Abstract The development and advancement of microelectronics industry is very drastically. So, the key to create new technology of process and it's costs can be cut by simulating the performance of these equipments. The reactor of chemical vapor deposition (CVD) is important to semiconductor production process.. This research use numerical method to study the process parameters of low-pressure chemical vapor deposition (LPCVD) of Tungsten (W).In this simulation, the CVD reactor modeling are constructed and discreditzed by using the implicit finite volume method. The grids are arranged in a staggered manner for the discretization of the governing equations. Then, the SIMPLE-type algorithm will be used to solve all of the discretized algebra equations. In this research, the reactor is an single wafer and cold-wall system. The nozzle position is adjustable from 100 to 250mm.The nozzle-to-wafer distance is adjustable by changing the height from 30 to 120mm.The temperature and pressure in the reactor system can be setup with susceptor temperature 300~600 and pressure 0.5~8Torr. The results show that the flow in the reactor may depend on the flow rate and nozzle position. An effective means to avoid unstable is to reduce the susceptor temperature and system pressure due to the effects of buoyancy force and recirculation.

none

In this study, an electrolytic micro-machining tester is employed to investigate the effects of supply voltage,electrode gap and initial machining position on the geometry of the tungsten needle. The tungsten needle to be electrolyzed is dipped in an aqueous electrolyte of 2wt % sodium hydroxide as the anode, and the stainless steel needle with a diameter of 50 £gm as the cathode(tool electrode), and the electrode gap is set to be 30 £gm.Morever,the tungsten needle can be allowed to be fixed or in the reciprocating motion. Experimental results show that when the tip diameter of stainless steel needle is less than 50 £gm, a great quantity of current density and power are generated to cause the temperature failure of the tool electrode. At a certain gap between the electrodes, the electric field is focused on the narrow range to improve its processing efficiency. Under the higher supply voltage condition, it is difficult to control the size because the diameter of tungsten rod is reduced very quickly. Under the lower supply voltage condition, the diameter of tungsten rod can be processed to smaller sizes, but it takes a long time. Therefore, in the beginning of the experiment, the tungsten rod is electrolyzed under a higher voltage to the small size, and then the supply vltage is switched to lower value to conduct the electrolysis process. Consequently, a finer and more even tungsten needle can be obtained. Experimental results show that a more even tungsten needle with the length of 600 £gm and the diameter of 4 £gm can be manufactured.

No description available.

Tungsten disulfide is a proven material as a low friction solid coating. The material is well characterized and has proven its capabilities the last century. Graphene is this centurys most promising material with electrical and mechanical properties. With it the 2D material revolution have started. In this thesis I present a feasible way to sputter tungsten disulfide on graphene as a substrate with little damage to the graphene from energetic particles and a straight forward method to quantize the damage before and after deposition. Further I investigate compositional changes in the sputtered films depending on processing pressure and how tungsten disulfide film thickness and the amount of graphene damage affects the materials low friction capabilities. It is shown that graphene is not a viable substrate for a low friction tungsten disulfide film and that tungsten disulfide is an excellent material for low friction coatings even down too a few nanometers and that the films behavior during load in the friction testing significantly depends on the processing pressure during sputtering.

Not available / text

published_or_final_version / abstract / Physics / Master / Master of Philosophy

No description available.

En esta tesis doctoral, se ha investigado y desarrollado un nuevo método de CVD asistido por aerosol (AACVD), que permite el crecimiento de nanoestructuras de WO3 intrínsecas y funcionalizadas con Au. Así mismo se han depositado capas policristalinas de SnO2 para aplicaciones de detección de gases. La síntesis de materiales nanoestructurados, la fabricación de dispositivos y sus propiedades de detección de gases, han sido estudiadas. El método AACVD fue utilizado para la síntesis y la deposición directa de capas activas encima de sustratos de alúmina y también sobre substratos micromecanizados (microhotplates), lo que demuestra la compatibilidad entre la tecnología de silicio y la deposición de la capas activas nanoestructuradas. En la tesis se ha demostrado que las capas nanoestructuradas de WO3 funcionalizadas con oro tienen una sensibilidad mejor que las intrínsecas frente a algunos gases relevantes y al mismo tiempo se ha producido un cambio de selectividad. / In this doctoral thesis, it has been investigated and developed the Aerosol Assisted Chemical Vapour Deposition (AACVD) method for direct in-situ growth of intrinsic and Au-functionalised nanostructured WO3, as well as SnO2-based devices for gas sensing applications. The nanostructured material synthesis, device fabrication and their gas sensing properties have been studied. AACVD method was used for synthesis and direct deposition of sensing films onto classical alumina and microhotplate gas sensor substrates, demonstrating the compatibility between the microhotplate fabrication process and the sensing nanostructured layer deposition. The effect of Au nanoparticles on the gas sensor’s response was measured and presented in this thesis. The test results revealed that the addition of Au nanoparticles to the WO3 nanoneedles has increased the sensor’s response towards the tested gases (i.e. EtOH). It was therefore demonstrated that the Au-functionalisation has an enhancing effect on the gas sensing properties of WO3 nanoneedles

No description available.