University of Delaware, 2008. / Principal faculty advisor: Robert W. Birkmire, Dept. of Materials Science & Engineering. Includes bibliographical references.

Thesis (Ph. D. in Chemical Engineering)--Vanderbilt University, May 2006. / Title from title screen. Includes bibliographical references.

Thesis (M.S. in Physics)--Naval Postgraduate School, December 2008. / Thesis Advisor(s): Haegel, Nancy M. "December 2008." Description based on title screen as viewed on February 5, 2009. Includes bibliographical references (p. 89-91). Also available in print.

Thesis (Ph.D.)--University of Delaware, 2008. / Adviser: Robert Birkmire. Includes bibliographical references.