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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Influência do teor de Hf em filmes finos de Zr e ZrN depositados por magnetron sputtering / Influence of Hf content in thin films of Zr and ZrN deposited by magnetron sputtering

Santos, Ikaro Arthur Dantas 10 1900 (has links)
Conselho Nacional de Pesquisa e Desenvolvimento Científico e Tecnológico - CNPq / Zr-Hf-N and Zr-Hf thin films were deposited by reactive magnetron sputtering in order to verify the influence of small hafnium contents that are present as contaminants on zirconium deposition targets. For this purpose different hafnium contents in the films were intentionally added by varying the deposition power. The samples were characterized by X-ray diffraction (XRD), dispersive energy X-ray spectroscopy (EDS), Rutherford backscattering spectroscopy (RBS) and nanohardness analyzes. The ZrHfN thin films were deposited and had a concentration of at% Hf of 0.49; 0.56; 0.80; 1.87 and 2.70. The deposited Zr-Hf alloys exhibited hafnium contents at up to 1.21%; 1.24; 4.35; 7.94 and 11.49. The crystalline phase obtained for the nitride films had a cubic face centered structure (FCC) and was not modified by the increase in hafnium content. The alloys presented amorphous with some crystalline regions of hexagonal structure. The hardness values ranged from 21.4 to 25.1 GPa for nitrides and from 6.1 to 8.4 GPa for zirconium alloys. / Filmes finos de Zr-Hf-N e Zr-Hf foram depositados por magnetron sputtering reativo com o intuito de verificar a influência de pequenos teores de háfnio que estão presentes como contaminantes nos alvos de deposição de zircônio. Para isto foram adicionados intencionalmente diferentes teores de háfnio nos filmes através da variação da potência de deposição. As amostras foram caracterizadas por difração de raios-X (DRX), espectroscopia de raios-Xpor energia dispersiva (EDS), espectroscopia por retroespalhamento Rutherford (RBS) e análises de nanodureza. Os filmes finos de ZrHfN foram depositados e apresentaram concentração em at.% de Hf de 0,49; 0,56; 0,80; 1,87 e 2,70. As ligas Zr-Hf depositadas apresentaram teores de háfnio em at.% de 1,21; 1,24; 4,35; 7,94 e 11,49. A fase cristalina obtida para os filmes os nitretos tinha estrutura cúbica de face centrada (CFC) e não foi modificada pelo aumento do teor de háfnio. As ligas se apresentaram amorfas com algumas regiões cristalinas de estrutura hexagonal. Os valores de dureza variaram de 21,4 a 25,1 GPa para os nitretos e de 6,1 a 8,4 GPa para as ligas de zircônio. / São Cristóvão, SE

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