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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

A New Sensing System to Detect Liquid Water Penetration through Water Resistive Barriers

Qi, Wenqin 08 July 2022 (has links)
The current test methods that evaluate the liquid water resistance performance of a water resistive barrier (WRB) have various drawbacks. A Hydrostatic Pressure Test Apparatus (HPTA) provided by SMT Research Ltd. was used to develop a unique test method to detect liquid water penetration through WRBs. The sensor used in HPTA has 42 channels and each channel reads an individual electric resistance. Lower electric resistance indicates more liquid water penetrates the sensor, vice versa. The measurement system of the device was studied and tested. The results showed the measurement system works properly to detect amount change of the liquid water applied to the sensor while there is no proportional relationship between the amount of liquid water and electrical resistance. The change between two adjacent electrical readings was evaluated by a factor called Normalized Difference Vegetation Index (NDMI). The NDMI factor was determined to be a better measurement than the value of electrical resistance. Preliminary tests using HPTA with Membrane D and Membrane F were done and the apparatus was found to have water leaking through the joint. The clamping method of HPTA was then modified to solve the problem and further WRBs were tested using the modified device. Six WRB materials, Membrane A, Membrane B, Membrane C, Membrane D, Membrane E and Membrane F were tested and 83 tests were conducted in total. A colormap method was used to evaluate the water resistance ability of each material. Among all materials, Membrane E had the highest water resistive duration of long and a water resistance score (WRS) of 337.14. Membrane F had a lower duration of short and a WRS of 78.75. Membrane C and Membrane D have water resistance durations between very short and short and their WRS were 36.5 and 82.71. Membrane A and Membrane B had the lowest water resistance duration of very short and their WRS were 15.15 and 23.19. Plots of Log R vs. Time and NDMI vs. Time of the edge sensors and center sensors were plotted in MATLAB. The water movement behaviours in the two groups of sensors varied by materials. / Graduate / 2023-06-22
2

Deposition and Characterization of Hydrophobic Coatings

Gupta, Vipul 22 November 2012 (has links) (PDF)
Hydrophobic coatings find application in various sectors of the economy including to electronics, textiles, optical devices, and in scientific and commercial equipment. These different applications demand that different hydrophobic coatings posses a range of properties that may include smoothness or roughness, thicknesses on the order of a monolayer or a micron, robustness or the ability to dissolve quickly, transparency or opacity, water resistance or water permeability, electrical conductivity, oleophobicity, etc. However, whatever the final/desired properties, deposition via dry-deposition processes offers significant advantages, including greater reproducibility, increased environmental friendliness, and cost effectiveness on an industrial scale. Herein I explore the chemical vapor deposition of silanes and the characterization of a commercial, hydrophobic coating to better prepare and understand hydrophobic coatings on different materials. One of the characterization techniques I used frequently in these studies is X-ray photoelectron spectroscopy (XPS). Accordingly, in Chapter 2 of this thesis I discuss this technique vis-à-vis the chemical shifts it detects, which reflect the oxidation states of materials being probed. In particular, I discuss a recommendation made over a decade ago by Gion Calzaferri for 'fixing' the problem of oxidation numbers as applied to organic materials and show how XPS confirms his suggestion. In Chapter 3 I introduce hydrogen as an etch/cleaning gas for silicon wafers. I first show that, like argon and oxygen plasmas, hydrogen plasmas will effectively clean silicon wafers. However, I then show that hydrogen plasma treatment leads to a silicon surface that is chemically different than those prepared with the other plasmas and that undergoes silanization to a greater extent -- the resulting surfaces have higher water contact angles and thicknesses. In Chapter 4 I study the deposition of a potential barrier layer for water, which was prepared from an aza silane: N-n-butyl-aza-2,2-dimethoxysilacyclopentane (1) in a molecular layer deposition (MLD)-like process using either water or ammonium hydroxide as the second half reactant. This molecule has the interesting property of undergoing self-limiting growth, where the termination of this growth is accelerated by use of an ammonium hydroxide catalyst. Interestingly, films of 1 are considerably thicker on nylon than on silicon, which is explained by nylon acting as a water reservoir in the reaction. In Chapter 5 I show the careful characterization of the hydrophobic coating on an Apple iPod nano, which was probed by ToF-SIMS, wetting, and XPS. I could identify that the coating is only applied to the touchscreen of the device. SIMS suggested that the fluorinated coating contains oxygen, which should add to its biodegradability. Finally, in Chapter 6 I make recommendation for future work in these areas.

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