Selectively erbium (Er) doped titanium (Ti) in-diffused optical waveguide amplifiers on lithium niobate (LiNbO3) substrate have been fabricated and characterized in the wavelength regime around λ = 1.53μm using counter-directional pumping at λP = 1.48μm. LiNbO3 waveguide amplifiers are desirable for providing gain in optical circuit chips through integration with other optical elements on a single substrate. A prerequisite for achieving useful gain rests on the optimization of overlap between the incident guided optical signal mode distribution and the evolving emission from excited Er ions. The extent of overlap can be controlled by adjusting fabrication parameters. Fabrication parameters for Er-doped Ti in-diffused waveguide amplifiers of useful optical gain have been optimized by diffusing selective patterns of vacuum-deposited 17nm-thick erbium film at 1100˚C for 100 hours into LiNbO3, and integrating with 7μm-wide single mode straight channel waveguides formed by diffusing 1070Å thick titanium film into the LiNbO3. Small-signal gain characterization was carried out with a -30 dBm of transmitted input signal power at λS=1531nm with counter-directionally launched pump power ranging between 0 to 119mW at λP=1488nm, using TM polarization for both the signal and pump beams. At a maximum launched pump power of 119mW, a signal enhancement of 8.8dBm for 25mm-long erbium doped region, and 11.6dBm for 35mm-long erbium doped region were obtained. The corresponding calculated net gain values are 1.8dB and 2.8dB, for the 25mm-long and 35mm-long Er-doped regions, respectively.

It is well known that thermally evaporated a-As2S3 thin films are prone to oxidation when exposed to an ambient environment. These As2O3 crystals are a major source of scattering loss in sub-micron optical integrated circuits. Magnetron sputtering a-As2S3 not only produces films that have optical properties closer to their equilibrium state, the as-deposited films also show no signs of photo-decomposed As2O3. The TM propagation loss of the as-deposited As2S3-on-Ti:LiNbO3 waveguide is 0.20 plus/minus 0.05 dB/cm, and it is the first low loss hybrid waveguide demonstration. Using the recipe developed for sputtering As2S3, a hybrid Mach-Zehnder interferometer has been fabricated. This allows us to measure the group index of the integrated As2S3 waveguide and use it in the study of the group velocity dispersion in the sputtered film, as both material dispersion and waveguide dispersion may be present in the system. The average group index of the integrated As2S3 waveguide is 2.36 plus/minus 0.01. On-chip optical amplification was achieved through thermal diffusion of erbium into X-cut LiNbO3. The net gain measured for a transverse magnetic propagation mode in an 11 μm wide Er:Ti:LiNbO3 waveguide amplifier is 2.3 dB plus/minus 0.1 dB, and its on-chip gain is 1.2 plus/minus 0.1 dB/cm. The internal gain measured for a transverse electric propagation in an 7 μm wide Er:Ti:LiNbO3 waveguide amplifier is 1.8 dB plus/minus 0.1 dB and is among the highest reported in the literature. These gains were obtained with two 1488 nm lasers at a combined pump power of 182mW. In order to increase further the on-chip gain, we have to improve the mode overlap between the pump and the signal. This can be done by doping erbium into As2S3 film using multi-layer magnetron sputtering. The Rutherford backscattering spectroscopy shows that the doping of Er:As2S3 film with 16 layers of erbium is homogeneous, and Raman spectroscopy confirms no significant amount of Er-S clusters in the sputtered film. The deposition method was used to fabricate an Er:As2S3 waveguide, and the presence of active erbium ions in the waveguide is evident from the green luminescence it emitted when it was pumped by 1488 nm diode laser.