Simulation techniques are developed for high NA polarized microscopy with Babinet's principle, partial coherence and vector diffraction for non-periodic geometries. A mathematical model for the Babinet approach is developed and interpreted. Simulation results of the Babinet's principle approach are compared with those of Rigorous Coupled Wave Theory (RCWT) for periodic structures to investigate the accuracy of this approach and its limitations.A microscope system using a special solid immersion lens (SIL) is introduced to image Blu-Ray (BD) optical disc samples without removing the protective cover layer.Aberration caused by the cover layer is minimized with a truncated SIL. Sub-surface imaging simulation is achieved by RCWT, partial coherence, vector diffraction and Babinet's Principle. Simulated results are compared with experimental images and atomic force microscopy (AFM) measurement.A technique for obtaining native and induced using a significant amount of evanescent energy is described for a solid immersion lens (SIL) microscope.Characteristics of native and induced polarization images for different object structures and materials are studied in detail. Experiments are conducted with a NA = 1.48 at wavelength550nm microscope. Near-field images are simulated and analyzed with an RCWT approach. Contrast curve versus object spatial frequency calculations are compared with experimental measurements. Dependencies of contrast versus source polarization angles and air gap for native and induced polarization image profiles are evaluated. By using the relationship between induced polarization and topographical structure, an induced polarization image of an alternating phase shift mask (PSM) is converted into a topographical image, which shows very good agreement with AFM measurement. Images of other material structures include a dielectric grating, chrome-on-glass grating, silicon CPU structure, BD-R and BD-ROM.

This dissertation investigates challenges associated with optics in the 10-500 wavelength size regime. For the visible spectrum, this size range (5-250um) is classified as micro-optics, but is set apart from other size ranges by a noticeable lack of suitable simulation and metrology tools. Optics of this size are gaining popularity in applications such as solid immersion lenses (SIL) and laser beam shaping, but require more research into simulation, testing, fabrication, and assembly in order to be easily integrated into commercial applications.A survey of previous work on SILs and micro-optics simulation/testing is given, including past work with gallium phosphide (GaP) microlenses. A new SIL aberration treatment is described using spherical-parent 3rd order aberrations. Agreement is shown with previous work, and the lack of hemisphere approximations gives a broader understanding of aberrations for varying SIL thicknesses. Results show that aberration reduces with lens radius, but thickness tolerances become tighter as dimensions shrink. A study of GaP intrinsic birefringence and the theoretical impact on the induced polarization signal is also given.A survey of beam propagation simulators is given and a sequential piece-wise diffraction (SPWD) simulator is developed for arbitrary optical systems that overcomes the difficulties of simulation in the 10-500 wavelength size regime. A discussion of a future extension to the work to determine reflected and transmitted field amplitudes with a non-sequential method is presented with specific discussion on the challenges of electric field surface transfer.The design and operation of a micro-interferometer is discussed and testing results from the first sub-100um diameter GaP SILs are shown. A novel method for determining the shape profile of aspheric surfaces using information from annular fringes is presented. Theoretical beam shaping applications for micro GaP lenses is also discussed with results using the SPWD method. Experimental results are also shown for a 1x1x0.3mm beam shaper package that images a laser diode beam to an approximate size of 60um at a working distance of 4mm.Finally, designs and experimental results are shown for the integration of GaP micro-optics into conventional systems as SILs or beam-shaping elements including methods and equipment for lapping and polishing GaP.

Although gold nanoparticles (GNPs) are promising probes for biological imaging because of their attracting optical properties and bio-friendly nature, properties of the multi-photon (MP) emission from GNP aggregates produced by a short-wave infrared (SWIR) laser have not been examined. In this paper, characterization of MP emission from aggregated 50 nm GNPs excited by a femtosecond (fs) laser at 1560 nm is discussed with respect to aggregate structures. The key technique in this work is single particle spectroscopy. A pattern matching technique is applied to correlate MP emission and SEM images, which includes an optimization processes to maximize cross correlation coefficients between a binary microscope image and a binary SEM image with respect to xy displacement, image rotation angle, and image magnification. Once optimization is completed, emission spots are matched to the SEM image, which clarifies GNP ordering and emission properties of each aggregate. Correlation results showed that GNP aggregates have stronger MP emission than single GNPs. By combining the pattern matching technique with spectroscopy, MP emission spectrum is characterized for each GNP aggregate. A broad spectrum in the visible region and near infrared (NIR) region is obtained from GNP dimers, unlike previously reported surface plasmon enhanced emission spectrum.

A near-field technique known as evanescent interferometric lithography allows for high resolution imaging. However its primary limitation is that the image exponentially decays within the photoresist due to physical limits. This thesis aims to overcome this limitation and presents a method to considerably enhance the depth of focus of images created using evanescent interferometric lithography by using a material underlay beneath the photoresist. A key enabler of this is the understanding that evanescent fields couple to surface states and operating within proximity of a resonance, the strength of the coupling allows for considerable energy extraction from the incident beam and redistribution of this energy in a photoresist cavity. This led to the analysis of the Fresnel equations, which suggested that such coupling was in fact the result of an enhanced reflectance that takes place at boundaries of carefully chosen materials. While it is known that metals and lossy dielectrics result in surface plasmon polaritons (SPP) and surface exciton polaritons (SEP) as conventional solutions to the Fresnel reflection equations for the TM polarization of light, there is no such naturally occurring surface state that allows evanescent wave enhancement with the TE polarization of light. Further investigation of the Fresnel reflection equations revealed both for TM and TE that in fact another solution exists that is but unconventional to enhance the reflectivity. This solution requires that one of the media have a negative loss. This is a new type of surface resonance that requires that one of the media be a gain medium; not one in the optical pumped sense but one that would naturally supply energy to a wave to make it grow. This new surface resonance is also a key result of this thesis. Clearly, however this is only a hypothetical solution as a real gain medium would violate the conservation of energy. However, as it is only the reflectance of this gain medium that is useful for evanescent wave enhancement, in fact a multilayered stack consisting of naturally occurring materials is one way to achieve the desired reflectivity. This would of course be only an emulation of the reflectivity aspect of the gain medium. This multilayered stack is then an effective gain medium for the reflectivity purposes when imaging is carried out at a particular NA at a particular wavelength. This proposal is also a key idea of this thesis. At λ = 193 nm, this method was used to propose a feasible design to image high resolution structures, NA = 1.85 at an aspect ratio of ~3.2. To experimentally demonstrate the enhancements, a new type of solid immersion test bed, the solid immersion Lloyd's mirror interference lithography test-bed was constructed. High quality line and space patterns with a half-pitch of 55.5 nm were created using λ = 405 nm, corresponding to a NA of 1.824, that is well in the evanescent regime of light. Image depths of 33-40 nm were seen. Next, the evanescent image was coupled to an effective gain medium made up of a thin layer of hafnium oxide (HfO) upon silicon dioxide (SiO2). This resulted in a considerable depth enhancement, and 105 nm tall structures were imaged. The work in this thesis details the construction of the solid immersion lithography test-bed, describes the implementation of the modeling tools, details the theory and analysis required to achieve the relevant solutions and understanding of the physical mechanism and finally experimentally demonstrates an enhancement that allows evanescent interferometric lithography beyond conventional limits.