No description available.

Doctor of Philosophy / Department of Chemical Engineering / James H. Edgar / The semiconductor boron phosphide (BP) has many outstanding features making it attractive for developing various electronic devices, including neutron detectors. In order to improve the efficiency of these devices, BP must have high crystal quality along with the best possible electrical properties. This research is focused on growing high quality crystalline BP films on a variety of superior substrates like AIN, 4H-SiC, 3C-SiC and ZrB₂ by chemical vapor deposition. In particular, the influence of various parameters such as temperature, reactant flow rates, and substrate type and its crystalline orientation on the properties of BP films were studied in detail. Twin-free BP films were produced by depositing on off-axis 4H-SiC(0001) substrate tilted 4° toward [1-100] and crystal symmetry matched zincblende 3C-SiC. BP crystalline quality improved at higher deposition temperature (1200°C) when deposited on AlN, 4H-SiC, whereas increased strain in 3C-SiC and increased boron segregation in ZrB₂ at higher temperatures limited the best deposition temperature to below 1200°C. In addition, higher flow ratios of PH₃ to B₂H₆ resulted in smoother films and improved quality of BP on all substrates. The FWHM of the Raman peak (6.1 cm⁻¹), XRD BP(111) peak FWHM (0.18°) and peak ratios of BP(111)/(200) = 5157 and BP(111)/(220) = 7226 measured on AlN/sapphire were the best values reported in the literature for BP epitaxial films. The undoped films on AlN/sapphire were n-type with a highest electron mobility of 37.8 cm²/V·s and a lowest carrier concentration of 3.15x1018 cm⁻ᶟ. Raman imaging had lower values of FWHM (4.8 cm⁻¹) and a standard deviation (0.56 cm⁻¹) for BP films on AlN/sapphire compared to 4H-SiC, 3C-SiC substrates. X-ray diffraction and Raman spectroscopy revealed residual tensile strain in BP on 4H-SiC, 3C-SiC, ZrB₂/4H-SiC, bulk AlN substrates while compressive strain was evident on AlN/sapphire and bulk ZrB₂ substrates. Among the substrates studied, AlN/sapphire proved to be the best choice for BP epitaxy, even though it did not eliminate rotational twinning in BP. The substrates investigated in this work were found to be viable for BP epitaxy and show promising potential for further enhancement of BP properties.

No description available.

The objective of this project is to establish a new technology to grow high quality GaN based material by nano selective area growth (NSAG). The motivation is to overcome the limit of the conventional growth method, which yield a high density of dislocation in the epitaxial layer. A low dislocation density in the epitaxial layer is crucial for high performance and high efficiency devices. This project focuses on growth and material characterization of GaN based nanostructures (nanodots and nanostripes) grown using the NSAG method that we developed. NSAG, with a precise control of diameter and position of nanostructures opens the door to new applications such as: 1) single photon source, 2) photonic crystal, 3) coalescence of high quality GaN template, and 4) novel nanodevices.

No description available.

No description available.

京都大学 / 0048 / 新制・課程博士 / 博士(工学) / 甲第22449号 / 工博第4710号 / 新制||工||1736(附属図書館) / 京都大学大学院工学研究科電子工学専攻 / (主査)教授 川上 養一, 教授 野田 進, 教授 山田 啓文 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DFAM

In this study unintentionally doped GaN grown by hydride vapor phase epitaxy that exhibits a sharply delimited region of green color was investigated. Optical analysis was performed by absorption and photoluminescence spectroscopy. An absorption band between 1.5 and 2.0 eV was found to be responsible for the green color and was related to a sharp emission at 1.193 eV by luminescence and excitation spectroscopy. The appearance of both optical signatures in the region of green color was related to an increase of Cr contamination detected by secondary ion mass spectrometry. We propose that the origin of green color as well as the emission line at 1.193 eV is attributed to internal transitions of Cr⁴⁺.

Ce travail de thèse ce focalise sur la croissance et la caractérisation de Nanofils (NFs) et de Microfils (µFs) de GaN. L'élaboration de telles structures est obtenue par épitaxie en phase vapeur d'organométalliques à partir de deux stratégies de croissances: l'une dite auto-organisée, réalisée sur substrat saphir, l'autre appelée sélective ou localisée, obtenue sur template GaN de polarité Ga. Quelque soit la stratégie employée, nous montrons que la croissance de structures verticales suivant l'axe c requièrent l'utilisation d'un flux de NH3 et d'un rapport V/III faible, lorsque nous les comparons avec les valeurs utilisées pour la réalisation de couches planaires de GaN. Les paramètres et les étapes de croissances ayant une influence sur le rapport d'aspect (hauteur/diamètre) sont étudiées et mises en évidence pour chacune des stratégies employées. Par ailleurs, les mécanismes de croissance ainsi que les propriétés structurales et optiques de ces objets sont caractérisés par MEB, MET, CL et µPL. En particulier, les expériences réalisées sur les µFs auto-organisés permettent d'observer et d'expliquer l'origine de la double polarité, de mettre en lueur la différence d'incorporation de dopants/d'impuretés entre les domaines Ga et N, d'identifier la présence de deux sections de propriétés électriques et optiques différentes, et de révéler la présence de deux types de résonances optiques: des Modes de galerie et des Modes de Fabry-Perot. D'autres part, nous étudions la courbure des dislocations vers les surfaces libres des NFs localisés et µFs auto-organisés, et pointons la présence de fautes d'empilement basales dans des régions de faibles dimensions. / This work focus on growth and characterization of GaN Nanowires (NWs) and Microwires (µWs). Such structures are obtained by Metal Organic Vapor Phase Epitaxy with two growth strategies: one called self-organized which is realized on sapphire, and the other named selective area growth which is obtained on a GaN Ga-polar template. Whatever the growth strategies employed, vertical growth of structures along the c axis requires the use of a low NH3 flux and V/III ratio, when they are compared with values used for planar growth of GaN. The influence of growth parameters and growth steps on aspect ratio (height/diameter) are studied and highlight for each growth strategies employed. Beside, growth mechanisms and structural and optical properties of such objects are characterized by SEM, TEM, CL and µPL. In particular, experiments realized on self-organized µWs enable us to observe and explain the origin of the double polarity, to highlight the dopants/impurities incorporation difference between Ga and N-domain, to identify two sections with differences in electrical and optical properties, and to reveal the presence of two types of optical resonances, identify as Whispering Gallery Modes and Fabry-Perot Modes. On the other hand, we study the bending of dislocations on free walls of localized NWs and self-organized µWs, and pointed out the presence of basal stacking faults in regions of small dimensions.

Silicon based solar cells have been used as photovoltaic devices for decades due to reasonable cost and environment- friendly nature of silicon. But the conversion efficiency of silicon solar cell is limited; for instance, the maximum conversion efficiency of a crystalline silicon solar cell available in the market developed by Kaneka Corporation is 26 % [1]. In comparison, III-V compound semiconductor multi-junction solar cells are the most efficient solar cells with efficiency of 47.1% [2]. However, due to high-cost substrate materials, III-V solar cells are not the best option for large scale production in real life. Therefore, integration of III-V compound semiconductors on silicon substrate has been studied to obtain III-V/Si multi junction solar cells with high conversion efficiency with reasonable price. To this end, we studied epitaxial growth of on GaAs deposited on Si.This thesis presents the characterization results of the above epitaxial layer and fabrication of a single junction solar cell on GaAs coated Si substrate and its performance.In the first part of the project, epitaxial layer grown by Hydride Vapor Phase Epitaxy (HVPE) on different kinds of substrates at different growth conditions are characterized to identify the optimized growth conditions and a suitable substrate. Samples are characterized by High Resolution X-ray Diffraction (HRXRD) and photoluminescence (PL) to determine the composition of and its crystalline quality and by optical microscope to assess the surface morphology. Scanning Electron Microscope (SEM) is used to study the depth of the dry etched structures.The second part of the project deals with the fabrication process consisting of 21 steps to obtain a single junction solar cell structure on GaAs/Si. This process flow will be explained in some detail along with a brief description of several tools in cleanroom that have been used for this purpose.Finally, in the third part, devices are characterized to investigate their performance. Transmission Line Method (TLM) is used to obtain important parameters such as specific contact resistance. Current- voltage (I-V) relation of solar cell is investigated to acquire its efficiency. The lowest specific contact resistance measured in this project is for p-contact (for 4041DV- cell 8) and the highest efficiency measured is 1.64% (for 4041DV- cell 6).In conclusion, although the results obtained are far from the state-of-the art results, this work has laid the foundation for future work that can lead to a breakthrough in fabricating multi-junction tandem solar cell on silicon. / Kiselbaserade solceller har använts i årtionden på grund av dess rimliga kostnad och miljövänliga natur. Omvandlingseffektiviteten för kiselsolcell är begränsad; till exempel är den maximala omvandlingseffektiviteten för solceller av kristallin kisel utvecklad av Kaneka Corporation 26 % [1]. Som jämförelse är III-V sammansatta halvledare multi-junction solceller de mest effektiva solcellerna med en effektivitet på 47,1 % [2]. På grund av de höga substratmaterialen är III-V-solceller i realiteter inte det bästa alternativet för storskalig produktion. Därför har integration av III-V sammansatta halvledare på kiselsubstrat studerats för att erhålla III-V/Si multi junction solceller med hög omvandlingseffektivitet till rimligt pris. För detta ändamål studerade vi epitaxiell tillväxt av på GaAs avsatt på Si.Denna avhandling presenterar karaktäriseringsresultaten av ovanstående epitaxiella skikt och tillverkning av en enkel förbindelse solcell på GaAs-belagt Si-substrat och dess prestanda.I den första delen av projektet karaktäriseras epitaxiallager odlat med Hydride Vapor Phase Epitaxy (HVPE) på olika typer av substrat vid olika tillväxtförhållanden för att identifiera de optimerade tillväxtförhållandena och ett lämpligt substrat. Prover kännetecknas av högupplöst röntgendiffraktion (HRXRD) och fotoluminescens (PL) för att bestämma sammansättningen av och dess kristallina kvalitet och med optiskt mikroskop för att bedöma morfologin. Scanning Electron Microscope (SEM) används för att studera djupet av de torretsade strukturerna.Den andra delen av projektet behandlar tillverkningsprocessen som består av 21 steg för att erhålla en enda förbindelse solcellsstruktur på GaAs/Si. Detta processflöde kommer att förklaras i detalj tillsammans med en kort beskrivning av flera verktyg i renrum som har använts för detta ändamål.Slutligen, i den tredje delen, karaktäriseras enheter för att frilägga dess prestanda. Transmission Line Method (TLM) används för att erhålla viktiga parametrar som specifikt kontaktmotstånd. Förhållandet mellan ström och spänning (I-V) hos solcellen undersöks för att uppnå optimal effektivitet. Den lägsta specifikt kontaktmotstånd som uppmätts i detta projekt är för p-kontakt (för 4041DV-cell 8) och den högsta uppmätta effektiviteten är 1,64% (för 4041DV-cell 6).Sammanfattningsvis, även om de erhållna resultaten är långt ifrån de senaste resultaten inom forskning, lägger detta arbete grunden för framtida arbete som kan leda till ett genombrott i tillverkningen av multi-junction tandemsolcell på kisel.