The goal of the work reported herein has been to model aspects of the electrical distribution system of an all-electric ship (AES) and to couple electrical load behavior with the thermal management network aboard the ship. The development of a thermally dependent electrical network has built upon an in-house thermal management simulation environment to replace the existing steady state heat loads with dynamic, thermally dependent, electrical heat loads. Quantifying the close relationship between thermal and electrical systems is of fundamental importance in a large, integrated system like the AES. This in-house thermal management environment, called the Dynamic Thermal Modeling and Simulation (DTMS) framework, provided the fundamental capabilities for modeling thermal systems and subsystems relevant to the AES. The motivation behind the initial work on DTMS was to understand the dynamics of thermal management aboard the ship. The first version, developed in 2007, captured the fundamental aspects of system-level thermal management while maintaining modularity and allowing for further development into other energy domains. The reconfigurable nature of the DTMS framework allowed for the expansion into the electrical domain with the creation of an electrical distribution network in support of thermal simulations. The dynamics of the electrical distribution system of the AES were captured using reconfigurable and physics-based circuit elements that allow for thermal feedback to affect the behavior of the system. Following the creation of the electrical network, subsystems and systems were created to simulate electrical distribution. Then, again using the modularity features of DTMS, a thermal resistive heat flow network was created to capture the transient behavior of heat flow from the electrical network to the existing thermal management framework. This network provides the intimate link between the thermal management framework and the electrical distribution system. Finally, the three frameworks (electrical, thermal resistive, and thermal management) were combined to quantify the impact that each system has relative to system-level operation. Simulations provide an indication of the unlimited configurations and potential design space a user of DTMS can explore to explore the design of an AES. / text

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No. of bitstreams: 1 GARCIA_Uanderson_2017.pdf: 25453924 bytes, checksum: 4c34f46362e91f9eb2f88106f805d7f3 (MD5) Previous issue date: 2017-03-14 / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) / Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) / This work covers the investigation and synthesis of nanometric structures of Porous Anodic Alumina PAA, produced from low purity substrates, in aim to obtain selfsustained membranes. The Hard Anodization (HA) and Mild Anodization (MA) processes were used under special conditions through those found in literature. The analyses of results were based in comparing the AAP produced under the same conditions except the applied potential that was different depending on the MA or HA. HA process had its time halved in order to investigate the oxide growth rate and to calibrate the conditions of anodized membrane synthesis over the glass samples. This work also covers the construction of a resistive thermal evaporation PVD system capable of evaporating metals with melting points below 800°C. Through the deposition of successive layers it was possible to obtain metallic films of aluminum with thicknesses above 10 µm, enabling conditions of synthesis of porous anodic alumina on substrates produced by thermal resistive evaporation. The result of membrane synthesis on low purity aluminum substrates was complement to the synthesis of membranes obtained in aluminum evaporated in glass substrates, since the thickness of each deposited film is low if compared to the thickness of the AAP layer. Therefore, it was necessary to make several Al depositions on the same samples, to obtain an aluminum film that was able to support an oxide layer of anodic alumina and with the same characteristics of those obtained by the process of MA. All anodized samples were characterized by scanning electron microscopy, including samples made from metalized aluminum. The micrography obtained from the low purity aluminum membranes were treated by ImageJ software allowing the morphological analysis. AAP membranes obtained from technical Al substrate depicted the formation of branched pore channels, a result of instabilities in applied electric field during Anodization and presence of different alloying elements in the Al substrate. The metalized aluminum film had a larger thickness in the samples positioned in the middle of the sample holder possibly due to different temperature gradients of filament depending on the position of Al pellets. / Este trabalho aborda a síntese e investigação de estruturas nanométricas de Alumina Anódica Porosa AAP produzidas a partir de substratos de baixa pureza, com a finalidade da obtenção de membranas auto-suportadas. Foram utilizados os processos de Hard Anodization (HA) e Mild Anodization (MA). Para efeito comparativo entre os processos foram mantidas todas as condições variando apenas o potencial aplicado. Posteriormente para HA o tempo experimental foi reduzido pela metade a fim de investigar a velocidade no crescimento do óxido e condições de anodização de membranas sobre as amostras de vidro. Este trabalho também abrange a construção de um sistema Phisical Vapor Deposition (PVD) por evaporação térmica resistiva, capaz de evaporar metais com pontos de fusão abaixo de 800°C. Através da deposição de sucessivas camadas foi possível a obtenção de filmes metálicos de Alumínio com espessuras acima de 10 µm, possibilitando condições de síntese de alumina anódica porosa sobre substratos produzidos por evaporação térmica resistiva. O resultado da síntese de membranas em substratos de Al de baixa pureza foi complementar à síntese das membranas obtidas em alumínio evaporado em substratos de vidro, pois a espessura de cada filme depositado é baixa se comparados a espessura da camada de AAP. Portanto, houve a necessidade de várias deposições sobre as mesmas amostras, para se obter o filme de alumínio que fosse capaz de suportar uma camada de alumina anódica porosa resistente e que se aproximasse das características das obtidas pelo processo de MA. Todas as amostras anodizadas foram caracterizadas por microscopia eletrônica de varredura, inclusive as amostras produzidas a partir do alumínio metalizado. As micrografias obtidas a partir das membranas de alumínio de baixa pureza foram tratadas pelo software ImageJ, possibilitando a análise morfológica das mesmas. As membranas de AAP de baixa pureza possuem poros com ramificações transversais, são provocadas pelos desvios do campo elétrico aplicado, além da possibilidade de formação de outros tipos de óxidos. O filme de alumínio metalizado teve maior espessura nas amostras posicionadas na parte central do porta amostra, isso pode estar relacionado com o aquecimento do filamento que ocorre da região central para as extremidades. / 2010/10813-0