by Tang Yeung Shun. / On t.p., "2", u "3", "7-x", and O"3" are subscripts following "growth of" in the title. / Parallel title in Chinese characters. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1993. / Includes bibliographical references (leaves 87-89). / Chapter Chapter 1 ： --- Introduction --- p.1 / Chapter Chapter 2 : --- Preparation of Thin Films --- p.10 / Chapter Chapter 3 : --- Structural Analysis / Chapter 3.1 --- Setup of XRD --- p.14 / Chapter 3.2 --- θ-2θ Scan --- p.17 / Chapter 3.3 --- Rocking Curve --- p.27 / Chapter 3.4 --- Pole Figure --- p.29 / Chapter 3.5 --- Off-axis Scan --- p.33 / Chapter 3.6 --- Grazing Incidence X-ray Diffraction --- p.53 / Chapter 3.7 --- Percentage of (110) Phase --- p.59 / Chapter 3.8 --- Lattice Parameters --- p.63 / Chapter Chapter 4 : --- Transport Properties / Chapter 4.1 --- Experimental --- p.66 / Chapter 4.2 --- Results --- p.68 / Chapter Chapter 5 : --- Surface Morphology --- p.75 / Chapter Chapter 6 : --- Discussion --- p.80 / Chapter Chapter 7 : --- Conclusions --- p.85 / References --- p.87 / Appendix A : Powder Diffraction Patterns of YBCO System

by Sou Ka Hou. / On t.p. "2', "3", and "T" are subscript following "deposition of" in the title. / Parallel title in Chinese characters. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1992. / Includes bibliographical references (leaves [88]). / Chapter 1. --- Introduction --- p.1 / Chapter 2. --- Computer-controlled sputtering system for deposition of high Tc thin films --- p.10 / Chapter 2.1 --- Introduction --- p.10 / Chapter 2.2 --- Vacuum system --- p.12 / Chapter 2.3 --- Gas flow control --- p.16 / Chapter 2.3.1 --- Design --- p.16 / Chapter 2.3.2 --- Flow control --- p.18 / Chapter 2.4 --- Gas pressure control --- p.21 / Chapter 2.4.1 --- Gauges --- p.21 / Chapter 2.4.2 --- Control method --- p.21 / Chapter 2.5 --- "Sputtering, guns and deposition control" --- p.24 / Chapter 2.5.1 --- Types --- p.24 / Chapter 2.5.2 --- Orientation of the sputter gun --- p.26 / Chapter 2.5.3 --- Dual magnetron gun system --- p.26 / Chapter 2.5.4 --- Deposition control system --- p.27 / Chapter 2.6 --- Substrate holder and temperature control --- p.30 / Chapter 2.6.1 --- Substrate holder --- p.30 / Chapter 2.6.2 --- Substrate temperature control --- p.31 / Chapter 2.7 --- Interlock protection --- p.34 / Chapter 2.8 --- Control program --- p.35 / Chapter 3. --- The presputtering effect --- p.39 / Chapter 3.1 --- Presputtering effect (a review) --- p.39 / Chapter 3.2 --- Emission spectroscopy on sputtered materials --- p.48 / Chapter 3.3 --- Experimental --- p.49 / Chapter 3.4 --- Emission spectra --- p.53 / Chapter 3.4.1 --- Effect of sputter power source --- p.53 / Chapter 3.4.2 --- Effect of gas ratio --- p.58 / Chapter 3.4.3 --- Effect of gas pressure --- p.64 / Chapter 3.4.4 --- Study of presputtering effect --- p.67 / Chapter 3.4.5 --- Monitoring the evaporation rate by the spectral line intensities --- p.71 / Chapter 4. --- Conclusion and discussion --- p.75 / Chapter Appendix A. --- Motor control --- p.77 / Chapter Appendix B. --- Thin film deposition --- p.82

by Poon Sai Keung. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1978. / Includes bibliographical references (leaves 92-94).

Graduation date: 1998

No description available.

Thesis (doctoral)--Helsinki University of Technology, 2009. / Includes bibliographical references. Also available on the World Wide Web.

Thesis (M.S.) in Electrical Engineering--University of Maine, 2001. / Includes vita. Includes bibliographical references (leaves 128-129).

Thesis (M.S.)--Oregon State University, 2008. / Printout. Includes bibliographical references (leaves 124-133). Also available on the World Wide Web.

Thesis (Ph. D.)--University of Washington, 2007. / Vita. Includes bibliographical references (p. 146-152).

Thesis (Ph. D.)--University of Oregon, 2007. / Typescript. Includes vita and abstract. Includes bibliographical references (leaves 127-132). Also available online in Scholars' Bank; and in ProQuest, free to University of Oregon users.