Magnetic random­access memory (MRAM) devices have been widely studied since the 1960s. During this time, the size of spintronic devices has continued to decrease. Conse quently, there is now an urgent need for new low­dimensional magnetic materials to mimic the traditional structures of spintronics at the nanoscale. We also require new effective mechanisms to conduct the main functions of memory devices, which are: reading, writ ing, and storing data. To date, most research efforts have focused on MRAM devices based on magnetic tun nel junction (MTJ), such as a conventional field­driven MRAM and spin­transfer torque (STT)­MRAM devices. Consequently, many efforts are currently focusing on new alterna tives using different techniques, such as spin­orbit torque (SOT) and magnetic skyrmions (a skyrmion is the smallest potential disruption to a uniform magnet required to obtain more effective memory devices). The most promising memory devices are SOT­MRAMs and skyrmion­based memories. This study investigates the magnetic properties of 1T­phase vanadium dichalcogenide (VXY) Janus monolayers, where X, Y= S, Se, or Te (i.e., monolayers that exhibit inversion symme try breaking due to the presence of different chalcogen elements). This study is developed along four directions: (I) the nature of the magnetism and the SOT effect of Janus mono layers; (II) the Dzyaloshinskii Moriya interaction (DMI); (III) investigation of stability en hancement by adopting practical procedures for industry; and (IV) study of the effect of a hexagonal boron nitride (h­BN) monolayer as an insulator on the magnetism of the VXY monolayer. This study provides a clear perspective for the next generation of memory de vices, such as SOT­MRAMs based on transition metal dichalcogenide monolayers.

<div>Silicon based semiconductor technology is facing more and more challenges to continue the Moore's law due to its fundamental scaling limitations. To continue the pace of progress of device performance for both logic and memory devices, researchers are exploring new low-dimensional materials, e.g. nanowire, nanotube, graphene and hexagonal boron nitride. Transition metal dichalcogenides (TMDs) are attracted considerable attention due their atomically thin nature and proper bandgap at the initial study. Recently, more and more interesting properties are found in these materials, which will bring out more potential usefulness for electronic applications. Competing with the silicon device performance is not the only goal in the potential path finding of beyond silicon. Low-dimensional materials may have other outstanding performances as an alternative materials in many application realms. </div><div><br></div><div>This thesis explores the potential of TMD based devices in memory and logic applications. For the memory application, TMD based vertical devices are fully studied. Two-terminal vertical transition metal dichalcogenide (TMD) based memory selectors were firstly built and characterized, exhibiting better overall performance compared with some traditional selectors. Polymorphism is one of unique properties in TMD materials. 2D phase engineering in TMDs attracted great attention. While electric switching between semiconductor phase to metallic phase is the most desirable. In this thesis, electric field induced structural transition in MoTe₂ and Mo_1-xW_xTe₂ is firstly presented. Reproducible bipolar resistive random access (RRAM) behavior is observed in MoTe₂ and Mo_1-xW_xTe₂ based vertical devices. Direct confirmation of a phase transition from a 2H semiconductor to a distorted 2H_d metallic phase was obtained after applying an electric field. Set voltage is changed with flake thickness, and switching speed is less than 5 ns. Different from conventional RRAM devices based on ionic migration, the MoTe₂-based RRAMs offer intrinsically better reliability and control. In comparison to phase change memory (PCM)-based devices that operate based on a change between an amorphous and a crystalline structure, our MoTe₂-based RRAM devices allow faster switching due to a transition between two crystalline states. Moreover, utilization of atomically thin 2D materials allows for aggressive scaling and high-performance flexible electronics applications. Both of the studies shine lights on the new application in the memory field with two-dimensional materials.<br></div><div><br></div><div>For the logic application, the ultra thin body nature of TMDs allows for more aggressive scaling compared with bulk material - silicon. Two aspects of scaling properties in TMD based devices are discussed, channel length scaling and channel width scaling. A tunability of short channel effects in MoS₂ field effect transistor (FET) is reported. The electrical performance of MoS₂ flakes is governed by an unexpected dependence on the effective body thickness of the device which in turn depends on the amount of intercalated water molecules that exist in the layered structure. In particular, we observe that the doping stage of a MoS₂ FET strongly depends on the environment (air/vacuum). For the channel width scaling, the impact of edge states in three types of TMDs, metallic T_d-phase WTe₂ as well as semiconducting 2H-phase MoTe₂ and MoS₂ were explored, by patterning thin flakes into ribbons with varying channel widths. No obvious charge depletion at the edges is observed for any of these three materials, which is different from what has been observed in graphene nanoribbon devices. </div>